排序方式: 共有14条查询结果,搜索用时 15 毫秒
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利用流式细胞法、细胞计数试剂盒(CCK-8)法、实时细胞功能分析(RTCA)法分别检测分选前后细胞的活性,综合比较了3种方法的检测原理、操作特点等。结果显示,流式细胞法测得的分选后细胞凋亡率为(3.85 ± 0.008)%,分选前细胞凋亡率为(14.09 ± 0.021)%,分选后细胞凋亡率低于分选前,具有统计学差异(P < 0.05);分选前后的活细胞比例显示,分选后活细胞比例高于分选前,具有显著性统计学差异(P < 0.001)。CCK-8法测得的分选后细胞活性高于分选前,具有显著性统计学差异(P < 0.001);RTCA法测得的分选后细胞连续增殖活性明显高于分选前,具有极显著性统计学差异(P < 0.000 1)。结果显示,相较于CCK-8法和流式细胞法,RTCA法的细胞用量少、可回收,操作简便,无需标记,检测灵敏度高,可获得实时动态的细胞生长曲线,适合研究分选后细胞长效动态的活性变化,可为基础和临床分选后活细胞的功能研究提供检测手段。 相似文献
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We report the simulation results on the thickness uniformity of optical coatings deposited on spherical substrates by optimizing the geometric configuration parameters, such as tilting angle of the substrate holder and position of the evaporation source in a 1 000-mm-diameter planetary rotation stage (PRS). We reveal that good film uniformity on convex spherical surfaces or flat substrates, as well as concave surfaces with weak to moderate curvatures can be obtained through appropriate tilting of the substrate holder. For 300-mm-diameter substrates with clear aperture to radius of curvature (CA/RoC) between 0.3 and 0.7, the achievable film uniformity is above 99%. The source position is optimized to achieve good film uniformity. 相似文献
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An approach for determining the optical constants of the weakly absorbing substrate is developed and applied to obtain the parameters of CaF2 and fused silica substrates in deep ultraviolet (DUV) and vacuum ultraviolet (VUV) range. A method for extracting the optical constants of thin films deposited on strongly absorbing substrate, which is based on the reflectance spectra measured at different angles of incidence, is also presented. The optical constants are determined by fitting the measured spectra to the theoretical models. The proposed method is applied to determine the refractive index and extinction coefficient (n, k) of MgF2 film deposited on silicon substrate by electron beam evaporation with substrate temperature 300 ℃ and deposition rate 0.2 nm/s. The determined n, k values at 193 nm are 1.433 and 9.1×10-4, respectively. 相似文献
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真空紫外波段铝反射膜制备 总被引:1,自引:0,他引:1
为制备出在130~210nm波段具有良好光谱性能的铝反射膜,优化设计了铝反射镜中铝层和保护层氟化镁的厚度,理论确定铝层和氟化镁保护层最佳厚度分别为80nm和33nm。采用热舟蒸发工艺,在BK7基片上制备了Al反射膜样品,获得了130~210nm波长范围内反射率均大于80%的金属铝膜。研究了铝层沉积速率和紫外辐照处理对薄膜性能的影响,并考察了铝膜光谱性能的时效性。结果表明铝层沉积速率越快,制备的铝膜反射率越高;合理地存放铝膜元件,可以长时间内保持铝膜的光谱性能。适当的紫外辐照处理能进一步提高铝膜在真空紫外波段的反射率。 相似文献
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力学环境是影响骨组织细胞形成、增殖和功能成熟的一个重要因素.
骨细胞是力学感受细胞, 将力学信号传递给效应细胞;
成骨细胞、破骨细胞为力学效应细胞,
使骨形成和骨吸收处于动态平衡以维持骨力学稳定性.
目前对骨组织细胞间力学调控的机理仍不甚清楚.
综述了骨组织细胞力学生物学作用和细胞间力学调控的一些相关问题.
在概述了成骨细胞、骨细胞和破骨细胞的生物学特性基础上,阐述了骨重建力学调控理论,成骨细胞、骨细胞和破骨细胞生物力学效应和细胞间力学调控最新研究进展.
最后对骨组织细胞三维网络间力学调控研究做出展望. 相似文献
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Anti-Reflective Fluoride Coatings for Widely Tunable Deep-Ultraviolet Diode-Pumped Solid-State Laser Applications
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An anti-reflective (AR) fluoride coating in the 170-230 nm spectral range is prepared by the thermal evaporation method for the applications of widely tunable deep-ultraviolet diode-pumped solid-state lasers. The transmittance of an AR coated calcium fluoride (CaF2) window in thickness 3mm is measured to be in the range of 95.8% at 170 nm to 97.1 % at 230 nm, with the maximum transmittance 99.2% and the minimum residual reflectance 0.04% appeared at 195 nm. The experimental results indicate that treating the AR coated window and the bare substrate with ultraviolet irradiation can significantly improve their optical performance. 相似文献
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It is well known that the optical property of an optical thin film can be influenced by even small inho- mogeneity of refractive index (RI). In order to investigate the RI inhomogeneity of LaF3 single layer in deep ultraviolet (DUV) range, single-layer LaF3 samples deposited on fused silica and CaF2 substrates are prepared by resistive heating evaporation at different deposition temperatures. The reflectance and transmittance spectra of LaF3 film samples are measured with a spectrophotometer, and used to calculate the RI inhomogeneity. The experimental results show that no RI inhomogeneity of LaF3 film is observed when deposited on CaF2 substrate, while negative RI inhomogeneity is presented when deposited on fused silica substrate. The level of inhomogeneity is affected by the substrate temperature, which decreases with the increasing substrate temperature from 250 to 400 ℃. 相似文献
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