HPLC Method for the Simultaneous Determination of the UV-Filters Butyl Methoxy Dibenzoylmethane and Octocrylene in the Presence of Their Photodegradants

Butyl methoxy dibenzoylmethane (BMDM) and octocrylene (OC), common UV-filters in sunscreen products are often used in combination. Together they provide broad spectrum photoprotection from exposure to both UVA- and UVB-light. These UV-filters may, however, undergo photodegradation and generate photodegradants, resulting in a potential loss of photoprotection. It is thus a concern that the photostability testing as described by the ICH Guideline Q1B is not a requirement for sunscreen products in Australia, Europe or the USA. UV-filter photodegradants have in addition been shown to be toxic, highlighting the importance of their separation from the parent UV-filters. An HPLC method was developed and validated to quantitatively determine a combination of these UV-filters in the presence of their photodegradants. Reverse-phase chromatography was employed, using a C18 column and an isocratic mobile phase consisting of methanol/water/acetic acid (89/10/1 v/v). Validation according to the ICH guidelines for linearity, accuracy, precision, sensitivity, specificity and robustness was confirmed. The developed and validated method was then successfully applied to the determination of BMDM and OC in an aqueous cream base, typically used in sunscreens, after photostability testing, according to the ICH Guideline Q1B. In addition, the diketo-enol ratio of BMDM in methanol-d ₄ was determined by NMR and the two major photodegradants were identified by FTMS and LC–MS.

     

HPLC Method for the Simultaneous Determination of the UV-Filters Butyl Methoxy Dibenzoylmethane and Octocrylene in the Presence of Their Photodegradants

Butyl methoxy dibenzoylmethane (BMDM) and octocrylene (OC), common UV-filters in sunscreen products are often used in combination. Together they provide broad spectrum photoprotection from exposure to both UVA- and UVB-light. These UV-filters may, however, undergo photodegradation and generate photodegradants, resulting in a potential loss of photoprotection. It is thus a concern that the photostability testing as described by the ICH Guideline Q1B is not a requirement for sunscreen products in Australia, Europe or the USA. UV-filter photodegradants have in addition been shown to be toxic, highlighting the importance of their separation from the parent UV-filters. An HPLC method was developed and validated to quantitatively determine a combination of these UV-filters in the presence of their photodegradants. Reverse-phase chromatography was employed, using a C18 column and an isocratic mobile phase consisting of methanol/water/acetic acid (89/10/1 v/v). Validation according to the ICH guidelines for linearity, accuracy, precision, sensitivity, specificity and robustness was confirmed. The developed and validated method was then successfully applied to the determination of BMDM and OC in an aqueous cream base, typically used in sunscreens, after photostability testing, according to the ICH Guideline Q1B. In addition, the diketo-enol ratio of BMDM in methanol-d ₄ was determined by NMR and the two major photodegradants were identified by FTMS and LC–MS.     

Photostability of sunscreens

Sunscreens were originally designed to include mainly UVB-filters. Because of the deeper penetration of UVA light, causing photoaging and DNA damage, there has been a shift towards broad spectrum sunscreens. These broad spectrum sunscreens now include both UVA- and UVB-filters and other ingredients which possess antioxidant activity. Although sunscreens are regulated in most countries, photostability testing is not mandatory. Because of the ability of sunscreen ingredients to absorb UV-light and the complexity of most of these formulations, which may include more than one UV-filter, antioxidants and other formulation excipients, it is important that their photostability in combination is determined.     

Molding block copolymer micelles: a framework for molding of discrete objects on surfaces

Soft lithography based on photocurable perfluoropolyether (PFPE) was used to mold and replicate poly(styrene-b-isoprene) block-copolymer micelles within a broad range of shapes and sizes including spheres, cylinders, and torroids. These physically assembled nanoparticles were first formed in a selective solvent for one block then deposited onto substrates having various surface energies in an effort to minimize the deformation of the micelles due to attractive surface forces. The successful molding of these delicate nanoparticles underscores two advantages of PFPE as a molding material. First, it allows one to minimize particle deformation due to adsorption by using low energy substrates. Second, PFPE is not miscible with the organic micelles and thus prevents their dissociation. For spherical PS-b-PI micelles, a threshold value of the substrate surface energy for the mold to lift-off cleanly, that is, the particles remain adhered to the substrate after mold removal was determined to be around gamma congruent with 54 mJ/m2. For substrates with higher surface energies (>54 mJ/m2), the micelles undergo flattening which increase the contact area and thus facilitate molding, although at the expense of particle deformation. The results are consistent with theoretical predictions of a molding range for substrate surface energies, which depends on the size, shape, and mechanical properties of the particles. In a similar fashion, cylindrical PS-b-PI micelles remain on the substrate at surface energies gamma>or=54 mJ/m2 after a mold removal. However, cylindrical micelles behaved differently at lower surface energies. These micelles ruptured due to their inability to slide on the surfaces during mold lift-off. Thus, the successful molding of extended objects is attainable only when the particle is adsorbed on higher energy substrates where deformation can still be kept at a minimum by using stronger materials such as carbon nanotubes for the master.