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Sahli S. Rebiai S. Raynaud P. Segui Y. Zenasni A. Mouissat S. 《Plasmas and Polymers》2002,7(4):327-340
The effects of process parameters such as O2/HMDSN (hexamethyldisilazane) ratio, microwave discharge power and deposition pressure on the growth rate, chemical bonding nature, and refractive index of thin films deposited by microwave plasma from HMDSN with oxygen, have been investigated. The plasma was created in a Microwave Multipolar reactor excited by Distributed Electron Cyclotron Resonance. The films were deposited at room temperature and characterized by Fourier Transform Infrared spectroscopy and ellipsometry. Growth rate increased with the discharge power P or the deposition pressure but decreased significantly with increasing O2/HMDSN ratio. A large change in the film composition was observed when the O2/HMDSN ratio was varied: films deposited with only HMDSN precursor are polymer-like but as the O2/HMDSN ratio increased, organic groups decreased. For relative pressure values over 70%, deposited films are SiO2-like with refractive index values close to those found for thermal silicon dioxide. 相似文献
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