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101.
Superlattices of cubic gallium nitride (GaN) and gallium arsenide (GaAs) were grown on GaAs(1 0 0) substrates using metalorganic vapor phase epitaxy (MOVPE) with dimethylhydrazine (DMHy) as nitrogen source. Structures grown at low temperatures with varying layer thicknesses were characterized using high resolution X-ray diffraction and atomic force microscopy. Several growth modes of GaAs on GaN were observed: step-edge, layer-by-layer 2D, and 3D island growth. A two-temperature growth process was found to yield good crystal quality and atomically flat surfaces. The results suggest that MOVPE-grown thin GaN layers may be applicable to novel GaAs heterostructure devices.  相似文献   
102.
The GaAs material is a major semiconductor material, and it has high electron transfer rate and direct transition energy band structure. The devices and inte-grated circuits fabricated on the GaAs substrates have a lot of advantages such as high speed information processing. Small perturbations in the manufacturing of GaAs materi-als can lead to defects. The defects in the GaAs materials can degrade the performance of materials. A new method is presented in this paper for detecting the micro-defects in GaAs materials by using time resolved emissions. In this method, the micro-defects in GaAs materials are detected by making use of the photon emission features of micro- defects. The strength of the emitted photons from the micro-defects is increased by applying the electric current or the periodic pulse signals to GaAs materials. The single-photon detector is used to detect the photon emissions of the micro-defects. The time resolved photon emissions and single-photon detection are used to record and compare the amounts of the emitted photons that come from the given regions of the normal GaAs materials and the defective GaAs materials. A lot of experimental results show that the micro-defects in the GaAs materials can be detected by using the method proposed in this paper.  相似文献   
103.
射频等离子硫钝化GaAs(100)的表面特性   总被引:11,自引:10,他引:1  
采用射频等离子方法,对Ga As(100)衬底片表面进行干法硫等离子体钝化,旨在得到性能稳定含硫钝化层。样品经过360℃温度条件下的快速热退火,光致发光(PL)测试表明,钝化后的样品PL强度上升了71%。同时,钝化样品的稳定性测试结果表明,样品放置在实验室空气中30 d,其PL强度未出现明显变化,说明Ga As的等离子体干法硫钝化具有较好的性能稳定性。  相似文献   
104.
We demonstrate a remarkable thickness dependence of nonlinear optical response of exciton–polaritons in GaAs thin films by degenerate four-wave mixing (DFWM) at low temperature (T=5 K). High-quality samples of layer thickness from 80 to 200 nm were grown by molecular beam epitaxy. Confined mode of the exciton–polariton dominantly contributed to the reflection spectra, which were examined by the calculation using a transfer matrix method. The DFWM intensity at exciton resonance was enhanced at a particular thickness (110 nm). This thickness dependence is in good agreement with the nonlocal theory, which shows a remarkable size dependence of the internal field relevant to the confined mode of the exciton–polaritons.  相似文献   
105.
在真空中解理后,用XPS测得了GaAs样品(110)断面能带弯曲的动态过程.两组重掺杂n型和p型GaAs样品的费米能级分别向禁带中间的方向移动了0.4eV和0.3eV.实验测得重掺杂n型和p型GaAs样品费米能级之差为1.3eV,它们的禁带宽度理论值为1.42eV,这说明结果是合理的.根据实验结果,对引起GaAs表面能带弯曲的可能原因进行了分析讨论.排除了本征表面态、真空中残留气体和X射线辐射等原因,认为解理过程在表面产生的缺陷和解理后表面晶格弛豫过程中产生的缺陷可能是导致能带弯曲的主要原因.  相似文献   
106.
The self-organized, position-controlled and parallel growth of GaAs and InAs nanowhiskers is successfully demonstrated by using a metal–organic chemical vapour deposition method. The growth takes place preferentially along the 111 As direction with the aid of the catalytic effect of Au nanodroplets, and not along 111 Ga or In directions. The diameter and length of the whisker can be controlled artificially down to 10 nm and to over 1 μm, respectively. Doping and composition control of p- or n-type such as GaAs–InAs heterostructure formation are possible along the length direction of the whisker by changing the source gases. In order to control the growth position of the whisker, positioning of a Au nanodroplet is essential and realized by a lithographic method. By choosing the [111]B direction to the substrate surface and normal to the patterned side edges, and by positioning the Au nanodroplet on the side wall, the positioned planar nanowhisker growth and bridging are successfully demonstrated. The growth mechanism of the nanowhiskers is revealed by the scanning and transmission electron microscope observations. Nanometer-size Au-alloy droplets play an important role in the growth of the whiskers. The whisker growth process is governed by the vapor–liquid–solid growth mechanism.  相似文献   
107.
GaAs被动调Q Nd:YAG激光器激光特性的研究   总被引:7,自引:0,他引:7  
报道了用半导体材料 Ga As实现氙灯抽运 Nd:YAG激光器的被动调 Q运转 ,测量了激光器的阈值、脉冲宽度和输出能量。从 Ga As的能级结构出发 ,理论上研究了 Ga As材料的饱和吸收原理 ,建立了调 Q激光器速率方程并给出了数值解 ,对理论结果与实验结果进行了比较和讨论。  相似文献   
108.
王浩  杨恢东  丁瑞钦 《光学学报》2000,20(6):47-851
采用射频磁控共溅射与高真空退火相结合的方法,分别在单晶硅片和光学石英玻璃片上制备了GaAs/SiO2纳米晶镶嵌薄膜样品。激光拉曼光谱的测量结果表明,退火态样品(400℃,60min)的拉曼光谱特征峰呈现宽化和红移,红移量为9.5cm^-1,对应薄膜中GaAs纳米晶粒平均粒径约为3nm。样品的室浊吸收光谱测量结果表明,由于受量子限域效应的主导作用,与GaAs块状单晶相比,样品光学吸收边呈现出明显的蓝  相似文献   
109.
研究一种双金属接触的GaAs半导体探测器在14MeV中子辐照下的性能.测量了探测器经过1012n/cm2中子辐照剂量后的反向漏电流、电荷收集效率和最小电离粒子能谱,并且与60Co 1.25MeV光子辐照的测量结果相比较.对中子辐照引起探测器时间性能变化和辐照损伤机制进行了探讨.并根据实验结果提出了这种双金属接触GaAs探测器灵敏层分布的一种假设,理论计算和实验数据相符合.  相似文献   
110.
A genetic algorithm approach is used to fit orbital interaction energies of sp3s* tight-binding models for the nine binary compound semiconductors consistent of Ga, Al, In and As, P, Sb at room temperature. The new parameters are optimized to reproduce the bandstructure relevant to carrier transport in the lowest conduction band and the highest three valence bands. The accuracy of the other bands is sacrificed for the better reproduction of the effective masses in the bands of interest. Relevant band edges are reproduced to within a few meV and the effective masses deviate from the experimental values typically by less than 10%.  相似文献   
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