四子孔径光学合成孔径成像系统空间排布性能分析

对三种空间排布结构的四子孔径光学合成孔径成像系统性能进行了分析.根据避免有效频率信息丢失的原则,分别计算了三种结构各自对应的空间排布限制条件.在此基础上得到了三种结构的有效频率覆盖范围和等效孔径.结果表明,当频率覆盖范围要求比较高时,只能选择三臂结构;当环形均匀结构和三臂结构具有相同的有效频率覆盖范围时,按照抑制次峰的选择标准,三臂结构要优于环形均匀结构;当环形优化结构和三臂结构具有相同的有效频率覆盖范围时,环形优化结构的点扩展函数次峰要明显大于三臂结构,而且环形优化结构的光学传递函数缺乏三臂结构的对称特性.     

Atomic layer deposition: An efficient tool for corrosion protection

Atomic layer deposition (ALD) is now a widely implemented thin film growing method. It is currently used in industrial fabrication processes of microelectronics and luminescent display technologies. Since compact and conformal films can be grown with perfect control of the thickness, ALD is envisioned in numerous other applications fields such as energy, sensing, biomaterials, and photonics. Although few reports can be found on its application to corrosion protection, it has been shown that the qualities of ALD can be highly beneficial to this field. After a brief review of the principle of ALD and the effect of the main parameters on the properties of the films, this report attempts to show the interest of this technique to mitigate corrosion. Various examples of successful uses of ALD to protect metallic and non-metallic surfaces in different fields are reviewed.