SHPB试验中粘弹性材料的应力均匀性分析

采用特征线解法，对满足ZWT方程的粘弹性材料在高应变率SHPB试验中的应力均匀性进行了数值研究。着重分析了不同的材料本构粘性(松弛时间)、瞬态波阻抗比和入射波升时对于试样中应力均匀性、应变均匀性和平均应变率等的影响。为今后动态试验的试样设计提供了一定的理论依据。     

内热式多级连续真空炉炉温均匀性的测定及改善

内热式多级连续真空炉广泛应用于二元合金的分离中,但由于炉膛冷凝罩内温度均匀性差而影响了产品质量。真空炉温度控制水平不高是导致真空炉炉温均匀性差,制约真空炉广泛应用和发展的重要原因。本文以内热式多级连续真空炉温度控制为研究对象,利用模糊算法离线整定PID（由比例单元P、积分单元I和微分单元D组成的控制器）参数,得到了较为理想的控制效果。同时利用有限元法分析真空炉温度场分布规律并依此安装测量热电偶,在未加料的情况下测量结果表明：利用模糊算法整定PID参数后炉膛内各测试点温度偏差较改善前明显缩小,偏差降低率最小为2.38％,最大为6.35％。提高了真空炉冶炼合金的种类范围和产品质量。     

全彩色LED显示屏的计算机辅助调校方法

阐述了全彩色LED显示屏的结构与基本工作原理,并根据人的视觉特点和LED的显示特性,给出了用笔记本式计算机和SpyderTV套件调校全彩色LED显示屏的方法,包括调校前的基本设定以及精确地检测全彩色LED显示屏画面的色温、亮度、对比度、色饱和度、色调等光度特性.应用表明,该方案具有很高的可靠性与易用性,经过调校的金彩色...     

几乎完全非线性多项式函数间的EA等价性

简述了几乎完全非线性(APN)多项式函数的研究现状,讨论了两类几乎完全非线性多项式函数间的扩张仿射(EA)等价性,给出了验证EA等价的一般方法.     

Development of a large area plate-to-plate type UV imprinting tool

A UV imprint lithography tool has been developed for micro/nano-scale patterning in an extremely large area, i.e., ∼300 × 400 mm². To achieve high pattern fidelity, residual-layer thickness uniformity, and an air bubble-free layer in a large area, the UV imprint tool has several main components including a silicon rubber uniform pressurizer, a large area UV-LED module, a vacuum pump, a chuck module, etc. Contact and structural analyses have been performed using commercial FEM packages such as LS-DYNA and ANSYS. The developed tool has been tested, and its performance indices including pattern fidelity and residual-layer thickness uniformity have been measured to be ∼97% and ∼90%, respectively.     

基于小物镜系统的热像差影响因素分析

光机热集成分析是光机结构设计中的重要环节,对光学系统像质的预测与补偿有着重要的参考价值。针对小物镜系统,进行光机热集成分析,结果表明该系统产生的热像差较大,影响系统光学性能,其中温度升高导致折射率变化引入的系统热像差较大;结构热变形引入的系统热像差较小,可以忽略;镜片与支撑结构之间的导热、上下窗口的空气扰动、机械结构外表面的环境对流也会存在一定影响,但影响较小。由此可知系统热像差的主要影响因素是热载的大小,设计过程中减少透镜厚度及材料吸收率,降低系统热载,是减小光学系统热像差最为有效的途径。     

侧入式无导光板LED平板灯的设计与实现

针对侧入式LED平板灯出光效率低、导光板(LGP)制造成本高等缺点,设计了一种无LGP窗式结构的新型LED平板灯,介绍了设计结构模型和光学模型。采用柱面透镜将侧面入射的LED发散光束会聚在出光面板上,并通过掠射和叠加方法实现出光面板的照度均匀性。分析了LED阵列之间的距离、LED灯珠的投射角以及LED阵列中LED的间距对辐射照度分布均匀性的影响,利用九宫格取值法和TracePro软件对所设计的LED平板灯进行参数优化。模拟和实验结果表明,当LED平板灯单窗格面积为240mm×300mm、厚为15mm以及平凸柱面透镜的曲率半径为4mm时,优化后的LED灯珠投射角为4°左右,LED平板灯出光面板上的照度均匀度可达85%以上,理论仿真结果与实验结果相一致。     

新型碱性精抛液对300mm铜膜全局平坦化的影响

The copper removal rate and uniformity of two types copper slurries were investigated, which was performed on the 300 mm chemical mechanical planarization （CMP） platform. The experiment results illustrate that the removal rate of the two slurries is nearly the same. Slurry A is mainly composed ofa FA/OI1 type chelating agent and the uniformity reaches to 88.32%. While the uniformity of slurry B is 96.68%, which is mainly composed of a FA/OV type chelating agent. This phenomenon demonstrates that under the same process conditions, the uniformity of different slurries is vastly different. The CMP performance was evaluated in terms of the dishing and erosion values. In this paper, the relationship between the uniformity and the planarization was deeply analyzed, which is mainly based on the endpoint detection mechanism. The experiment results reveal that the slurry with good uniformity has low dishing and erosion. The slurry with bad uniformity, by contract, increases Cu dishing significantly and causes copper loss in the recessed region. Therefore, the following conclusions are drawn： slurry B can improve the wafer leveling efficiently and minimize the resistance and current density along the line, which is helpful to improve the device yield and product reliability. This investigation provides a guide to improve the uniformity and achieve the global and local planarization. It is very significant to meet the requirements for 22 nm technology nodes and control the dishing and erosion efficiently.     

基于二元光学设计的高能激光窗口的初步探讨

对非均匀近场强度分布影响强激光远场聚焦效果的原因进行了分析。对高能激光窗口进行了二元光学设计。提高了光束强度分布的均匀性,改善了光束质量。介绍了二元光学设计的基本原理,采用随机并行扰动爬山法对窗口的位相分布、变换后的光束强度分布、衍射效率和光束均匀性进行了计算。计算结果表明,基于二元光学设计的激光窗口能有效地改善光束强度分布的均匀性,提高了发射光束的质量。     

Neighborhood assignments and cardinal functions: a unified approach to metrization and uniformity

We use neighborhood assignments and cardinal functions to give a unified approach to metrizability and uniformity. This leads to a number of characterizations of m(X), the metrizability degree of X, u(X), the uniform weight of X, and w(X), the weight of X. For X normal (and regular), m(X) = u(X); it is unknown whether this result extends to completely regular spaces.