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Ⅲ-Ⅴ化合物半导体外延单量子点具有类原子的分立能级结构,能够按需产生单光子和纠缠多光子态,而且可以直接与成熟的集成光子技术结合,因此被认为是制备高品质固态量子光源、构建可扩展性量子网络最有潜力的固态量子体系之一。本综述的重点是介绍高品质单量子点的分子束外延生长及精确调控的方法。首先介绍了晶圆级均匀单量子点的分子束外延生长,并探讨了调控浸润层态和量子点对称性的生长方法;接下来概述了利用应变层调控量子点发射波长的方法,总结了几种常见的电调控单个量子点器件的设计原理;最后讨论了最近为实现优异量子点光源而开发的液滴外延生长技术。 相似文献
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The test-QD in-situ annealing method could surmount the critical nucleation condition of InAs/GaAs single quantum dots(SQDs) to raise the growth repeatability.Here,through many growth tests on rotating substrates,we develop a proper In deposition amount(θ) for SQD growth,according to the measured critical θ for test QD nucleation(θ_c).The proper ratio θ/θ_c,with a large tolerance of the variation of the real substrate temperature(T_(sub)),is 0.964-0.971 at the edge and 0.989 but 0.996 in the center of a 1/4-piece semi-insulating wafer,and around 0.9709 but 0.9714 in the center of a 1/4-piece N~+ wafer as shown in the evolution of QD size and density as θ/θ_c varies.Bright SQDs with spectral lines at 905 nm-935 nm nucleate at the edge and correlate with individual 7 nm-8 nm-height QDs in atomic force microscopy,among dense 1 nm-5 nm-height small QDs with a strong spectral profile around 860 nm-880 nm.The higher T_(sub) in the center forms diluter,taller and uniform QDs,and very dilute SQDs for a proper θ/θ_c:only one 7-nm-height SQD in25 μm~2.On a 2-inch(1 inch = 2.54 cm) semi-insulating wafer,by using θ/θ_c = 0.961,SQDs nucleate in a circle in 22%of the whole area.More SQDs will form in the broad high-T_(sub) region in the center by using a proper θ/θ_c. 相似文献
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采用分子束外延技术对δ掺杂GaAs/AlxGa1-xAs二维电子气(2DEG)样品进行了生长. 在样品生长过程中, 分别改变掺杂浓度(Nd)、空间隔离层厚度(Wd) 和AlxGa1-xAs中Al组分(xAl)的大小, 并在双温(300 K, 78 K)条件下对生长的样品进行了霍尔测量; 结合测试结果, 分别对Nd, Wd及xAl与GaAs/AlxGa1-xAs 2DEG的载流子浓度和迁移率之间的关系规律进行了细致的分析讨论. 生长了包含有低密度InAs量子点层的δ掺杂GaAs/AlxGa1-xAs 2DEG 样品, 采用梯度生长法得到了不同密度的InAs量子点. 霍尔测量结果表明, 随着InAs量子点密度的增加, GaAs/AlxGa1-xAs 2DEG的迁移率大幅度减小, 实验中获得了密度最低为16×108/cm2的InAs量子点样品. 实验结果为内嵌InAs量子点的δ掺杂GaAs/AlxGa1-xAs 2DEG的研究和应用提供了依据和参考.
关键词:
二维电子气
InAs量子点
载流子浓度
迁移率 相似文献
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