导体栅的静电屏蔽作用

采用保角变换的方法 ,计算了导体栅作屏蔽罩时的场强分布 ,所得结果表明导体栅具有很好的静电屏蔽作用     

HP83480数字通信分析仪的硬件测量算法

参数测量主要指对波形特性，如上升时间、下降时间、过冲、周期、脉冲波形或眼图的幅度等。掩码测量将波形与预定掩码比较。眼参数测量是专用于眼图性质的测量，如眼高、眼宽、抖动、交叉高度和消光比等。     

锑掺杂氧化锡粉体的太赫兹透射特性

以SnCl45H2O和SbCl3为原料,采用液相化学共沉淀法制备锑掺杂氧化锡（ATO）粉体。分析了不同Sb掺杂质量分数条件下,ATO粉体的禁带宽度变化,并对材料在0.2~1.6 THz波段的透射时域和频域谱,以及吸收和屏蔽参数进行了对比分析。结果表明,ATO粉体的禁带宽度随着Sb掺杂量的增加先减小后增大;同时,ATO粉体对THz波的吸收系数随着Sb掺杂量的增加先增大后减小,当Sb掺杂质量分数为9%时,ATO的吸收系数在1.25 THz处达到最大值156.5 cm-1,屏蔽效能在1.24~1.60 THz范围内最高达到45.0 dB。     

数字掩模灰度细分技术研究

数字掩模技术是一种很有发展前途的衍射微光学元件制作技术。实际制作时,由于感光材料具有感光非线性,实际可利用的灰度数目将小于256。即使256级灰度全部可用,也无法实现曝光量的精细控制以达到一般的加工要求。文中提出了2种灰度细分的方法,即多SLM组合调制和彩色等效灰度技术。从理论上分析了2种方法均能实现灰度的细分,从而达到曝光量的精细控制。     

微光机电系统的微绞链研制

本文讨论了非硅微机械工艺和微绞链的研制工艺。我们研制的非硅表面微机械工艺采用两次或三次掩模电镀层，聚酰亚胺和光刻胶分别作为底层和第二、第三层的牺牲层。用这套工艺，研制成功了三种不同种类的微绞链。微绞链能在基片表面作０—１８０度自由转动。     

13C shielding scale for MAS NMR spectroscopy

We have performed the direct measurements of ¹³C magnetic shielding for pure liquid TMS, solution of 1% TMS in CDCl₃ and solid fullerene. The measurements were carried out in spherical ampoules exploring the relation between the resonance frequencies, shielding constants and magnetic moments of ¹³C and ³He nuclei. Next the ¹³C shielding constants of glycine, hexamethylbenzene and adamantane were established on the basis of appropriate chemical shifts measured in the solid state. All the new results are free from susceptibility effects and can be recommended as the reference standards of ¹³C shielding scale in the magic angle spinning NMR experiments. Copyright © 2011 John Wiley & Sons, Ltd.     

Estimation of isotropic nuclear magnetic shieldings in the CCSD(T) and MP2 complete basis set limit using affordable correlation calculations

A linear correlation between isotropic nuclear magnetic shielding constants for seven model molecules (CH₂O, H₂O, HF, F₂, HCN, SiH₄ and H₂S) calculated with 37 methods (34 density functionals, RHF, MP2 and CCSD(T)), with affordable pcS‐2 basis set and corresponding complete basis set results, estimated from calculations with the family of polarization‐consistent pcS‐n basis sets is reported. This dependence was also supported by inspection of profiles of deviation between CBS estimated nuclear shieldings and shieldings obtained with the significantly smaller basis sets pcS‐2 and aug‐cc‐pVTZ‐J for the selected set of 37 calculation methods. It was possible to formulate a practical approach of estimating the values of isotropic nuclear magnetic shielding constants at the CCSD(T)/CBS and MP2/CBS levels from affordable CCSD(T)/pcS‐2, MP2/pcS‐2 and DFT/CBS calculations with pcS‐n basis sets. The proposed method leads to a fairly accurate estimation of nuclear magnetic shieldings and considerable saving of computational efforts. Copyright © 2013 John Wiley & Sons, Ltd.     

惯性平台系统的EMC分析与EMI设计

主要针对惯性平台系统的EMC(电磁兼容性)分析和EMI(电磁干扰)设计,给出了EMC的概念,介绍了与惯性平台系统有关的EMI源及其特点,给出了平台系统EMI的耦合途径.依据平台系统EMI的特点和耦合途径,提出了平台系统在进行地线设计、布线、滤波、屏蔽、防止静电放电等方面应遵循的准则和采取的措施.     

屏蔽槽SOI高压器件新结构和耐压机理

提出具有屏蔽槽的SOI高压器件新结构和自适应界面电荷耐压模型.该结构在屏蔽槽内产生跟随漏极电压变化的界面电荷,此电荷使埋层介质的纵向电场增加,同时使顶层硅的纵向电场降低,并对表面电场进行调制,因此屏蔽了高电场对顶层硅的影响.借助二维器件仿真研究器件耐压和电场分布与结构参数的关系.结果表明,该结构使埋氧层的电场从传统的3Es升高到近600V/μm,突破了传统SOI器件埋氧层的耐压值,大大提高了SOI器件的击穿电压.     

新型URE-2000S型紫外单、双面深度光刻机研制

重点介绍新近开发的用于单、双面深度曝光的URE-2000S新型紫外光刻设备的技术背景、工作原理、结构组成、技术措施以及总体性能。该设备采用了国内首创的CCD图像底面对准技术、单曝光头实现双面对准曝光,具有双面套刻对准精度高、操作简单、工作高效等优点。实验表明,该设备总体性能处于国产双面光刻的先进水平,接近国外同类产品水平。