CIELAB与CIECAM02色空间均匀性比较研究

采用均匀色空间Munsell系统检验和验证了CIELAB和色貌模型CIECAM02色空间的均匀性。利用Mun- sell色卡所对应的三刺激值X,Y,Z作为模型的输入值,预测色空间模型的明度、彩度和色调,并通过预测结果比较和检验了CIELAB色空间和CIECAM02模型色空间的均匀性。研究表明:在预测明度方面,两个色空间的结果相似;在预测彩度时,CIECAM02模型较好于CIELAB色空间;在预测色调时,当色调逐渐从BG变化到B时,CIELAB所预测的色调角与由Munsell色空间计算出来的色调角之差逐渐增大,最大时超过6%,而CIECAM02所预测的色调角与Munsell色空间的色调角之差在2.5%以内,CIECAM02优于CIELAB色空间。     

BP神经网络电子束扫描均匀度校正系统

电子束的扫描均匀度是工业辐照电子直线加速器的重要技术指标,该校正系统利用人工神经网络中的误差反向传播法可以对扫描电流波形进行校正,以克服扫描磁场引起的电子束形状变化、位置改变等造成的电子束分布的不均匀性,从而使扫描曲线的归一化均方偏差达到1.8%。     

适用于放大自发辐射平滑光束的脉宽压缩方法

为了增加靶上的功率密度和耦合效率,基于饱和增益开关原理,发展了一种适用于放大自发辐射平滑光束的脉宽压缩方法。利用该方法,在赛格德大学的一台放电泵浦KrF准分子激光器上进行了实验,将该激光器输出的脉宽为14.5 ns的放大自发辐射光束压缩到了7.5 ns,并且保持了光束原有的均匀性。

     

低功率刻蚀工艺均匀度研究

在二氧化硅刻蚀工艺中,有时为了控制氧化膜的损伤,需要采用低功率刻蚀工艺。文中研究了在低射频功率条件下,通过改变磁场强度、暖机条件及反应气体的组成,对刻蚀均匀度的影响。实验结果表明,在低功率条件下,改变磁场强度和暖机条件对刻蚀均匀度的改变有限,但当向主刻蚀气体中加入氧气后,能较大程度地改变刻蚀均匀度。     

实现均匀照度光伏聚光镜设计

为满足聚光光伏系统的聚光需求,解决传统点聚焦式聚光光伏系统中聚焦光斑不均匀、径长比过大和聚光比较小的缺点,在不增加二次匀光器件的前提下,设计了径长比小、聚焦光斑相对均匀、聚光比高的聚光光伏系统。根据几何光学柯勒照明原理、等光程原理和反射定律,通过数值求解等光程方程组获得聚光镜各个面型的轮廓曲线。利用TracePro软件对所设计的聚光系统进行光线追迹模拟,结果表明:在聚光比为725的情况下,聚焦光斑最大照度仅为太阳照度的2300倍,是点聚焦情况下的1/10左右,系统的径长比为0.3,接收角为0.72°。系统设计实现了结构紧凑,聚光性能高的设计目标,为高倍聚光光伏系统的小型化,简单化提供了一种有效的解决途径。     

Proposition of a compensated pixelwise calibration for photonic infrared cameras and comparison to classic calibration procedures: Case of thermoelastic stress analysis

In this paper, we propose a compensated pixelwise calibration that integrates the effects of the camera housing temperature. The results of this calibration are compared on black body images to classic two points Non Uniformity Correction based calibrations, compensated or not. It is shown that the proposed approach leads to a significant improvement in the thermal resolution with a reduction in the mean error as well as the standard deviation. The approach is finally challenged on a real case measurement focusing on thermoelasticity. The gain in terms of accuracy measurement is highlighted by comparing the proposed calibration to classic calibrations and the scope of interest of this new calibration is discussed.     

Backlit Keyboard Inspection Using Machine Vision

A robust system for backlit keyboard inspection is revealed. The backlit keyboard not only has changeable diverse colors but also has the laser marking keys. The keys on the keyboard can be divided into regions of function keys, normal keys, and number keys. However, there might have some types of defects:incorrect illuminating area, non-uniform illumination of specified inspection region (IR), and incorrect luminance and intensity of individual key. Since the illumination features of backlit keyboard are too complex to inspect for human inspector in the production line, an auto-mated inspection system for the backlit keyboard is proposed in this paper. The system was designed into the operation module and inspection module. A set of image processing methods were developed for these defects inspection. Some experimental results demonstrate the robustness and effectiveness of the proposed system.     

包层折射率均匀调制LPFG光谱特性研究

介绍了光纤光栅发展的过程,阐述了光纤光栅的各种常用写制方法以及目前LPFG的发展现状,分析了耦合模理论;基于耦合模理论在纤芯折射率均匀调制的LPFG中的应用,利用Matlab软件对LPFG的光谱进行模拟,将耦合模理论进行修改,给出了单侧写制的LPFG的光谱图,提出了多侧写制LPFG的模型及曝光均匀度的概念。     

超高强度钢（35CrNi3Mo）化学成分标准物质研制

采用与超高强度钢,台炼过程相同的工艺制备了35CrNi3Mo化学成分标准物质。对标准物质的制备技术、均匀性检验、稳定性考察进行了分析。研制的35CrNi3Mo化学成分标准物质具有良好的均匀性和稳定性。采用8家实验室进行协作定值,对定值结果的不确定度进行评定,各组分定值结果的相对扩展不确定度小于13％。     

A class of band-limited chip waveforms for DS-CDMA systems

In Direct Sequence Code Division Multiple Access （DS-CDMA） systems, the chip waveform affects the implementation, system bandwidth, envelope uniformity, eye pattern and Multiple user Access Interference （MAI）. In this paper, based on an elementary density function of a second order polynomial, a class of second order continuity pulses is proposed. From this class of pulses, we can find some members having faster decaying rate, bigger eye opening, more uniform envelope and stronger anti-MAI capability than the Nyquist waveform. The normalized-bandwidth-pulseshape-factor product, the decaying rate of the tail of the time waveform, the opening of the eye diagram, and the envelope uniformity of the second order continuity pulses are addressed in the paper that provide the basic information for the selection of the chip pulse for CDMA systems.