A numerically stable algorithm for two server queue models

In this paper, we consider a queueing system in which there are two exponential servers, each having his own queue, and arriving customers will join the shorter queue. Based on the results given in Flatto and McKean, we rewrite the formula for the probability that there are exactlyk customers in each queue, wherek = 0, 1,…. This enables us to present an algorithm for computing these probabilities and then to find the joint distribution of the queue lengths in the system. A program and numerical examples are given.     

家庭的消费行为规律

家庭是社会消费的基本单位,大多数商品都是直接供家庭购买与消费的。即使是家庭个体成员的消费,也会受到家庭各方面因素的直接或间接的影响。家庭特征与家庭消费行为规律之间存在一定联系,尤其是家庭经济收入、家庭类型、家庭生命周期、家庭消费角色对家庭消费行为有很大的影响作用。探讨家庭的消费行为规律,对工商企业制定合理的营销策略有重要的意义。     

高等师范学校物理专业课程结构改革研究

为解决高等师范院校物理专业学生的知识结构和实际能力与社会需要明显不相适应的矛盾，我们对四年制物理专业的课程结构进行了全面改革。改革后，毕业生不仅能胜任普通中学或职业中学（职业中专）的教学，而且有能力参与厂矿企业的技术工作，具有更广泛的适应性和更强的竞争力。     

三种饲料添加剂对幼兔增重及饲料转化率的对比试验

对新球虫灵,喹乙醇,免健宝Ⅰ号,Ⅱ号配套复合饲料添加剂进行的幼兔饲养对比试验结果表明:以免健宝Ⅰ、Ⅱ号配套复合饲料添加剂联合效果为最佳,其它依次为单用兔健宝Ⅱ号、兔健宝Ⅰ号、喹乙醇,新球虫灵。而且兔健宝Ⅰ、Ⅱ号配套复合饲料添加剂有易混匀,简化配合饲料工序、节省饲料及增重快等优点。     

Metastability of a circular o-ring due to intrinsic curvature

An o-ring takes spontaneously the shape of a chair when strong enough torsion is applied in its tangent plane. This state is metastable, since work has to be done on the o-ring to return to the circular shape. We show that this metastable state exists in a Hamiltonian where curvature and torsion are coupled via an intrinsic curvature term. If the o-ring is constrained to be planar (2d case), this metastable state displays a kink-anti-kink pair. This state is metastable if the ratio is less than , where C and A are the torsion and the bending elastic constants [#!landau!#]. In three dimensions, our variational approach shows that . This model can be generalized to the case where the bend is induced by a concentration field which follows the variations of the curvature. Received: 27 August 1997 / Revised: 23 October 1997 / Accepted: 12 November 1997     

串联系统可靠性虚拟系统法置信下限的小样本性质

本文讨论了具有r个成败型元件串联系统可靠性的置信下限问题。研究了虚拟系统法置信下限的小样本性质,证明了,在通常情况下虚拟系统法置信下限要大于常见的L-M法置信下限.更一般地,本文证明了在成败型试验中,当成功数与试验数之比保持不变时,试验次数的增加将直接缩小成功率置信区间的长度。     

PADE’型逼近的收敛性

文章给出了Ｐａｄｅ型逼近积分形式的误差公式，并用该公式证明了Ｐａｄｅ型逼近的两个收敛定理．     

平面2n+1次系统极限环的唯一性

讨论了微分方程组 dx/dt=-y(1 -ax2 n) +bx-cx2 n+ 1,dy/dt=x(1 -ax2 n) ,并且给出了其极限环存在唯一的条件 .     

The method of concentrating a substance from a solution in a stationary sorbent layer and its theoretical basis

The principle of concentrating a substance from a mixture flow in a stationary sorbent layer of infinite length that was previously developed for gas chromatography is extended to liquid chromatography. Translated fromIzevestiya Akademii Nauk. Seriya Khimicheskaya, No. 5, pp. 1063–1065, May, 1997.     

Radical copolymerization of 2‐trifluoromethylacrylic monomers. II. Kinetics,monomer reactivities,and penultimate effect in their copolymerization with norbornenes and vinyl ethers

Radical copolymerizations of electron‐deficient 2‐trifluoromethylacrylic (TFMA) monomers, such as 2‐trifluoromethylacrylic acid and t‐butyl 2‐trifluoromethylacrylate (TBTFMA), with electron‐rich norbornene derivatives and vinyl ethers with 2,2′‐azobisisobutyronitrile as the initiator were investigated in detail through the analysis of the kinetics in situ with ¹H NMR and through the determination of the monomer reactivity ratios. The norbornene derivatives used in this study included bicyclo[2.2.1]hept‐2‐ene (norbornene) and 5‐(2‐trifluoromethyl‐1,1,1‐trifluoro‐2‐hydroxylpropyl)‐2‐norbornene. The vinyl ether monomers were ethyl vinyl ether, t‐butyl vinyl ether, and 3,4‐dihydro‐2‐H‐pyran. Vinylene carbonate was found to copolymerize with TBTFMA. Although none of the monomers underwent radical homopolymerization under normal conditions, they copolymerized readily, producing a copolymer containing 60–70 mol % TFMA. The copolymerization of the TFMA monomer with norbornenes and vinyl ethers deviated from the terminal model and could be described by the penultimate model. The copolymers of TFMA reported in this article were evaluated as chemical amplification resist polymers for the emerging field of 157‐nm lithography. © 2004 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 42: 1478–1505, 2004