Modeling hyperelastic behavior of rubber: A novel invariant‐based and a review of constitutive models

A constitutive phenomenological model completing the Gent‐Thomas concept is carried out to formulate laws governing the hyperelastic behavior of incompressible rubber materials. It is shown that the phenomenological Gent‐Thomas model (1958) and the constrained chain model (1992) give similar precise results at small to moderate deformation. On the other hand, comparisons of the outcome of the proposed model with that of the molecular model from the combined concepts of Flory‐Erman and Boyce‐Arruda (2000), and with those of the phenomenological models of Ogden (1982), Yeoh‐Fleming (1997), Pucci‐Saccomandi (2002) and Beda (2005) are made. Residual inconveniences raised by attractive continuum models in rubber elasticity literature have been successfully overcome. Results from both the statistical and phenomenological mechanics concepts are compared with the data of some useful classical materials (rubbers of Treloar, Rivlin‐Saunders, Pak‐Flory and Yeoh‐Fleming). The results permit one to see salient equivalence of the two theories for a more reliable prediction of stress‐stretch response for all states of any mode of deformation. A complete and exhaustive analysis of the Mooney plot that combines small and very large extension‐compression has been quite essential in assessing the validity of models. A method of identification of material parameters is presented and data of the simple tension suffice for the determination of the parameter values. It is shown that the ordinary identification procedures, such as the usual least squares, a very much used numerical method in materials investigation, can be unsuitable in some cases of hyperelastic modeling. © 2007 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 45: 1713–1732, 2007     

化学分析在火灾原因技术鉴定中的应用

采用化学分析方法对火灾现场中的微量油品、特殊物质和混凝土等痕迹物证的化学分析鉴定,对火灾原因和火灾责任的认定起关键作用.     

白血病小鼠模型中P53、C-myc基因表达的变化研究

探讨DNA、RNA病毒诱导小鼠发生白血病的机制。用单纯疱疹病毒Ⅱ型（HSV－2）和C型RNA病毒诱导70只昆明小鼠，光学显微镜检测HSV－2、C型病毒诱导发生白血病的成功率。正常对照组为30只昆明小鼠。免疫组化法检测HSV－2、C型病毒致瘤后P^53、G－myc基因表达的变化。70只昆明小鼠中有47只发生白血病，成功率为67．1％。47只白血病小鼠P^53、C－myc蛋白阳性表达率均比正常对照组高（P＜0．05）；23只未形成白血病的实验组小鼠P^53、C－myc蛋白阳笥表达率均与正常对照组无显差异（P＞0．05）。HSV－2、C型病毒可以通过调节P^53、C－myc基因的表达从而诱导小鼠白血病的发生。     

解决二维合理下料问题的一种新方法

为解决二维合理下料问题,本文提出了一种新的下料方法,给出相应的数学模型及计算方法。此方法具有简单、计算量小等特点。实例计算表明,它对节省板材效果显著。     

面向对象的系统活动描述方法

通过实例介绍了系统活动作为一个对象／类的概念，给出了对系统活动进行分析和建模的一般步骤，提出了系统活动描述的形式化方法。     

铝电解过程控制信号的滤波与噪声解析模型的研究

将快速傅里叶变换技术和数字滤波器设计技术应用于铝电解过程控制信号的滤波与噪声解析模型中,在160kA中间点式下料预焙槽上的试验结果表明了模型的有效性。     

溶剂化缔合物模型与溶解度

提出了一种适合于研究非理想溶液的溶剂化缔合物模型.借助该模型,对物质的溶解度在定量和半定量的水平上进行了研究,并获得了满意的结果。     

中能区反质子与原子核散射的极化度

在已获得的中能区反质子与核的中心势的光学势基础上,把光学势扩大到包含自旋轨道耦合势.在反质子能量为179.8,294.8和508MeV各情况下,分别计算和分析与~(12)C靶核的微分截面(dσ)/(dΩ),极化度P(θ)和自旋转动函数Q(θ).在与极化度的实验比较中,得到中能区普遍形式的反质子光学势.     

jj耦合g因子

本文从矢量模型出发，导出纯ｊｊ耦合下ｇ因子表达式，并证明了当近似取ｇｓ＝２时，该式等价于量子力学的ｇ因子矩阵略去非对角元的结果，说明了矢量模型的近似程度。     

Radical copolymerization of 2‐trifluoromethylacrylic monomers. II. Kinetics,monomer reactivities,and penultimate effect in their copolymerization with norbornenes and vinyl ethers

Radical copolymerizations of electron‐deficient 2‐trifluoromethylacrylic (TFMA) monomers, such as 2‐trifluoromethylacrylic acid and t‐butyl 2‐trifluoromethylacrylate (TBTFMA), with electron‐rich norbornene derivatives and vinyl ethers with 2,2′‐azobisisobutyronitrile as the initiator were investigated in detail through the analysis of the kinetics in situ with ¹H NMR and through the determination of the monomer reactivity ratios. The norbornene derivatives used in this study included bicyclo[2.2.1]hept‐2‐ene (norbornene) and 5‐(2‐trifluoromethyl‐1,1,1‐trifluoro‐2‐hydroxylpropyl)‐2‐norbornene. The vinyl ether monomers were ethyl vinyl ether, t‐butyl vinyl ether, and 3,4‐dihydro‐2‐H‐pyran. Vinylene carbonate was found to copolymerize with TBTFMA. Although none of the monomers underwent radical homopolymerization under normal conditions, they copolymerized readily, producing a copolymer containing 60–70 mol % TFMA. The copolymerization of the TFMA monomer with norbornenes and vinyl ethers deviated from the terminal model and could be described by the penultimate model. The copolymers of TFMA reported in this article were evaluated as chemical amplification resist polymers for the emerging field of 157‐nm lithography. © 2004 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 42: 1478–1505, 2004