Optical properties of amorphous films

We have analyzed the optical properties of a-Ge_30-xSb_xS₇₀ chalcogenide glass films (x=0,10,20 and 30 at%); the chalcogenide films were prepared by vacuum thermal evaporation. The optical-absorption data indicate that the absorption mechanism is non-direct transition. We found that the optical band gap, E_opt, decreases from 2.04±0.01 to 1.74±0.01 eV, whereas the refractive index increases with increasing Sb content. Data are analyzed by the Wemple equation, which is based on the single-oscillator model.     

Perfluoro(methylcyclohexane) plasma polymer thin film: Growth,surface morphology,and properties investigated by scanning thermal microscopy

Scanning thermal microscopy (SThM) has been used for the visualization and characterization of an ultrathin plasma polymer film of perfluoro(methylcyclohexane) at a submicrometer level. The morphology, molecular dynamics, and lateral homogeneity of the ultrathin film have all been examined precisely with SThM. The growth of the plasma polymer film on a silicon wafer (Si‐wafer) has also been precisely determined using a new burning‐hole technique. © 2005 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 43: 1392–1400, 2005     

掺CH4的SiCOH低介电常数薄膜结构与介电性能研究

以十甲基环五硅氧烷和甲烷作为反应气体，采用电子回旋共振等离子体化学气相沉积(ECR-C VD)方法制备了k = 2.45，485℃下的热稳定性优良的SiCOH低介电常数薄膜.通过薄膜结构的 FTIR谱分析，比较了十甲基环五硅氧烷(D5)液态源和不同甲烷流量下制备的薄膜的键结构差 异，发现在沉积过程中甲烷含量的增大，一方面有利于D5源环结构的保留，另一方面有利于 薄膜中形成高密度的CH_n基团.高密度碳氢大分子基团的存在降低了薄膜密度， 结合薄膜中形成的本构孔隙、低极化率Si—C键以及—OH键减少的共同作用，导致薄膜介电 常数的降低. 关键词： 低介电常数 SiCOH薄膜 碳氢掺杂     

电子助进化学气相沉积金刚石中发射光谱的蒙特卡罗模拟

采用蒙特卡罗方法，对源料气体为CH4/H2混合气的电子助进化学气相沉积（EACVD）中 的氢原子(H)、碳原子(C)以及CH基团的发射过程进行了模拟.研究了CH4浓度、反应室气压 和衬底偏压等工艺参数对发射光谱及成膜的影响.研究发现，CH基团可能是有利于金刚石薄 膜生长的活性基团，而碳原子不是；偏压的升高可提高电子平均温度及衬底表面附近氢原子 的相对浓度；通过氢原子谱线可测定电子平均温度并找到最佳成膜实验条件.该结果对EACVD 生长金刚石薄膜过程中实时监测电子平均温度，有效控制工艺条件，生长出高质量的金刚石 薄膜具有重要的意义. 关键词： 蒙特卡罗模拟 金刚石薄膜 发射光谱     

Preparation of polymethylsilsesquioxanes by the base‐catalyzed hydrolytic polycondensation of triisopropoxy(methyl)silane

Base‐catalyzed hydrolytic polycondensation of trialkoxymethylsilane was investigated to synthesize polymethylsilsesquioxanes (PMSs). The reaction of trimethoxy(methyl)silane and triethoxy(methyl)silane with tetramethylammonium hydroxide, tetrabutylammonium hydroxide, and also coline gave insoluble gels. Polymethylsilsesquioxane (PMS‐IP) was obtained by the reaction of triisopropoxy(methyl)silane (MTIPS) with tetrabutylammonium hydroxide as a catalyst. PMS‐IP was composed primarily of T² and T³ units. The percentage of T³ units and the molecular weight of PMS‐IP increased with increases in the molar ratios of catalyst and water to MTIPS and with the reaction time. PMS‐IP was soluble in organic solvents, except for methanol, and was separated by extraction with hexane and methanol into low‐ and high‐molecular‐weight fractions of M_w 2800–4000 and 7300–88,300, respectively. PMS‐IP coating films were prepared by dip coating on the organic, inorganic, and metal substrates, using the acetone–isopropyl alcohol solution of PMS‐IP. Since PMS‐IP solutions prepared with tetrabutylammonium hydroxide were hardly used because of the low content of hydroxy groups in the polymer, they showed low adhesion when compared with those solutions prepared with hydrochloric acid. The dielectric constant of the coating film prepared from the high‐molecular‐weight PMS‐IP was 2.6. © 2005 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 43: 3623–3630, 2005     

电感耦合等离子体CVD低温生长硅薄膜过程中的铝诱导晶化

利用电感耦合等离子体CVD方法在350℃的低温下在镀Al玻璃衬底上制备出具有良好结晶性的Si薄膜.利用x射线衍射、紫外-可见分光椭圆偏振谱、原子力显微镜及x射线光电子谱等研究了薄膜的结构、表面形貌和成分分布等.结果表明，用这种方法制备的Si薄膜不但晶化程度高，而且具有良好的（111）结晶取向性，晶粒尺寸大于300nm，样品中无Al的残留.结合电感耦合等离子体的高电子密度特征讨论了低温生长过程中Al诱导Si薄膜晶化的机理. 关键词： 电感耦合等离子体CVD Al诱导晶化 Si薄膜 低温生长     

The suppression of structural phase transformation in LaVO3 and La1−xSrxVO3 thin films fabricated by pulsed laser deposition

Highly oriented (100) thin films of LaVO₃ and La_1−xSr_xVO₃ have been fabricated by pulsed laser deposition in a reducing atmosphere. The films show a transition from insulating to metallic behaviour in the composition region of x, 0.175<x<0.200. In the single crystals of the antiferromagnetic insulating phase, a first-order structural phase transition is observed few degrees below the magnetic transition, which manifests itself as a kink in the temperature dependence of resistivity. In the highly oriented thin films of LaVO₃ and La_1−xSr_xVO₃ fabricated on lattice matched substrates in this study, the structural phase transformation in the insulating phase has been suppressed. The electrical conduction is found to take place via hopping through localized states at low temperatures. The metallic compositions show a non-linear (T^1.5) behaviour in the temperature dependence of resistivity. V (2p) core level spectra of these films show a gradual change in the relative intensities of V³⁺ and V⁴⁺ ions as the value of x increases.     

温度对ZnO/Al2O3(0001)界面的吸附、扩散及生长初期模式的影响

构建了一个ZnO沉积在α-Al₂O₃(0001)表面生长初期的模型，采用基于密度泛函理论的平面波超软赝势法进行了动力学模拟.发现在400，600和800℃的条件下界面原子有不同的扩散能力，因此温度对ZnO/α-Al₂O₃(0001)表面界面结构以及ZnO薄膜生长初期模式有决定性的影响.在整个ZnO吸附生长过程中，O原子的扩散系数大于Zn原子的扩散系数，O原子的层间扩散对薄膜的均匀生长起着重要作用.进一步从理论计算上证实了ZnO在蓝宝石(0001)上两种生长模式的存在，400℃左右生长模式主要是Zn螺旋扭曲生长，具有Zn六角平面对称特征，且有利于Zn原子位于最外表面.600℃左右呈现为比较规则的层状生长，且有利于O原子位于最外表面.模拟观察到在ZnO薄膜临近Al₂O₃基片表面处，Zn的空位缺陷明显多于O的空位缺陷. 关键词： 扩散 薄膜生长 2O₃(0001)')" href="#">α-Al₂O₃(0001) ZnO