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排序方式: 共有681条查询结果,搜索用时 31 毫秒
101.
102.
采用MOCVD技术在图形化硅衬底上生长了InGaN/GaN多量子阱黄光LED外延材料,研究了不同的量子阱生长气压对黄光LED光电性能的影响。使用高分辨率X射线衍射仪(HRXRD)和荧光显微镜(FL)对晶体质量进行了表征,使用电致发光系统积分球测试对光电性能进行了表征。结果表明:随着气压升高,In的并入量略有降低且均匀性更好,量子阱中的点缺陷数目降低,但是阱垒间界面质量有所下降。在实验选取的4个气压4,6.65,10,13.3 kPa下,外量子效率最大值随着量子阱生长气压的上升而显著升高,分别为16.60%、23.07%、26.40%、27.66%,但是13.3 kPa下生长的样品在大电流下EQE随电流droop效应有所加剧,在20 A·cm-2的工作电流下,样品A、B、C、D的EQE分别为16.60%、19.77%、20.03%、19.45%,10 kPa下生长的量子阱的整体光电性能最好。 相似文献
103.
以蓝宝石(Al2O3)为衬底,采用有机金属化学气相沉积(MOCVD)技术生长InGaN/GaN多量子阱结构.本文通过调整外延生长过程中三甲基铟(TMIn)流量,研究了TMIn流量对InGaN/GaN多量子阱结构的合金组分、晶体质量和光学性质的影响.本文采用高分辨X射线衍射(HRXRD)、原子力显微镜(AFM)和光致发光(PL)测试表征其结构和光学性质.HRXRD测试结果表明,随TMIn流量增加,"0"级峰与GaN峰之间角偏离增大,更多的In并入薄膜中.HRXRD与AFM表征结果表明:增大TMIn流量会导致外延薄膜中的位错密度增大,V形坑数量增加,晶体质量严重恶化;PL测试结果表明,随着TMIn流量增加,发光强度逐渐降低,半高宽增大,这是由于晶体质量恶化所导致.因此严格控制铟源流量对于改善量子阱薄膜的晶体质量与光学性质有着至关重要的作用. 相似文献
104.
High-performance InGaN/GaN MQW LEDs with Al-doped ZnO transparent conductive layers grown by MOCVD using H_2O as an oxidizer
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In this study,the high performance of InGaN/GaN multiple quantum well light-emitting diodes(LEDs) with Aldoped ZnO(AZO) transparent conductive layers(TCLs) has been demonstrated.The AZO-TCLs were fabricated on the n~+-InGaN contact layer by metal organic chemical vapor deposition(MOCVD) using H_2O as an oxidizer at temperatures as low as 400 ℃ without any post-deposition annealing.It shows a high transparency(98%),low resistivity(510 ~4 Ω·cm),and an epitaxial-like excellent interface on p-GaN with an n+-InGaN contact layer.A forward voltage of 2.82 V @ 20 mA was obtained.Most importantly,the power efficiencies can be markedly improved by 53.8%@20 mA current injection and 39.6%@350 mA current injection compared with conventional LEDs with indium tin oxide TCL(LED-Ⅲ),and by28.8%@20 mA current injection and 4.92%@350 mA current injection compared with LEDs with AZO-TCL prepared by MOCVD using O_2 as an oxidizer(LED-Ⅱ),respectively.The results indicate that the AZO-TCL grown by MOCVD using H_2O as an oxidizer is a promising TCL for a low-cost and high-efficiency GaN-based LED application. 相似文献
105.
Haisheng Fang Zhi Zhang Yaoyu Pan Ronghui Ma Sheng Liu Mengying Wang 《Crystal Research and Technology》2014,49(11):907-918
Gallium nitride (GaN) is a direct bandgap semiconductor widely used in bright light‐emitting diodes (LEDs). Thin‐film GaN is grown by metal‐organic chemical vapour deposition (MOCVD) technique. Reliability, efficiency and durability of LEDs are influenced critically by the quality of GaN films. In this report, a systematic study has been performed to investigate and optimize the growth process. Fluid flow, heat transfer and chemical reactions are calculated for a specific close‐coupled showerhead (CCS) MOCVD reactor. Influences of reactor dimensions and growth parameters have been examined after introducing the new conceptions of growth uniformity and growth efficiency. It is found that GaN growth rate is mainly affected by the concentration of (CH3)3Ga:NH3 on the susceptor, while growth uniformity is mainly influenced by the recirculating flows above the susceptor caused by natural convection. Effect of gas inlet temperature and the susceptor temperature over the growth rate can be explained by two competing mechanisms. High growth efficiency can be achieved by optimizing the reactor design. 相似文献
106.
