硬盘磁头-碟界面润滑剂失效机理及添加剂X-1P的性能研究

采用热重分析 (TGA)、傅立叶红外光分析 (FTIR)和磁头起飞降落 (CSS)等试验方法 ,研究了硬盘磁头 碟界面润滑层PFPE的失效机理以及添加剂X 1P在磁头 碟界面润滑剂中的作用 .研究结果表明 ,高温条件下磁头材料Al2 O3 会诱导磁头 碟界面润滑剂PFPE发生歧化降解 ,造成磁头 碟界面润滑层失效 ;添加剂X 1P因其特殊的分子结构和化学性能 ,可作为一种有效稳定剂添加到磁头 碟润滑剂PFPE中 ,减弱磁头材料Al2 O3 作为催化反应中心的催化反应活性 ,减缓磁头 碟界面润滑剂PFPE的高温歧化降解 ,改善磁头 碟界面的CSS性能     

乳状液的热力学特征及其它

本文较详尽地介绍了乳状液的稳定性理论，乳状液类型的测定，变型，去乳化等基本特征。     

光纤孤子在媒质突变界面的反射与透射

本文通过波包慢变假定,准单色近似和径向模式平均法,建立了光纤孤子反射和透射问题的支配方程和边界条件,借助光束传播法,数值模拟孤子在光纤单界面上的反射和透射过程,文中还给出数值实例。 关键词：     

Outline Imaging by THz Time Domain Spectroscopy

Outline imaging by THz time domain spectroscopy is proposed. Spectroscopic splitting at interface is reported, The principle of outline imaging is put forward. Experimental results demonstrate the feasibility of outline imaging by spectroscopic splitting, It is shown that clear out：line image of sample interface could be achieved easily by this technique. The spatial resolution is about 0.6mm. The THz-beam focus, the scanning step and the THz pulse width are the critical foctors affecting the imaging resolution. The signal-to-noise ratio of this technique could be improved greatly compared to the conventional transsion imaging.     

基于DELPHI5的高校选修课管理系统的设计与实现

主要介绍高校选修课管理系统的设计思想，并着重分析和讨论了后台数据库的设计方法和原理，最后讨论了运用Delphi5开发该系统的整个过程。     

Formation of Interfacial Layers in LaAlO3/Silicon during Film Deposition

We have studied the interracial reactions between amorphous LaAlO3 thin films and Si substrates, using high- resolution transmission electron microscopy and x-ray photoelectron spectroscopy. It has been shown that the interracial layer between LaAlO3 film and Si substrate chemical states show that the ratio of La 4d3/2 to Al 2p is SiLaxAlyOz. The depth distributions of La, Si and Al of the interfacial layer remains unchanged with the depth compared to that of the LaAlO3 film. Moreover, the Si content, in the interracial layer gradually decreases with increasing thickness of the interracial layer. These results strongly suggest that the Al element is not deficient in the interracial layer, as previously believed, and the formation of a SiLaxAlyOz interracial layer is mainly due to the diffusion of Si from the substrate during the LaAlO3 film deposition. With the understanding of the interracial layer formation, ones can control the interface characteristics to ensure the desired performances of devices using high-k oxides as gate dielectrics.     

Growth of NaBi（WO4）2 Dendrite and Mechanism

The solid-liquid interface motion of NaBi（WO4）2 （NBWO） melt crystal growth is observed in an in situ system, in which the whole processes of interface transition from fiat interface and cellular to dendrite are visualized. The spacing of the dendrite under smaller temperature gradient turns out to be larger than that under larger temperature gradient, which is found to be sensitive to the temperature distribution. The mechanism of dendrite growth of NBWO is studied based on the model of the growth units of anion coordination polyhedra. The { 001} face has two apex links, so it shows higher stability and has high growth rate and forms the arm of dendrite, whereas the {010} face has only one apex link, and thus shows relative slower growth rate and firstly forms the branches.     

孤立分散在SiO2基质中的半导体InSb纳米颗粒界面效应的MS-XANES研究

利用MS-XANES计算研究了嵌入在SiO₂介质中的InSb纳米颗粒的界面效应, 结果显示Sb K-XANES实验谱在白线峰强度增大和白线峰向高能一侧展宽这两个特点的起因是: 1. SiO₂介质透过界面处强的Sb-O共价键间接地影响和改变了InSb团簇中Sb原子内部的势分布; 2. 通过InSb纳米颗粒界面处存在着强的Sb-O共价键使得Sb原子的5p电子被耗尽来提高InSb纳米颗粒Sb原子的5p的空穴数. 这两方面共同决定了InSb纳米颗粒的Sb K-XANES实验谱在白线峰 强度的增大. 此外, 由于纳米颗粒的界面效应, 仅仅把白线峰的强度增大归因于吸收原子电荷转移带来的空穴数增加, 并依此通过白线峰的强度计算吸收原子的空穴数是不合理的.     

二维欧拉多介质流体力学数值模拟-TVD＋VOF方法

用TVD格式结合VOF界面处理方法编制了二维多介质高分辨欧拉程序，以解决冲击波和多介质界面处理。程序包括单介质网格高精度流体力学计算、多介质网格内界面重构、各种介质输运和压力驰豫平衡过程。其中单介质网格的计算采用Harten二阶TVD格式结合MacCormark方法计算含有源项的非齐次守恒定律方程组，通过4节点限制函数保证格式单调。多介质网格采用Youngs方法构造界面，采用x，y方向分裂格式计算体积份额输运，再根据体积份额输运计算质量、动量和能量的输运，最后利用等熵条件计算各种介质的压力驰豫平衡过程。     

Fe/Si多层膜的层间耦合与界面扩散

对以本征Si及重掺杂ｐ型和ｎ型Si作为中间层的Fe/Si多层膜的层间耦合进行研究，并通过退火，增大Fe，Si之间的扩散，分析界面扩散对层间耦合的影响. 实验结果表明，层状结构良好的制备态的多层膜，Fe，Si之间也存在一定程度的扩散，它是影响层间耦合的 主要因素，远远超过了半导体意义上的重掺杂，使不同种类的Si作为中间层的层间耦合基本 一致.进一步还发现，在一定范围内增大Fe，Si之间的扩散，即使多层膜的层状结构已经有了相当的退化，Fe/Si多层膜的反铁磁耦合强度基本保持不变. 关键词： Fe/Si多层膜 层间耦合 界面扩散