薄膜物理及其应用讲座：第六讲 铁电薄膜的物理性能和应用

铁电薄膜材料与器件是近年来高新技术研究的前沿和热点之一，文章概括介绍了铁电薄膜研究的现状，铁电薄膜的物理性能及其表征，铁电薄膜在微电子，光电子和集成光学等领域中的应用，并指出了当前铁电薄膜材料与器件研究中需要着重解决的一些问题。     

非晶InGaZnO薄膜成分配比对透明性和迁移率的影响

利用固相反应法制备了富铟含量在不同成分配比下的高质量InGaZnO陶瓷靶材,采用脉冲激光沉积法,在基片温度为20 ℃、氧压为1 Pa条件下,在石英玻璃衬底上生长了非晶InGaZnO薄膜,并对薄膜进行X射线衍射、透射吸收光谱、拉曼光谱与霍尔效应测试。通过对InGaZnO薄膜的测试表征,在较低温度条件下,铟含量较高的薄膜样品保持了非晶结构、可见光的高透明性和高电子迁移率,InGaZnO薄膜有望应用于电子器件。     

The Effect of the Semiconductive Screen on Space Charge Suppression in Cross-Linked Polyethylene

The space charge distributions of cross-linked polyethylene （XLPE） with Borouge＇s BorlinkTM semiconductive screen type LE0550 and LE0595 from a pulsed electro-acoustic method are obtained. The contact interface morphology at the semiconductive screen and the structure of XLPE near the interface are characterized. The dielectric spectrum and the conductivity current of XLPE with the different semiconduetive electrodes are com- pared. The semiconduetive screen changes the structure and the dielectric characteristic of XLPE near the contact interface, which may be the main reason for space charge suppression in XLPE with Borouge＇s type LEO550 semiconduetive screen.     

一种高准确度、高可靠的红外光电时刻测量系统

针对靶场试验对测量仪器的准确度及可靠性的特殊要求,开发了一种基于嵌入式PC/104模块和大规模可编程逻辑器件CPLD的红外光电时刻测量系统.介绍了该系统的组成、测量原理及其实现途径.靶场实验结果表明,该系统设计环境适应能力强,能可靠地工作在－35～45℃的环境下;测量准确度高,测时误差小于30 μs.     

从电磁统一到电弱统一

概括介绍从“电磁统一”到“电弱统一”的研究历程，并指出这一研究的科学意义以及可能给予后继研究者在科研方法上的启示．     

Determination of optical constants in DUV/VUV

An approach for determining the optical constants of the weakly absorbing substrate is developed and applied to obtain the parameters of CaF2 and fused silica substrates in deep ultraviolet （DUV） and vacuum ultraviolet （VUV） range. A method for extracting the optical constants of thin films deposited on strongly absorbing substrate, which is based on the reflectance spectra measured at different angles of incidence, is also presented. The optical constants are determined by fitting the measured spectra to the theoretical models. The proposed method is applied to determine the refractive index and extinction coefficient （n, k） of MgF2 film deposited on silicon substrate by electron beam evaporation with substrate temperature 300 ℃ and deposition rate 0.2 nm/s. The determined n, k values at 193 nm are 1.433 and 9.1×10-4, respectively.     

Effect of Different Substrate Temperature on Sb-Doped ZnO Thin Films Prepared by Pulsed Laser Deposition on Sapphire Substrates

Sb-doped ZnO thin films are deposited on c-plane sapphire substrates by pulsed laser deposition. Hall results indicate that the conductivity of the Sb-doped ZnO thin films is strongly dependent on the substrate temperature. The sample deposited at the temperature of 550°C exhibits p-type conductivity. It gives a resistivity of 15.25Ω＆#12539;cm, with a Hall mobility of 1.79cm2V-1s-1 and a carrier concentration of 2.290×1017cm-3 at room temperature. The x-ray diffraction indicates that the Sb-doped ZnO thin films deposited in the range of 450-650°C are high c-axis oriented. Low-temperature photoluminescence spectra indicate that the sample deposited at 550°C shows the strong acceptor-bound exciton （A0X） emission.