Über unendlich kleine isometrische Verbiegungen einer Fläche mit höherer als erster Näherung

Ohne Zusammenfassung     

Unique edge structure and stability of fabricated dimer islands on Si(001)

The edge structure and stability of monolayer-high islands fabricated on Si(001) surfaces by scanning tunneling microscopy have been analyzed theoretically. In contrast to the edges of similar islands grown by depositing Si, the properties of edges of fabricated islands are determined by the length of the trench of dimers that are removed to create the island. We demonstrate the possibility of controlling the edge structure, and thus the stability, through a selective process of atom removal.     

Origin of the stability of Ge(105) on si: a new structure model and surface strain relaxation

The structure of Ge(105)-(1 x 2) grown on Si(105) is examined by scanning tunneling microscopy (STM) and first-principles calculations. The morphology evolution with an increasing amount of Ge deposited documents the existence of a tensile surface strain in Si(105) and its relaxation with increasing coverage of Ge. A detailed analysis of high-resolution STM images and first-principles calculations produce a new stable model for the Ge(105)-(1 x 2) structure formed on the Si(105) surface that includes the existence of surface strain. It corrects the model developed from early observations of the facets of "hut" clusters grown on Si(001).     

ON THE CONVERGENCE OF THE PARABOLIC APPROXIMATION OF A CONSERVATION LAW IN SEVERAL SPACE DIMENSIONS

1.IntrodnctionWegiveaproofofthestrongconvergenceinofthesolutionoftheparabolicapproximationtowardstheentropicsolutiontothescalarconservationlawwhereuo(RN),udenotessomeapproximationofuosuchthatandthefluxfsatisfiesTheconvergenceoftheapproximatesolutions...     

Hydrogen-induced instability of the Ge(105) surface

The structure and stability of the hydrogen-terminated (105) surface of Ge deposited on Si(105) substrates are investigated by scanning tunneling microscopy (STM). Investigations combining STM, electron energy loss spectroscopy, and theory reveal that Si incorporation into the surface Ge layer of hydrogen-terminated Ge/Si(105) drastically destabilizes the surface. The STM images obtained on this surface are well explained by the recently established rebonded-step structure model.