本实验采用普通的光刻和湿法腐蚀技术,将GaAs基片刻蚀成具有W形沟槽样的非平面结构,基片表面为(100)面,沟槽的侧斜面为(111)B面.在此基片上用低压MOCVD设备外延生长了GaAs/GaAsP多层膜,通过扫描电镜和微区拉曼光谱,研究它们的生长特性,发现GaAs和GaAsP的生长速率与基片的晶向及基片上的生长位置有关.根据这一生长特性,选择合适的W形沟道形状,用常规的量子阱外延方式,在W形沟道中央顶部突起的线条状平面上形成宝塔形生长,从而在尖端长出量子线.低温荧光光谱中观察到相应的能量峰,从而证实量子线的存在. 相似文献
107.
Jingchang Sun Qiuju Feng Jiming Bian Dongqi Yu Chengren Li Jianze Zhao Guotong Du 《Journal of luminescence》2011,131(4):825-828
A p-ZnO:N/n-GaN:Si structure heterojunction light-emitting diode (LED) is fabricated on c-plane sapphire by full metal organic chemical vapor deposition (MOCVD) technique. The p-type layer with hole concentration of 8.94×1016 cm−3 is composed of nitrogen-doped ZnO using NH3 as the doping source with subsequent annealing in N2O plasma ambient. Silicon-doped GaN film with electron concentration of 1.15×1018 cm−3 is used as the n-type layer. Desirable rectifying behavior is observed from the current-voltage (I-V) curve of the device. The forward turn on voltage is about 4 V and the reverse breakdown voltage is more than 7 V. A distinct ultraviolet (UV) electroluminescence (EL) with a dominant emission peak centered at 390 nm is detected at room temperature from the heterojunction structure under forward bias conditions. The origins of the EL emissions are discussed in comparison with the photoluminescence (PL) spectra. 相似文献
108.
《Journal of Coordination Chemistry》2012,65(2):111-117
Abstract The synthesis and structure of the indium dithiocarbamate, In[S2CN(CH3)2]3·(1/2) 4-mepy (4-mepy=4-methylpyridine), is described. Indium metal was oxidized by tetramethylthiuram disulfide in 4-methylpyridine at 25°C to form a new, homoleptic indium(III) dithiocarbamate in yields exceeding 60%. In[S2CN(CH3)2]3 exists as a discrete molecule with a distorted-octahedral geometry. The compound crystallizes in the P 1 (No. 2) space group with a=9.282(1)Å, b=10.081(1)Å, c=12.502Å, α=73.91(1)°, β=70.21(1)°, γ=85.84(1)°, Z=2, V(Å)=1057.3(3), R=0.046 and Rw =0.061. 相似文献
109.
We introduce some ways to compute the lower and upper bounds of the Laplace eigenvalue problem.By using the special nonconforming finite elements,i.e.,enriched Crouzeix-Raviart element and extended Q1ro t,we get the lower bound of the eigenvalue.Additionally,we use conforming finite elements to do the postprocessing to get the upper bound of the eigenvalue,which only needs to solve the corresponding source problems and a small eigenvalue problem if higher order postprocessing method is implemented.Thus,we can obtain the lower and upper bounds of the eigenvalues simultaneously by solving eigenvalue problem only once.Some numerical results are also presented to demonstrate our theoretical analysis. 相似文献
110.
Analysis and finite element simulation of electromagnetic heating in the nitride MOCVD reactor
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Electromagnetic field distribution in the vertical metal
organic chemical vapour deposition (MOCVD) reactor is simulated by
using the finite element method (FEM). The effects of alternating
current frequency, intensity, coil turn number and the distance
between the coil turns on the distribution of the Joule heat are
analysed separately, and their relations to the value of Joule heat
are also investigated. The temperature distribution on the
susceptor is also obtained. It is observed that the results of the
simulation are in good agreement with previous measurements. 相似文献