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Abstract— The quantum efficiency for the photodimerization of trans -cinnamic acid in the solid state is independent of intensity and is found to have a value approaching two. Thus, the reaction involves one excited and one un-excited molecule.
During the exposure, a dimer film developing on the surface of the cinnamic acid layer attenuates the intensity of the radiation incident on the unreacted cinnamic acid. This gives the appearance of a decrease in the quantum yield with increasing number of photons incident. 相似文献
During the exposure, a dimer film developing on the surface of the cinnamic acid layer attenuates the intensity of the radiation incident on the unreacted cinnamic acid. This gives the appearance of a decrease in the quantum yield with increasing number of photons incident. 相似文献
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Addition of H2 (4 atm at 298 K) to [Rh(nbd)(PR3)2][BAr(F)4] [R = Cy, iPr] affords Rh(III) dihydride/dihydrogen complexes. For R = Cy, complex 1a results, which has been shown by low-temperature NMR experiments to be the bis-dihydrogen/bis-hydride complex [Rh(H)2(eta2-H2)2(PCy3)2][BAr(F)4]. An X-ray diffraction study on 1a confirmed the {Rh(PCy3)2} core structure, but due to a poor data set, the hydrogen ligands were not located. DFT calculations at the B3LYP/DZVP level support the formulation as a Rh(III) dihydride/dihydrogen complex with cis hydride ligands. For R = iPr, the equivalent species, [Rh(H)2(eta2-H2)2(P iPr3)2][BAr(F)4] 2a, is formed, along with another complex that was spectroscopically identified as the mono-dihydrogen, bis-hydride solvent complex [Rh(H)2(eta2-H2)(CD2Cl2)(P iPr3)2][BAr(F)4] 2b. The analogous complex with PCy3 ligands, [Rh(H)2(eta2-H2)(CD2Cl2)(PCy3)2][BAr(F)4] 1b, can be observed by reducing the H2 pressure to 2 atm (at 298 K). Under vacuum, the dihydrogen ligands are lost in these complexes to form the spectroscopically characterized species, tentatively identified as the bis hydrides [Rh(H)2(L)2(PR3)2][BAr(F)4] (1c R = Cy; 2c R = iPr; L = CD2Cl2 or agostic interaction). Exposure of 1c or 2c to a H2 atmosphere regenerates the dihydrogen/bis-hydride complexes, while adding acetonitrile affords the bis-hydride MeCN adduct complexes [Rh(H)2(NCMe)2(PR3)2][BAr(F)4]. The dihydrogen complexes lose [HPR3][BAr(F)4] at or just above ambient temperature, suggested to be by heterolytic splitting of coordinated H2, to ultimately afford the dicationic cluster compounds of the type [Rh6(PR3)6(mu-H)12][BAr(F)4]2 in moderate yield. 相似文献
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[reaction: see text] Chemoselective cyclizations of divinyl ketones to cyclohexenones mediated by a sterically demanding Lewis acid and an amine base have been accomplished under mild reaction conditions. The extension of this methodology to the synthesis of eight-membered rings is also demonstrated. 相似文献
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3,5-Dichloro-6-phenyl-2(H)-1,4-oxazin-2-one 3, 5-chloro-3,6-dimethyl-2(H)-1,4-oxazin-2-one 4, 5-chloro-6-methyl-3-phenyl-2(H)-1,4-oxazin-2-one 5 and 5-chloro-3,6-diphenyl-2(H)-1,4-oxazin-2-one 7, are ambident azadienes reacting efficiently and selectively with both electron rich and electron poor dienophiles. 相似文献
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We report experimentally measured cross sections for pressure broadening of ammonia inversion transitions by J=0, ortho-D2 at temperatures of 18-40 K. These measurements were made in a quasiequilibrium cell using the collisional cooling technique. Cross sections for broadening of the metastable (J,K)=(1, 1), (2, 2) and (3, 3) inversion transitions ranged from 67.5 A2 for (1, 1) at 20.0 K to 100.1 A2 for (3, 3) at 25.0 K. The J=0, ortho-D2 cross sections were found to be consistently larger than previously measured cross sections for low temperature broadening of NH3 by both He and H2. 相似文献
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G. F. Cerofolini A. Giussani F. Carone Fabiani A. Modelli D. Mascolo D. Ruggiero D. Narducci E. Romano 《Surface and interface analysis : SIA》2007,39(10):836-844
A combined analysis, based on angle‐resolved X‐ray photoelectron spectroscopy and multiple‐internal‐reflection infrared spectroscopy, of the (1 0 0) silicon surface after etching in dilute aqueous solution of HF is presented. The analysis shows that the surface is mainly formed by a heterogeneous distribution of SiH, SiH2 and SiH3 terminations, but contains (in addition to sub‐stoichiometric oxidized silicon) a form of reduced silicon, not consistent with the currently accepted picture of the native HFaq‐etched surface. Copyright © 2007 John Wiley & Sons, Ltd. 相似文献