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11.
双驱动x射线激光等离子体能谱特性研究   总被引:5,自引:0,他引:5       下载免费PDF全文
用时间积分空间分辨的平晶千电子伏谱仪测量了钽激光等离子体发射波长范围为045— 075nm的软x射线能谱,精确测量和准确辨认出类镍、类钴和类铁离子的共振线及类镍离子 的内壳层跃迁线-对实验结果处理,获得了辐射线谱的强度-通过谱线比率的诊断推断脉冲激 光时差对等离子体状态的影响,至少也可部分解释激光上能级的粒子数及等离子体的 电离程度- 关键词: 离子谱特性 软x线能谱强度 谱线辨认  相似文献   
12.
神光Ⅱ上柱形黑腔辐射驱动冲击波   总被引:5,自引:0,他引:5       下载免费PDF全文
利用神光Ⅱ的八路三倍频激光装置,驱动柱形黑腔产生的x 射线作辐射源驱动台阶铝样品产生冲击波,获得了清晰的冲击波图像,通过冲击波过台阶样 品的时间差获得冲击波速度和压力分别为31.2km/s和17.5×105MPa.采用软x射线能谱 仪通过激光注入孔测量的辐射温度与采用冲击波法测量辐射温度的结果一致. 关键词: 冲击波 辐射驱动 辐射温度  相似文献   
13.
燕飞  张杰  鲁欣 《物理学报》2003,52(9):2200-2205
利用一维拉格朗日流体动力学程序Med103详细研究了产生类镍Ag,Cd,In,Sn, Sb离子和类氖Fe,Co,Ni,Cu,Zn离子的等离子体状态.通过对电子温度、离子丰度、离子数密度等状态参量的分析比较,得到了这两类等离子体状态之间的对应关系.即类镍银的等离子体状态与类氖铁 的相近,类镍镉的与类氖钴的相近,依次类推.利用这一对应关系可以方便地由类氖机理x射线激光的等离子体状态来对相应元素的类镍x射线激光的等离子体状态进行判断. 关键词: 类氖 类镍 等离子体状态 x射线激光  相似文献   
14.
The electronic states of the Cr overlayers on TiO2(0 0 1) surfaces have been investigated using angle-resolved and resonant photoemission spectroscopy with synchrotron radiation. At lower coverages, Cr deposition on TiO2(0 0 1) creates two well separated in-gap emissions due to the formation of surface Ti3+ (3d1) ions and Cr3+ (3d3) ions. At higher coverages, the in-gap emission is developed into the 2-peak-structure emission of Cr 3d character. The corresponding state is considered to be of metallic nature from the viewpoint of the high ability of oxygen adsorption, but has no Fermi edge, indicating a possibility of forming small Cr clusters on TiO2(0 0 1) at this stage.  相似文献   
15.
The atomic structures of indium (In) on silicon (Si) (1 0 0)-(2 × 1) surface are investigated by the local density approximation using first-principles pseudopotentials. Total energy optimizations show that the energetically favored structure is the parallel ad-dimer model. The adsorption energy of In on ideal Si(1 0 0)-(1 × 1) surface is significantly higher than that on reconstructed Si(1 0 0)-(2 × 1) surface, suggesting that In adsorption does not break the Si-Si dimer bond of the substrate. When Si surface contains single dimer vacancy defects, In chain will be interrupted, leading to disconnected In nanowires. Displacive adsorption of In on Si(1 0 0) is also considered, and the calculation suggests that interdiffusion of In into Si substrate will not be favorable under equilibrium conditions.  相似文献   
16.
The optical logic-operated moire,which is proposed on the basis of optical logicoperation,is a new method to obtain specific moire beat pattern.Its advantages lie in the ca-pability to select carrier-free,sharpened fringes with high contrast.The experimental methodand results of the application of the optical logic-operared moire in moire topography are pre-sented in this paper.  相似文献   
17.
In this paper we report the results of a morphological and structural investigation on film properties of a soluble polydiacetylene, the poly[1,6-bis(3,6-dihexadecyl-N-carbazolyl)-2,4-hexadiyne] (polyDCHD-HS). The red films of this polymer, prepared by standard spin-coating techniques, revealed absence of linear dichroism and birefringence in contrast with the ordered mesophases detected by powder X-ray studies. In order to interpret the optical behavior of this polymer, we performed AFM and SEM studies of polyDCHD-HS films spun on hydrophylic and hydrophobic glass substrates. We found the presence of surfaces organized in rod-like particles, more regularly oriented on the hydrophylic substrate. GIXRD studies, carried out on films sufficiently thick to allow the observation of the diffraction pattern, reveled the presence of a lamellar structure with a spacing of 3.22 nm. The low intensity of the diffraction peaks and the isotropic linear optical properties of the films show that the lamellar mesophases are not extended over large areas. These findings were compared with the data obtained from AFM and SEM studies on films of two other polydiacetylenes, the poly[1-(3,6-dihexadexyl-N-carbazolyl)-6-(N-carbazolyl)-2,4-hexadyine] (polya-DCHD) and the poly[1,6-bis(3,6-dipalmitoyl-N-carbazolyl)-2,4-hexadyine] (polyDPCHD), spun on hydrophylic glass substrate. The results confirmed the presence of nodular morphologies which seem to be a general characteristic of this class of materials. The particles organization appears instead related to the chemical nature of the substituents on the carbazolyl rings.  相似文献   
18.
The O-(arylcarbamoyl)butyrhydroximoyl chlorides were synthesized, and the x-ray structural analysis (XSA) of one of them — O-(o-tolylcarbamoyl)butyrhydroximoyl chloride — was performed. It was established from the data of the XSA and the PMR spectra that all synthesized compounds are the Z isomers.Institute of Physiologically Active Substances, Russian Academy of Sciences, 142432 Chernogolovka. Translated from Izvestiya Akademii Nauk, Seriya Khimicheskaya, No. 2, pp. 315–319, February, 1992.  相似文献   
19.
Natural n-type PbS single crystals have been studied using AFM, STM and STS after long-term oxidation in air at ambient temperatures and extensive etching in aqueous acid solutions, in contrast to previous work devoted to initial corrosion of fresh surfaces. The exposure of PbS to atmosphere at high relative humidity for several days yields widespread loose oxidation products; the process is much slower at low humidity. Surface morphologies diverge after the treatment in 1 M perchloric and hydrochloric acid solutions at room temperature and become widely different at elevated temperatures, displaying commonly etch pits up to several micrometers in size and depth along with rather uniformly distributed 20-100 nm protrusions of PbS phase. The changes both in topography and semiconducting properties of PbS found by tunneling spectroscopy have been explained in terms of the non-uniform distribution of donor- and acceptor-type defects D+/D in the metal depleted surface layer, which are generated by chemical reactions and, in turn, determine the rates of the PbS corrosion. In particular, the D centers exhibit a self-catalyzing effect on the non-oxidative local dissolution of PbS in HCl media, resulting in the deep etch pits.  相似文献   
20.
x射线光刻非常适合用于深亚微米T形栅的制作,这是因为它的高分辨率、大的曝光视场和高的生产效率足以满足MMIC制造工艺的要求。本文中我们首先对我们的x射线掩模制造工艺进行介绍,然后论述了一种用于制造深亚微米T形栅的两层胶工艺,介绍了所取得的一些研究结果,最后对国内的深亚微米光刻现状进行了简要分析。  相似文献   
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