NOx在固体电解质电解池上的电化学消除

 综述了近年来利用固体电解质电解池消除NO的研究进展．重点总结了电化学消除NO研究体系、电化学消除NO分解机制、O2－在固体电解质电解池中传导的控速步骤、电极种类和形态对NO分解性能的影响以及直流与交流电作用的差异等几个方面的研究结果．在RuO2—Ag—YSZ—Pd电解池上实现的NO选择性分解是迄今为止的最佳结果，500℃下NO的转化率为31．8％，NO的分解活性是O2的分解活性的13倍．该领域今后研究的主要方向是，进一步提高NO分解相对于共存O2离子化的选择性、降低O2－在阴极界面处的传导阻力和探寻可在更低温度传导O2－的新的固体电解质     

催化裂化USY／ZnO／Al2O3脱硫添加剂的高温水热失活

 对USY／ZnO／Al2O3汽油催化裂化脱硫添加剂经高温水热老化处理前后的脱硫性能进行了考察，发现老化后添加剂的脱硫性能大幅度下降．采用XRD和IR等技术对USY／ZnO／Al2O3添加剂在高温和高温水热条件下失活的原因进行了研究．结果表明，在高温下，ZnO可与USY沸石中的铝发生固相反应生成ZnAl2O4尖晶石，从而造成USY晶体结构崩塌，转变成无定形状态．在ZnO含量较高的条件下，ZnO可继续与USY晶体结构崩塌后生成的无定形的硅和铝的氧化物反应，生成Zn2SiO4硅锌矿和ZnAl2O4尖晶石结构．这一方面使添加剂失去了可形成硫化物吸附中心的ZnO，另一方面破坏了硫化物的裂化活性组分USY，从而造成添加剂脱硫性能下降甚至失去脱硫活性．ZnO对USY的破坏作用主要与温度有关．在USY／ZnO／Al2O3体系中，ZnO被ZnO与Al2O3之间形成的锌铝尖晶石膜固定并与USY隔离，单纯的高温条件对添加剂的破坏不显著，而水蒸气可以促进ZnO的移动，有利于ZnO与USY的接触，因此在高温和有水蒸气存 在的条件下添加剂的结构易遭到破坏．     

铜基催化剂的结构、物性及其对混合碳四选择加氢反应的催化性能

 用XRD，XPS，SEM和H2－TPR等手段研究了铜基负载型催化剂的结\r\n构和物性及其对混合碳四加氢脱炔的催化性能．结果表明，在负载铜催\r\n化剂中加入一定量的Co可提高催化剂的加氢脱炔活性，而Co含量较少时\r\n加入少量的Ce也能提高催化剂的活性和选择性．Cu和Co之间存在着相互\r\n协同作用，使得活性组分在催化剂表面偏析，CuO在催化剂表面呈非晶\r\n相分散状态，催化剂颗粒粒径变小，催化剂更容易被还原，从而改善了\r\n催化剂的催化性能．     

催化裂化汽油脱硫添加剂USY/ZnO/Al2O3的性能评价

 在固定流化床催化裂化装置上，以减压蜡油为原料，对制备的U\r\nSY／ZnO／Al2O3催化裂化汽油脱硫添加剂的性能进行了评价．结果表明\r\n，随着添加剂添加量和剂油比的增加，生成汽油的硫含量降低．在500\r\n℃和剂油比为5的条件下，在FCC平衡催化剂中添加30％的添加剂时，汽\r\n油的硫含量可由不加添加剂时的1230μg／g降低到770μg／g左右．添\r\n加剂的添加量（10％）较低时，对催化裂化产物的分布基本没有影响；\r\n添加30％的添加剂时，焦炭的产率有所增加，但汽油收率基本不变．X\r\nRD表征结果表明，USY／ZnO／Al2O3添加剂中的ZnO对USY的晶相结构有\r\n一定的破坏作用，但随着反应与再生次数的增多，ZnO与Al2O3之间形成\r\n较为稳定的锌铝尖晶石结构，使添加剂的性能趋于稳定．     

The study of electron beam flue gas treatment for coal-fired thermal plant in Japan

The fundamental research work with simulated coal-fired flue gas was performed in JAERI to get basic data for electron beam treatment of flue gas from thermal power plants in Japan. The standard condition of the experiments was set to be the same as that of next large scale pilot test in Nagoya. The concentrations of NO_x and SO_x were 225 ppm and 800 ppm, respectively. The temperature of the system was 65°C. The effect of multiple irradiation was observed for NO_x removal. The target SO_x and NO_x removals (94% and 80%, respectively) with low NH₃ leakage (less than 10 ppm) were achieved at 9 kGy irradiation with 0.9 NH₃ stoichiometry during 7 hours continuous operation. The facility for the pilot plant (12,000 Nm³/hr) has just built at the site of Shin-Nagoya power plant of Chubu Electric Power Company and will be started in full operation in November 1992.     

