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Characteristics and properties of metal aluminum thin film prepared by electron cyclotron resonance plasma-assisted atomic layer deposition technology
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Metal aluminum (Al) thin films are prepared by 2450-MHz electron cyclotron resonance plasma-assisted atomic layer deposition on glass and p-Si substrates using trimethylaluminum as the precursor and hydrogen as the reductive gas. We focus our attention on the plasma source for thin-film preparation and annealing of as-deposited films related to the surface square resistivity. The square resistivity of as-deposited Al film is greatly reduced after annealing and almost reaches the value of bulk metal. Through chemical and structure analysis we conclude that the square resistivity is determined by neither contaminant concentration nor surface morphology, but by both crystallinity and crystal size in this process. 相似文献
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1引言正丁酸是一种重要的精细化工原料,主要用于制造丁酸纤维素和合成丁酸酯,其酯类在香料、食品添加剂、医药等领域有广泛的应用。反应物中除目的产物外,尚有少量丙酸、丙醇以及丁酸丙酯等副产物,但其分析方法未见有报道,因此开发一种有效的分析方法,不仅可为科研过程及时提供准确的实验结果和指导该工艺合成研究,并可为该产品的工业化生产提供可靠的分析测试手段。2仪器与试剂正丁酸、丙醇、丙酸皆为分析纯试剂,含量均大于99.5%;正丁醛是含量为99.46%的工业品;醋酸丁酯是含量为e.刀%的工业品。采用MO)气相色谱… 相似文献
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Characteristics and properties of metal aluminum thin films prepared by electron cyclotron resonance plasma-assisted atomic layer deposition technology
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Metal aluminum (Al) thin films are prepared by 2450 MHz electron cyclotron resonance plasma-assisted atomic layer deposition on glass and p-Si substrates using trimethylaluminum as the precursor and hydrogen as the reductive gas. We focus our attention on the plasma source for the thin-film preparation and annealing of the as-deposited films relative to the surface square resistivity. The square resistivity of as-deposited Al films is greatly reduced after annealing and almost reaches the value of bulk metal. Through chemical and structural analysis, we conclude that the square resistivity is determined by neither the contaminant concentration nor the surface morphology, but by both the crystallinity and crystal size in this process. 相似文献
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分析了以石油焦为原料采用复合活化工艺制备的吸附剂的孔结构特性。发现吸附剂微孔含量在90%以上并且主要集中于1 nm~2 nm之间,是富含纳米孔的吸附材料。甲烷在此吸附剂上的吸附研究表明,在25 ℃,3.5 MPa的条件下,甲烷质量吸附量超过14.0%;有效体积吸附量超过120?V/V(吸附甲烷的体积/容器的体积)。甲烷在富纳米孔炭质吸附剂上的等温吸附曲线表明,吸附类型属于Ⅰ类吸附,符合微孔填充理论;等压吸附曲线表明,低温有利于体积吸附量的增加;吸附剂中水分的增加对吸附有不利的影响。 相似文献
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