人性与人性平衡初探

人性是由生存欲、占有欲、性爱、情爱、责任心、义务感、同情心、怜悯心、惰性等多种要素组成的。人性诸要素之间的关系是互相平衡与互相制约的。这种平衡与制约遵循着四大规律：第一,人性要素的不可缺失性;第二,人性总体和总趋势平衡;第三,人性某个或某些要素扩张有一个“度”;第四,人性平衡是由简单到复杂、由低级到高级、由个别到普遍的发展过程。     

同相水深-辐射关系率定

介绍了水体同相的概念,利用水体地质、地貌、沉积和水文等条件确定水体同相的方法,以及在水体同相前提下建立水深－辐射关系的实用性,并提出了利用稳定水下地形且测深资料的水域进行水深－辐射关系借地率定的新思路,探索了利用卫星遥感测量水下地形的新方法,该方法弥补了以往遥感测深需要低含沙的清澈水体的缺陷。     

化学法清洗硅片过程中清除颗粒的机理(英文)

对化学法清洗硅片过程中消除颗粒的机理作了定量的探讨。颗粒的清除是由于化学蚀刻和颗粒与表面排斥力共同作用的结果。首次提出了最浅蚀刻深度和最小蚀刻速度的概念。最浅蚀刻深度可通过颗粒与表面间作用能的关系进行计算。是小蚀刻速度则可通过蚀刻侧形进行计算。研究结果对于优化化学法清洗过程和设计高性能清洗液都具有重要意义。     

Error surface calculations on the parameters defining oxygen depth profile models fitted to ARXPS data obtained from polystyrene exposed to an oxygen/helium plasma

Error surfaces are calculated for the fitting of concentration–depth profiles to angle‐resolved x‐ray photoelectron spectroscopy (ARXPS) data. The shapes of the error surfaces indicate that model parameters related to composition (especially at the very surface of the sample) are well constrained by the data, whereas parameters related to depth have a less significant impact on the fit. It is then shown that certain parameters in the different depth profile models employed are highly correlated and that the different models convey essentially the same information in different ways. Finally, a compromise profile definition is proposed for the fitting of constrained but flexible depth profiles to ARXPS data. Copyright © 2003 John Wiley & Sons, Ltd.     

双峰倍增配平法用于同步、导数-同步荧光法同时测定邻羟基苯甲酸和间羟基苯甲酸

邻羟基苯甲酸（ｏＨＢＡ）和间羟基苯甲酸（ｍＨＢＡ）荧光光谱严重重叠，同步及导数技术虽使选择性有所改善，但仍不能完全分辨开重叠谱。用双峰倍增配平计算法结合同步、一阶导数－同步荧光法对双组分体系（邻羟基苯甲酸／间羟基苯甲酸，ｐＨ１２介质）同时测定。结合计算的两种测定方法精密度、回收率和不同组分间浓度比范围均优于一阶导数－同步荧光法。     

Dominant Factors Affecting the Chromatographic Behaviour of Bile Acids

With the aim of optimizing the chromatographic process by avoiding any preliminary derivatizing step, we examined the chromatographic behaviour of a selected set of unconjugated bile acids looking at the dominant factors that affect the performances of three different stationary phases: RP-8, RP-18 and RP-18 Base Deactivated (RP-18-BD). Accordingly to its structural peculiarity, the RP-18-BD column combined with a specific mobile phase has proved to be the most suitable one, in enhancing both separation factor α and resolution R _S within the selected set of analytes. Pronounced changes in the chromatographic profiles by only slightly changing the mobile phase composition (pH, buffer concentration, percentage and kind of organic modifier) prompted us to achieve satisfactory results in the separation and resolution of the selected set of bile acids.Presented at: CE in the Biotechnology & Pharmaceutical Industries: 7th symposium on the practical applications for the analysis of proteins, nucleotides and small molecules, Montreal, Canada, August 12–16, 2005.An erratum to this article can be found at     

Eco-dyeing and functional finishing of wool fabric based on Portulaca oleracea L. as colorant and Musa basjoo as natural mordant

Biomass energy is the most acknowledged renewable resource due to its universality, richness, and renewability. This study utilized a Portulaca oleracea L. plant as a natural colorant for wool fabric dyeing with a high color yield at optimum extraction and dyeing conditions. To evaluate the dyeing mechanism and feasibility of the extracted dyes, we analyzed and characterized the molecular structure and nano-level particle size. The dyeing kinetics and the morphology of dyed fabrics were integratedly explored; the adsorption process of wool fabric on natural colorant molecules was increasingly in line with the pseudo-second-order kinetic adsorption model. Further, the dyeing effects of wool fabrics were compared to that of Musa basjoo mordant and synthetic dyes to confirm the superior color depth (K/S value 23.53), biological function as anti-ultraviolet (UPF value 253.47), and anti-bacterial activity (antibacterial rate of Staphylococcus aureus/Escherichia coli was 71.3%/37%). Our findings provide a feasible scheme for providing deep color and biological activity to wool fabrics. This has broad application prospects in the field of eco-friendly textile materials.     

Cathodoluminescence Depth Profiling in SiO2:Ge Layers

 For investigation of the luminescent center profile cathodoluminescence measurements are used under variation of the primary electron energy E ₀ = 2…30 keV. Applying a constant incident power regime (E ₀·I ₀ = const), the depth profiles of luminescent centers are deduced from the range of the electron energy transfer profiles dE/dx. Thermally grown SiO₂ layers of thickness d = 500 nm have been implanted by Ge⁺-ions of energy 350 keV and doses (0.5–5)10¹⁶ ions/cm². Thus Ge profiles with a concentration maximum of (0.4 – 4) at% at the depth of d_m≅240 nm are expected. Afterwards the layers have been partially annealed up to T _a = 1100 °C for one hour in dry nitrogen. After thermal annealing, not only the typical violet luminescence (λ = 400 nm) of the Ge centers is strongly increased but also the luminescent center profiles are shifted from about 250 nm to 170 nm depth towards the surface. This process should be described by Ge diffusion processes, precipitation and finally Ge nanocluster formation. Additionally, a Ge surface layer is piled-up extending to a depth of roughly 25 nm.     

Metastable systems driven by colored noise: The stationary state

The influence of the Bardeen-Herring back-jump correlations on the Fermi-Dirac statistics of the one-dimensional nonhomogeneous fermionic lattice gas is studied by the Monte Carlo simulation technique and semianalytically. The resulting distribution is obtained, exhibiting increased population of the lower levels in comparison to the Fermi-Dirac statistics.     

Influence of surface structure on surface analytical statements

The influence of surface structure of technical materials on results and statements of surface analytical methods has been investigated. Especially surface roughness as a typical property of rolled products has been observed. For this purpose samples of steel (technical surface, roughness up to 5 m) and silicon wafers (polished surface) have been analyzed by SNMS and GDOS in order to get information about changes of the surface roughness as function of the sputtering time and their influence on the statements about the depth profiles obtained.