Protection of immobilized sulfhydryl groups against autooxidation by alterations in their microenvironment

Immobilized sulfhydryl groups were prepared by partial thiolation of NH₂-glass beads. The microenvironment of the immobilized SH groups was varied by different chemical modifications of neighboring NH₂ groups. Introduction of a strong charge in the surroundings of immobilized sulfhydryls results in their dramatic stabilization against autooxidation. This effect is due to the salting of O₂ from the surface microlayer of the thiolated beads.     

Synthesis of Nonracemic 9-(1-Methoxycarbonylethyl)-1,2,3,4-tetrahydrocarbazole

A new approach has been proposed to the synthesis of indole derivatives containing a chiral substituent at the nitrogen atom, comprizing Fischer indolization of phenylhydrazines with a chiral substituent at the -nitrogen atom. The initial hydrazines were obtained by the alkylation (Mitsunobu reaction applying optically active esters of lactic acid) of anilines containing an electron-accepting substituent at the amino group. Subsequent removal of the activating acceptor grouping was realized by nitrosation of the chiral secondary aniline followed by reduction of the corresponding N-nitroso compound.     

Shape analysis based critical Eotvos numbers for buoyancy induced partial detachment of oil drops from hydrophilic surfaces

Removal of oil drops from solid surfaces immersed in an aqueous medium is of interest in many applications. It has been shown that drop shape analysis can be used to predict conditions at which the stability limit of a lighter than water oil drop on a solid surface immersed in an aqueous bath is reached (Adv. Colloid Interface Sci. 98 (2002) 265). However the above analysis is restricted to cases where the contact angle made by the drop is below 90degrees and when the surface conditions result in a 'pinned' contact line. In this paper, it is shown that drop shape analysis can be used to predict the critical conditions at which drop stability limit is reached for drop contact angles of 90degrees and above, which is encountered with 'hydrophilic' surfaces. This critical condition can predict the occurrence of partial oil drop detachment, before complete removal due to 'roll-up', which occurs when the hydrophilic surface is adequately smooth which prevents 'pinning' of the contact line. The critical conditions at which partial drop detachment occurs can also be approximately predicted from simple force balances. It has been shown (Adv. Colloid Interface Sci. 98 (2002) 265) that for contact angles less than 90degrees, the critical limit based on shape analysis appears to resolve the differences that arise due to alternate expressions for capillary retention force. This paper shows that even for contact angles above 90degrees, the critical conditions predicted from the shape analysis resolves the differences in the predictions from the alternate force balances. Drop shape analysis used in this paper is based on the 'Arc-length' form of Young-Laplace or 'drop shape' equation, which is different from the 'Y vs X' form of the above equation that is used in Adv. Colloid Interface Sci. 98 (2002) 265. The above drop shape equation is solved by a fourth order Runge-Kutta technique and it is shown that for angles less than 90degrees, the two forms of the drop shape equation, predict almost identical values of the critical Eotvos number. This paper highlights the competing effects of interfacial tension lowering induced drop instability and 'roll-up', a term that is used to describe the retraction of the contact line of an oil drop on a surface, in being the primary c ause for drop detachment.     

化学法清洗硅片过程中清除颗粒的机理(英文)

对化学法清洗硅片过程中消除颗粒的机理作了定量的探讨。颗粒的清除是由于化学蚀刻和颗粒与表面排斥力共同作用的结果。首次提出了最浅蚀刻深度和最小蚀刻速度的概念。最浅蚀刻深度可通过颗粒与表面间作用能的关系进行计算。是小蚀刻速度则可通过蚀刻侧形进行计算。研究结果对于优化化学法清洗过程和设计高性能清洗液都具有重要意义。