全息图像缩放对数字微镜重建显示的影响研究

根据人眼对数字微镜器件成像的响应性质,给出了数字微镜器件重建场的强度表达式.当CCD的面元尺寸与数字微镜器件的镜元尺寸不相等时,在数字微镜器件重建显示系统中将引起数字全息图像的缩放.基于傅里叶光学理论,导出了缩放后数字全息图数字微镜器件重建像的尺寸和中心位置与重建参量的关系.通过理论模拟和数字微镜器件重建显示实验,对分析结果进行了实验验证.     

镍金属表面双光束激光干涉直写研究

利用波长为351 nm的半导体抽运全固态脉冲激光器,采用双光束干涉方法,对金属镍板表面直接刻蚀形成微光栅结构的方法进行了实验研究.通过改变激光功率和激光脉冲数等实验参量,研究其对制备的微光栅结构槽形和一级衍射效率的影响.利用扫描电镜和原子力显微镜测量光栅槽形,测得光栅周期为1.25 μm,光栅槽深为10～280 nm,并测量了相应的衍射效率.发现当采用激光单脉冲能量为1.2 mJ,采用10个脉冲加工时,测得槽深为280 nm,一级衍射效率最高（18%）的微光栅结构.利用光栅的衍射理论对衍射效率变化进行了分析.该研究拓展了纳秒激光在加工微结构方面的应用,为在金属材料表面制作纳米压印模版提供了一种新方法.     

Synthesis,characterisation and structural aspects of some symmetrical organotellurium halides based on Bis(2-(3,5-dimethyl-1H-pyrazol-1-yl)ethyl)telluride

Bis(2-(3,5-dimethyl-1H-pyrazol-1-yl)ethyl)telluride (2) has been synthesised in good yield by reacting 1-(2-chloroethyl)-3,5-dimethylpyrazole with in situ prepared sodium telluride, Na₂Te in an aqueous solution. A number of new organotellurium halides from bis(2-(3,5-dimethyl-1H-pyrazol-1-yl)ethyl)telluride have been synthesised by using different halogenating reagents. Reaction of 2 with bromine gave bis(2-(3,5-dimethyl-1H-pyrazol-1-yl)ethyl)telluride dibromide (5a) in addition to unexpected product bis(2-(4-bromo-3,5-dimethyl-1H-pyrazol-1-yl)ethyl)telluride dibromide (5b). All compounds were characterized by different spectroscopic techniques viz., ¹H, ¹³C, ¹²⁵Te NMR, Mass spectroscopy, IR and CHN analysis. EDXRF studies have also been employed to confirm the identity of 5a and 5b. Thermal gravimetric analysis of bis(2-(3,5-dimethyl-1H-pyrazol-1-yl)ethyl)telluride (IV) chloride (4) and bis(2-(3,5-dimethyl-1H-pyrazol-1-yl)ethyl)telluride (IV) iodide (5c) reveals the thermal stability of these molecules above 100°C. The X-ray studies of 5c shows trigonal bipyramidal geometry around tellurium atom and intermolecular secondary interaction viz., C-H π stacking between H23A and C22 showing a supramolecular packing between two molecules.     

Structural and morphological study of ZnO thin films electrodeposited on n-type silicon

In this work, we report on the electrodeposition of ZnO thin films on n-Si (1 0 0) and glass substrates. The influence of the deposition time on the morphology of ZnO thin films was investigated. The ZnO thin films were characterized by X-ray diffraction (XRD), energy dispersive X-ray (EDS) and scanning electron microscopy (SEM). The results show a variation of ZnO texture from main (0 0 2) at 10 min to totally (1 0 1) at 15 min deposition time. The photoluminescence (PL) studies show that both UV (∼382 nm) and blue (∼432 nm) luminescences are the main emissions for the electrodeposited ZnO films. In addition, the film grown at 15 min indicates an evident decrease of the yellow-green (∼520 nm) emission band comparing with that of 10 min. Finally, transmittance spectra show a high transmission value up to 85% in the visible wavelength range. Such results would be very interesting for solar cells applications.     

Formation of sub-half-wavelength focal spot with ultra long depth of focus

We theoretically demonstrate the creation of sub-wavelength focal spot with ultra long depth of focus (DOF) non-diffracting. To achieve a sub-half-wavelength focal spot (0.4λ) with modulation, extended DOF (over 9.5λ) in vacuum, an integration of amplitude phase encoding, cylindrical polarization and the combination of dual-beams is utilized. Further analysis also predicts that a flattop intensity distribution along z axis can be observed around the ideal focus point.     

光栅参数测量技术研究进展

光栅参数测量技术是衡量光栅制作水平的重要标准。本文从直接测量法和间接测量法两个角度对现阶段较成熟的光栅参数测量技术进行了研究。重点介绍了原子力显微镜（AFM）测量法、扫描电子显微镜（SEM）测量法、激光衍射（LD）测量法以及散射测量术的测量原理和研究进展,指出了这些方法各自的优缺点和适用范围。AFM测量法和SEM测量法均可测得光栅的局部形貌信息,可用于检测光栅表面形貌缺陷;LD测量法和散射测量术反映的是激光照射区域的平均结果,其中LD测量法能得到光栅周期参数,而椭偏测量术能得到光栅周期以外的其他形貌参数。这些方法测得的光栅参数结果比较吻合,其中LD测量法不确定度最小,AFM次之,SEM最大。文章最后对未来光栅参数测量技术的发展方向进行了论述。     

Impulse functions over curves and surfaces and their applications to diffraction

An explicit preferred definition of impulse functions (Dirac delta functions) over lower-dimensional manifolds in RN is given in such a way to assure uniform concentration per geometric unit of the manifold. Some related properties are presented. An application related to diffraction is demonstrated.     

复杂工况下光学元件变形及应力的有限元研究

航天及其它特殊领域的工作环境,会使光学元件的形状及内部应力发生变化,进而对其光学特性产生明显的影响.本文运用有限元法,在考虑大加速度引起的惯性载荷的影响的同时,对不同环境温度下元件形状及内部应力的变化亦作了初步的研究.     

一维Fibonacci类准晶的衍射性质

利用傅里叶变换方法推导了一维Fibonacci类(FC(n))准晶衍射的结构因子方程,讨论了该系统的衍射峰和系统消光规则.在此基础上,计算了FC(1)和FC(3)准点阵的衍射谱.另外,把所得方程进行推广使之能用来研究FC(n)准周期超晶格的衍射性质.通过把FC(1)准周期超晶格衍射相对强度的计算结果与Merlin等人的实验结果进行比较,发现大多数衍射谱符合得较好,但有一条谱不一致.理论计算表明Merlin等人标定的谱(4,2)应该是一个次强峰.     

光纤端面衍射场光束参数及其测量

基于非傍轴标量光束的传播理论和横截面上光强的精确描述,分析了光纤端面衍射场光束特征参数的解析表达式,并与傍轴近似条件下的结论进行了比较.证明了傍轴近似对于弱导光纤的合理性,但是随着光纤相对折射率差Δ增大,傍轴近似由于忽略了衍射角度,远场发散角角半径和M2因子比考虑衍射角度时偏小.最后提出了一种可行的实验测量光束参数的方法,这种方法没有忽略衍射角度影响,从理论上说,比傍轴近似更为客观可靠.