Analytic calculation of scaling dimensions: Tricritical hard squares and critical hard hexagons

The finite-size corrections, central chargesc, and scaling dimensionsx of tricritical hard squares and critical hard hexagons are calculated analytically. This is achieved by solving the special functional equation or inversion identity satisfied by the commuting row transfer matrices of these lattice models at criticality. The results are expressed in terms of Rogers dilogarithms. For tricritical hard squares we obtainc=7/10,x=3/40, 1/5, 7/8, 6/5 and for hard hexagons we obtainc=4/5,x=2/15, 4/5, 17/15, 4/3, 9/5, in accord with the predictions of conformal and modular invariance.     

Atomic emission and atomic absorption spectrometric analysis of high-purity powders for the production of ceramics

Summary Direct analysis methods and multistage combined analytical procedures for the determination of impurities at the g/g level and the upper ng/g level in high-purity powders of Al₂O₃, AlN, Si₃N₄ and SiC are described. Results obtained with a novel direct slurry-atomization technique using a Babington nebulizer and inductively coupled plasma optical emission spectrometry (ICP-OES) are presented. A comparison of analysis results of combined analytical procedures including wet chemical decomposition and determinations with graphite furnace atomic absorption spectrometry (ETAAS) or ICP-OES with those of slurry-atomization ICP-OES show the capabilities of this technique for routine analysis in production control. Detection limits for Al, B, Ca, Co, Cu, Fe, Mg, Mn, Si, Ti, W, V, and Zn in the matrices mentioned are between 0.03 and 2.5 g/g. For elemental concentrations 10 g/g relative standard deviations of the measurements are generally below 10%. The technique is shown to be a powerful tool for trace determinations in powder samples. This is shown by its use for analysis of a series of the ceramic powders mentioned and comparative results of other direct techniques such as total reflection X-ray fluorescence spectrometry and instrumental neutron activation analysis.

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OES und AAS von hochreinen Pulvern für die Keramikherstellung

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Herrn Prof. Dr. G. Tölg zum 60. Geburtstag von seinen Mitarbeitern gewidmet     

AES investigations of plasma sprayed Al2O3 coatings on Ni

Summary The system of plasma sprayed Al₂O₃ on Ni substrates is investigated by means of AES/depth profiling. The influence of two process parameters — preoxidation procedure and spraying temperature — is examined. Rupture between substrate and ceramic layer occurs between a residual — or, in the case of excessive preoxidation, a superfluous — NiO layer on Ni, the thickness of the former depending on preoxidation conditions and the Al₂O₃ layer, the back side of which being partially covered with NiO. The thickness of this NiO layer increases up to about 1 m with the thickness of the initial NiO layer on the substrate, until this layer is about 1.3 m thick, and remains constant thereafter. The same dependence is observed for the width (0.1–1 m range) of the mixed oxide interface between the sprayed Al₂O₃ layer and the NiO layer below. These results represent the chemical contribution to adherence. Contrary to excessive preoxidation, an increase of the spraying temperature from 300°C to 500°C effects broader interfaces.This poster was awarded the First Prize in Poster Section C by the Deutscher Arbeitskreis für Spektroskopie (DASp)     

Depth profiles of shallow implanted layers by soft ion sputtering and total-reflection X-ray fluorescence

A new method suitable for depth profiling of shallow layers on different materials is presented. It is based on a soft and planar ion sputtering combined with differential weighing, total-reflection X-ray fluorescence (TXRF) spectrometry and Tolansky interferometry. By means of a stepwise repetition of these techniques it is possible to determine both density/depth and concentration/depth profiles. The respective quantities are expressed in terms inherent only to the sample and traceable to the SI-units or subunits gram, nanometer and mole. It is a unique feature of this method that density/depth profiles can directly be obtained from measurements without any calibration or theoretical approximation. The method is applied to a Si wafer implanted with Co ions of 25 keV energy and a nominal dose of 1×10¹⁶ cm⁻². The depth resolution is shown to be <3 nm while a total depth of some 100 nm can be reached. The concentration/depth profile is compared with RBS measurements, wet-chemical etching plus TXRF and Monte Carlo simulations. In view of the fact that only similar but not exactly the same samples have been examined by these methods, a good correspondence can be noticed.     

