场发射显示器中双层基板结构的数值分析

分析了场发射显示器(FED)中玻璃基板在大气压力下的形变和应力与玻璃基板厚度的关系,得到基板形变和应力随着其厚度的减少而急剧增大。通过研究玻璃基板表面粗糙度及其形变对于器件内部场强及碳纳米管发射电流密度的影响,得出为了保证95%以上的发射电流均匀度,低压型和高压型FED的阴极基板表面粗糙度均应在1μm以内,而阳极基板最大形变分别不超过10μm和40μm。在上述研究的基础上,提出了双层基板结构,其引入改善了FED内表面的粗糙度,同时使得12.7 cm(5 in)以下尺寸的FED屏中取消了支撑。文中还讨论了对于大尺寸屏幕的支撑配置方法。分析结果表明,双层基板结构对于改善发射均匀性和优化支撑体配置具有良好效果。     

准分子激光光束均匀性的评价指标研究

 详细研究了准分子激光光束均匀性的各项评价指标，加工窗口描述了加工任务本身对光束均匀度的要求；能量分数回答了具体加工窗口即均匀度要求下的能量利用率问题；平顶因子则描述了整个光斑能量分布范围内的均匀性问题。利用激光波面分析仪对不同均匀器所获得的均匀光束进行评价比较，蝇眼透镜均匀器能量利用率高，整个光斑内的均匀效果好，但最佳均匀截面的位置动态范围小；组合棱镜均匀器均匀截面动态范围大，但整体均匀效量较差。     

Study on the Uniformity of Microgrooves in Through-Mask Electrochemical Micromachining with Moving Cathode北大核心CSCD

As a typical surface texture, microgrooves have broad prospects in the fields of mechanical engineering, bio-medicine, new energy and efficient heat dissipation of electronic products. Through-mask electrochemical micromachining (TMEMM) is widely used in the fabrication of micro-structures because of high processing efficiency and no residual stress. However, due to the edge effect of current distribution, there is often a serious dimension discrepancy problem in electrochemical machining of micro-structures. In order to weaken the influence of edge effect on the uniformity of microgrooves, the method that TMEMM with a moving cathode is presented. The current distribution in the electrochemical machining is constantly changed by the movement of the cathode. Thus, the uniformity of the micro-structure is improved. The method is studied through the combination of simulation and experimental verification. Firstly, the electrochemical machining process of TMEMM was analyzed theoretically. The theoretical analysis results show that the depth of electrolytic etching is proportional to the current density of electrolytic machining. To change the uniformity of the electrochemical machining, the most important thing is to improve the uniformity of the current distribution. On this theoretical basis, the current distribution and anodic contour of microgroove array during TMEMM are simulated by using the COMSOL finite element analysis software. The simulation results indicate that, compared with the conventional TMEMM, the TMEMM with moving cathode can obtain the microgrooves array with more uniform size. Secondly, on the basis of numerical simulation, the TMEMM experiment was carried out. The experimental results indicate that the TMEMM method of moving cathode can effectively improve the size uniformity of microgroove array. It can be observed by microscope that the microgroove array obtained by TMEMM with a moving cathode had good structural morphology and higher uniformity. Compared with conventional TMEMM, the uniformity of TMEMM with moving cathode has been improved by 68.3%. At the same time, under different experimental conditions, the trend of unevenness of microgroove array was calculated. With the increase of the distance between the cathode and anode, the microgroove depth heterogeneity showed a tendency of first decreasing and then increasing, when the distance between anode and cathode is about 1.3 mm, the unevenness of microgroove array reaches the minimum point. With the increases of cathode width and cathode speed, the depth inhomogeneities of microgroove increase and decrease gradually, respectively. The simulation results are basically consistent with the experimental results. It can be seen that the TMEMM with the moving cathode method can greatly improve the size uniformity. © 2021 Authors. All rights reserved.     

LD面阵侧面泵浦Nd:YAG晶体吸收光场研究

为了研究LD面阵侧面泵浦Nd∶YAG晶体吸收光场的均匀性,本文提出了一种新的求解泵浦光路径的计算方法。首先建立了适用于不同泵浦结构的激光二极管多侧面泵浦全固态激光器的晶体吸收光场分布模型;然后模拟并分析了单向面阵泵浦结构各参量:bar条个数、bar条间隔、bar面倾斜程度对面阵泵浦晶体吸收光场均匀性及泵浦效率的影响。本文研究为LD侧面泵浦全固态激光器的设计和研究提供理论基础。     

真空盒对二极铁场均匀性影响的研究

通过计算机模拟计算与实验相结合, 讨论了真空盒磁导率对二极磁铁磁场分布的影响. 结果表明当真空盒磁导率μ_r≠1时, 真空盒将影响磁铁磁场分布, 在磁场均匀性要求很高时, 必须考虑真空盒的材料与尺寸对磁场均匀性的影响.     

全彩LED显示屏亮度检测与校正算法

针对全彩LED显示屏亮度均匀性问题,介绍了一种基于CCD相机的全彩LED显示屏亮度检测和校正算法。首先利用CCD相机获取显示中的图像,通过数学形态学和大津法对图像进行去噪和阈值分割处理,确定LED灯点的中心位置,然后使用最佳包含圆方法统计分析各个灯点的相对亮度值,并计算出其三色校正系数矩阵。实验证明,该算法检测速度快,校正效果较好,从而改善了显示的质量,延长了显示屏的使用寿命。     

基于无缝平凹透镜阵列的LCD背光模组设计

针对大尺寸LCD直下式背光模组的均匀性问题提出了一种无缝平凹透镜阵列,用以代替常用的扩散膜。模拟了106.68mm(42in)LED背光源的光学分布,得到了合适的透镜半径、结构以及LED阵列间距,分析了平凹透镜阵列半径和平凹透镜阵列与光源的相对位置对匀光作用的影响。结果表明:半径为1mm、厚度为2mm的无缝平凹透镜阵列较好地起到了匀光的效果,接收面的照度均匀性为88.61%。     

离子注入剂量的均匀性检测和校正

介绍了离子注入机中注入剂量的均匀性检测和校正,着重阐述了均匀性的检测原理、均匀性计算公式、均匀性检测和校正流程及算法。     

二极管侧面泵浦薄片激光器泵浦性能数值仿真

利用二极管侧面泵浦薄片激光器泵浦分布的对称性,通过泵浦分布中的特殊点对泵浦均匀性进行定量描述的方法,提出了由泵浦均匀性和吸收效率共同表征的泵浦性能指标,并使用该指标对一定范围内的阵列距离、圆薄片晶体尺寸和吸收系数的泵浦性能进行了对比。在一定取值范围内,当圆薄片晶体半径为13 mm、阵列与晶体中心间距为37 mm、吸收系数为0.10 mm-1时,泵浦性能指标达到最小值0.111 0。采用接近最优泵浦性能指标值的泵浦参数进行实验,初步测量了热效应造成的薄片相位畸变,根据泵浦分布计算出的相位畸变分布与实验结果基本相符。文中提出的泵浦性能指标和相应计算结果为薄片激光器的优化设计提供了理论参考。     

0.5μm分步光刻机关键参数测量与分析

主要对 0 5 μm分步光刻机的几个代表性参数即 :投影镜头分辨率、照明均匀性、套刻精度、工作台步进精度、镜头畸变等引起误差的原因 ,测量和计算方法以及采取的相应措施作了一些归纳性总结 ,在解释问题的同时 ,也提出了相应的解决办法 ,为下一代光刻机的研制打下一定的基础。