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本文研究了在酸性CdSO_4+HTeO_2~+6HgCl_2 电解液中多晶富镉Hg_(1-x),Cd_(?),Te(x>0.5)的电沉积过程,实现了三种离子在同一电位下共沉积的技术。对在钛基底上沉积出的薄膜进行XRD,SEM和EDAX分析,结果表明薄膜为闪锌矿型的多晶结构,分布均匀连续。考察了(1—x)=0.09时多晶薄膜在多硫氧化还原电对液中的光电化学行为,光强为100mW/cm~2时,短路光电流I_(sc)=1.88mA/cm~2,开路光电压V_(oc)=0.25V,填充因子F·F=0.22。由光电化学光谱所确定出的禁带宽度E_g=1.26eV,Mott-schottky曲线给出了电极的平带电位φfb为—1.26V(vs.SCE),从而得到开路光电压V_(oc)可能达到的最大值为0.49V。因此,多晶富镉Hg_(1-x)Cd_xTe薄膜是一种很有潜力的光活性电极材料。 相似文献
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富镉Hg_(1-x)Cd_xTe是一种新型的光电转换材料,已用于固体结太阳能光伏电池:ITO/CdS/Hg_(1-)Cd_xTe/Au。我们曾对Hg_(1-x)Cd_xTe的电沉积机理作过研究。最近我们用电沉积制备的Hg_(0.09)Cd_(0.91)Te多晶薄膜做成了液体结太阳能光电化学电池并观察到明显光电响应。 相似文献
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用自组装技术在金(纯金和经阳极氧化的金)表面上获得了新型两亲聚合物PAMC_(16)S的有序膜。用接触角测试,XPS谱和电化学分析等方法对自组装膜进行了表征。根据膜表面的润湿性,金表面的自组装膜是疏水的,亲水的磺酸基团连于金表面,而疏水的碳氢链从表面伸展出。XPS实验结果支持金表面上单层膜的疏水结构。聚合物单层膜复盖的金电极起到含有针孔缺陷的阻膈型电极的作用。单层膜在法拉第反应中显示很强的吸附稳定性,说明聚合物LB膜在潜在应用中有其特有的特点。 相似文献
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Electrodeposition process of polycrystalline Cd-rich Hg_(1-z)Cd_xTe (x>0.5) in acidic bath of CdSO_4+HTeO_2~+HgCl_2 was investigated. The simultaneous electrodeposition technique of three kinds of ions at the same potential has been achieved. The XRD, SEM and EDAX analysis of the thin film electrodeposited on titanium substrate showed a typical cubic zinc blende polycrystalline structure and homogeneous dispersion. The photoelectrochemical behavior of (1-x)=0.09 polycrystalline thin film in a polysulfide redox couple solution was examined. Under illumination of 100 mW/cm~2, the short circuit photocurrent I_(sc)=1.88 mA/cm~2, the open circuit photovoltage V_(oc)=0.25 V, the fill factor F·F=0.22. The bandgap E_g measured with photoelectrochemical spectroscopy is 1.26 eV. Flatband potential φ_(tb), Obtained from Mott-Schottky curve is -1.26 Ⅴ (vs. SCE). Therefore, the obtainable maximum open circuit photovoltage could be 0.49 Ⅴ. The Cd-rich Hg_(1-x)Cd_x Te thin film should be a potential photoactive el 相似文献
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Electrodeposition of CulnSe, was investigated in acidic solutions containing Cu~(2+), In~(3+) and HSeO_2~+ ions. The electrodeposition condition was optimized with the aim of obtaining uniform thin films on titanium substrate. The mechanism of the electrodeposition process is discussed. Structure analysis of the deposited film shows a typical polycrystalline chalcopyrite structure, good crystallinity and homogeneous dispersion. The photoelectrochemical cells made of these kinds of deposited films in polysulfide redox solution give distinct photoresponse. 相似文献
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