用于中子位置灵敏探测器的SiPM性能研究

为满足中国散裂中子源(China Spallation Neutron Source,CSNS)工程材料衍射谱仪的探测器需求,CSNS探测器组设计并研制了基于硅光电倍增管(Silicon Photomultiplier,SiPM)读出的闪烁体探测器。本工作针对该探测器,选取了Sensl MicroFJ-30035-TSV和Hamamatsu S13363-3050NE-16两种型号的SiPM,开展了其击穿电压、增益、温度特性、暗计数率等关键性能的测试。测试结果显示,两者单光子分辨能力,增益、暗计数率等性能均可满足当前闪烁体探测器需求,相同过偏压下,前者增益高于后者,且Hamamatsu SiPM增益对温度更敏感。测试了两SiPM的温度补偿系数分别为22.0 mV/℃(Sens1)和53.6 mV/℃(Hamamatsu),为后续SiPM温度补偿电路设计奠定了基础。利用研制的探测器工程样机,在CSNS BL09下测试了两种SiPM读出的探测器对2.8 ?中子探测效率分别为76%和68%,为目标探测器及同类型探测器的SiPM选型提供了参考。     

药典级DL-苹果酸的合成及精制工艺

采用正交设计试验研究了药典级DL－苹果酸的合成工艺。考察了反应物配料浓度、反应时间、反应温度等因素对转化率及选择性的影响。优化了合成工艺及精制方法，解决了达到药典级产品纯化的难题。     

Growth behaviors and emission properties of Co-deposited MAPbI3 ultrathin films on MoS2

Hybrid organic-inorganic perovskite thin films have attracted much attention in optoelectronic and information fields because of their intriguing properties. Due to quantum confinement effects, ultrathin films in nm scale usually show special properties. Here, we report on the growth of methylammonium lead iodide (MAPbI₃) ultrathin films via co-deposition of PbI₂ and CH₃NH₃I (MAI) on chemical-vapor-deposition-grown monolayer MoS₂ as well as the corresponding photoluminescence (PL) properties at different growing stages. Atomic force microscopy and scanning electron microscopy measurements reveal the MoS₂ tuned growth of MAPbI₃ in a Stranski-Krastanov mode. PL and Kelvin probe force microscopy results confirm that MAPbI₃/MoS₂ heterostructures have a type-II energy level alignment at the interface. Temperaturedependent PL measurements on layered MAPbI₃ (at the initial stage) and on MAPbI₃ crystals in averaged size of 500 nm (at the later stage) show rather different temperature dependence as well as the phase transitions from tetragonal to orthorhombic at 120 and 150 K, respectively. Our findings are useful in fabricating MAPbI₃/transition-metal dichalcogenide based innovative devices for wider optoelectronic applications.