Deposition of silica thin films formed by sol–gel method

Deposition of silica thin films on silicon wafer was investigated by in situ mass measurements with a microbalance configured for dip coating. Mass change was recorded with respect to deposition time when the substrate was fully immersed in the silica sol. Mass gain during deposition was higher than predicted from monolayer coverage of silica nano particles. This implied that deposition was facilitated by gelling of the nanoparticles on the substrate. The rate of deposition was enhanced by increasing the particle concentration in the sol and by decreasing the particle size from 12 to 5 nm. Increasing the salt concentration of the silica sol at constant pH enhanced the deposition of the silica particles. Reducing the pH of the sol from 10 to 6 decreased the deposition rate due to aggregation of the primary silica particles.     

A strange novel chaotic system with fully golden proportion equilibria and its mobile microcomputer-based RNG application

A strange novel three-dimensional quadratic continuous autonomous chaotic system with fully golden proportion equilibria is proposed. It has only seven terms, three quadratic nonlinearities and one parameter ‘a’. The system equations have four equilibrium points and very interestingly all the equilibrium points have fully golden proportion values. Besides, this chaotic system has hidden amplitude control properties. The dynamic analyses of the system are presented such as equilibrium points, dissipativity, Lyapunov exponents, bifurcation diagrams, phase portraits and hidden amplitude control properties. Later, electronic circuit of the system is simulated in software and implemented in real environment. Finally, microcomputer-based random number generator (RNG) application and its NIST-800-22 tests are executed as another real-time application.     

AFM measurements of forces between silica surfaces

Interaction forces and adhesion between a silica sphere and a flat silica surface in aqueous electrolyte solutions were investigated by atomic force microscopy. The forces were measured as a function of surface separation, pH and NaCl concentration as the surfaces were approaching each other. The adhesion force was determined upon retraction with respect to pH, NaCl concentration and contact time. The magnitude of the long range repulsive force was decreasing with decreasing pH. A short range repulsive force was observed at pH = 2, but no long range repulsive forces were observed at this pH. Force measurements showed that adhesion of silica surfaces in water was obstructed by short and long range repulsive forces. Adhesion was enhanced when both the long and the short range repulsive force was mitigated. A maximum adhesion force of 7.8 mN/m was measured at pH = 12.5 when the short range force vanished and the long range repulsive force was reduced by increasing the NaCl concentration. At pH = 12.5, the work of adhesion was calculated to be 1.2 mJ/m² according to the Derjaguin–Muller–Toporov (DMT) model. Adhesion energy was much less at pH = 2 (0.3 mJ/m²) due to persistive short range repulsion.