排序方式: 共有1条查询结果,搜索用时 15 毫秒
1
1.
Furukawa Ryudai Tanaka Yasunori Nagase Y. Nakano Y. Ishijima T. Sueyasu S. Watanabe S. Nakamura K. 《Plasma Chemistry and Plasma Processing》2022,42(3):435-463
Plasma Chemistry and Plasma Processing - The influences of upper-coil and lower-coil current modulation of tandem-type modulated induction thermal plasma (tandem-MITP) were studied for silicon... 相似文献
1