Groundstate properties of a generalized VBS-model

We study a generalized q-deformed VBS-model. This is a spin-1 quantum antiferromagnet with nearest neighbour interaction on a linear chain. The exact grounstate is determined in the form of a matrix-product of individual site-contributions. All relevant groundstate properties are calculated. The groundstate is unique, it has a finite gap to the excitations, and correlations decay exponentially. Thus the model has all the properties described by Haldane to be generic for certain quantum antiferromagnets with integral spin.Work performed within the research program of the Sonderforschungsbereich 341, Köln-Aachen-Jülich     

Application of a synchrotron microprobe to the analytical characterization of ion-implanted material

A synchrotron microprobe has been used to characterize ion implantations of nickel and cobalt in silicon (100) or (111) wafers. The synchrotron radiation is collimated by means of a rigid cylindrical glass capillary of 110 mm length, 5 mm outer and 30 μm or 10 μm inner diameter. The beam is pointed at the wafer sample and the emitted radiation of X-rays is detected by an energy dispersive spectrometer. Line scans are recorded step by step over the implantation areas and across their borders. The sharpness of the borders is characterized at a lateral resolution of 13 μm and the edge lengths ranging from 0.6 to 8 mm are determined with an accuracy better than ± 20 μm. The signal intensity and implantation dose of cobalt ranging from 1 × 10¹⁵ to 1 × 10¹⁷ ions cm⁻² show a linear relationship as is to be expected for the micrometre thin implanted layers.     

The influence of pairing and nuclear structure on the thermal-neutron-induced fission of235U

The mass separated fission product beam provided by the mass separator “Lohengrin” has been used to determine the nuclear charge distribution for the thermal-neutron-induced fission of²³⁵U for all light fission products in the region 80≦A≦107. The measurements were performed at the most probable kinetic energy of the fission products. By using the known fission product mass yields, the independent yields for a total number of 100 nuclides were obtained under the condition of the most probable kinetic energy. The proton pairing effect modulates the average nuclear charge of the fission fragments and the isobaric charge distribution widths in a regular fashion. The probabilities of breaking a pair and of forming fragments with an energetically unfavourable neutron-to-proton ratio are found to compete with each other. Both probabilities depend on the mass split and reach their maximum values in the region of the most probable masses. The odd-even-proton effect is found to vary smoothly between 16% for the most abundant mass splits and 40% for the rare mass splits. The odd-even-neutron effect exhibits maxima nearN=50 andN=60, where it reaches 16%. These maxima and the extremely low Tcyield (0.13±0.05%) are discussed with regard to fragment shell effects.     

Contribution to the analytical characterization of coatings produced by thermal spraying

This paper reports on the use of Auger electron spectroscopy (AES)/ depth profile analysis for the investigation of plasma-sprayed coatings. Prior to spraying the St 37 substrates are heated to 300 °C or 500 °C for ceramic or metallic layers, respectively. Studies of the starting materials and of the interfaces are important if the adhesion mechanism is to be understood. Therefore the initial components—the unheated and heated substrates and the powder particles NiCrAl, Al₂O₃ and ZrO₂-7.25Y₂O₃—are analyzed. Depth profiles obtained from two coatings St 37/NiCrAl and St 37/Al₂O₃ show the influence of plasmaspraying on substrate surfaces and sprayed particles. Plasma-spraying mainly causes a decrease of superficial carbon contamination for both coating layers. In the case of St 37/NiCrAl incorporation of carbon in the sprayed layer is observed. The whole layer is almost completely oxidized except for some areas where substrate and particle material are present. It is assumed that these areas are identical with so-called adherence zones.Dedicated to Professor Günther Tölg on the occasion of his 60th birthday