高功率固体激光器光学元件位相误差滤波

不同频段的位相误差对输出光束将产生不同的影响，低频段主要影响远场焦斑主斑的能量分布，中高频段影响光的散射或者可能出现的较大的强度峰值调制，高频段影响光的散射，导致能量的损失。研究光学元件引入的位相误差与输出光束之间的定性、定量关系，首先必须对位相误差进行相应的滤波处理，反映光学元件面形的细微误差。     

HL-1和HL-1M装置等离子体可见光谱实验

总结HL-1和HL-IM装置等离子体的可见光谱实验，给出了各种放电条件下等离子体参数的可见光谱测量结果，讨论了杂质减少、加料、约束改善、等离子体旋转及边缘辐射特性等可见光谱实验结果，展望了HL2A装置上要开展的可见光谱研究内容。     

低进汽压力下超音速两相流升压特性实验研究

本文采用实验方法研究了进汽压力为0.2 MPa以下时,由蒸汽喷嘴、混合腔及相应的阀门和管道组成超音速汽液两相流升压加热装置的运行特性。实验表明在进汽压力为0.1 MPa-0.2 MPa时,超音速汽液两相流升压加热装置都可稳定可靠地运行,且升压效果明显,可满足电力、供暖、轻工等许多行业蒸汽加热的要求。     

用反射法自动测量大尺寸样品的折射率分布

针对大尺寸样品的折射率分布测量,引入自动扫描装置和适时数据处理系统,研究出一种高灵敏度的智能化反射法折射率分布测量仪,可进行快速、自动、准确的折射率分布测量.经理论分析和实验研究提出了一套合理的实验数据处理方法.并具体介绍和详尽分析了实验装置,讨论了有关理论和实验误差,给出了消除各种误差的有效方法,最终得出较为理想的实验结果.     

原子磁芯片与量子回路

 在过去几年中,物理学家们研究出了多种可把原子云团冷却到温度低于1微开(μK)的技术。处于这些云团中的原子是如此之冷,以至于它们不能再被看作是遵守牛顿定律的经典粒子,而应被看作是由量子力学所描述的可传播、衍射和相互干涉的波。现在,人们已经可以把冷原子囚禁在横向尺寸只有100纳米的量子点内,也可使之在长的狭管中流动,就像电子在很细的导线中流动一样。人们开始注意到一种全新的技术的可能性,这一技术与微电子技术相类似,只是它基于受控冷原子流及原子之间的相互作用。这种被称为“原子芯片”的器件可以利用量子力学原理来完成非同寻常的测量或计算工作。     

A New High Power Microwave Source Operated at Low Magnetic Field

A new tpye of high power microwave souce operated at low magnetic filed is proposed and studied by the particle-in-cell (PIC) method.An oversized uniform backward-wave-oscillator-like structure is connected to a tapered slow-wave structure by a resonalt cavity.In this device,the electron beam current is effectively used to yield microwaves with high efficientcy,and the mode is locked in a wide range of diode voltage to reduce the requirement to the voltage wave form.The PIC siumlation results show that a peak microwave power of 2.1 GW (averaged 1.1GW) with a pure TM01 mode at 10.7GHz is radiated with 4.1GW input beam power,the frequency remains approximately the same when the diode voltage changed from 300kV to 700kV.     

离子束合成钇硅化物的结构及红外谱特征

将稀土金属钇离子注入到n型单晶Si(111)中制备出钇硅化物埋层.利用x射线衍射、卢瑟福背散射和傅里叶红外吸收谱测量分析了样品的结构、原子的埋层分布和振动模式.结果表明，Y离子在注入过程中已与基底中的Si原子形成了YSi2结构相.真空下的红外光辐照处理促使YSi2择优取向生长，埋层中Si与Y的平均原子浓度比由24下降为20，与六方YSi2的化学计量比一致.还给出了钇硅化物的特征红外吸收谱.     

Numerical Calculation and Analysis of Track Etching Process

Heavy ion irradiated polymers can be chemically etched to form track membrane with pores in the micro and sub-micro ranges. It has been reported that pore growth during etching can be related to track structures. A latent track has a track core inside and a track halo surrounding the track core. By single track etching it is observed that etching in the track core is much faster than in the track halo where the etching rate is even lower tlian that of bulk material. For multi-track etching, no such stages can be seen by the conductance measurements.     

Emittance Measurements for Beams Extracted from LECR3 Ion Source

High quality ion beams are required by IMP cyclotron and atomic physics research, so it is important to research and measure beam emitt ance of ECR ion source. Intense beams extracted from ECR ion source usually have low energy, so it is suitable to use Electric-Sweep Scanner to measure the emittance. This kind of measurement is popularly used at ECR ion source, and it has some prominent merits such as high accuracy, very short time of data processing and easy expressing of the emittance pattern. So we designed and built this emittance scanner to measure emittance of the ion beams produced by LECR3 ion source. The structure of the ESS is shown in Fig.l, and the photo of the ESS is shown in Fig.2.