Surface structures formed by individual adsorption and coadsorption of Mn and Bi on Cu(0 0 1), studied by LEED

We have studied the individual adsorption of Mn and Bi, and their coadsorption on Cu(0 0 1) by low-energy electron diffraction (LEED). For Mn, we have determined the c(2 × 2) structure formed at 300 K, whose structure had been determined by several methods. We reconfirmed by a tensor LEED analysis that it is a substitutional structure and that a previously reported large corrugation (0.30 Å) between substitutional Mn and remaining surface Cu atoms coincides perfectly with the present value. In the individual adsorption of Bi, we have found a c(4 × 2) structure, which is formed by cooling below ∼250 K a surface prepared by Bi deposition of ∼0.25 ML coverage at 300 K where streaky half-order LEED spots appear. The c(4 × 2) structure has been determined by the tensor LEED analysis at 130 K and it is a substitutional structure. In the coadsorption, we found a c(6 × 4) structure, which has been determined by the tensor LEED analysis. It is very similar to the previously determined structure of the c(6 × 4) formed by coadsorption of Mg and Bi, and embedded MnBi₄ clusters are arranged in the top Cu layer instead of MgBi₄. Large lateral displacements of Bi atoms in the c(6 × 4)-(Mn + Bi) suggest that the Mn atoms undergo the size-enhancement caused by their large magnetic moment.     

Germanium growth on Br-terminated Si(1 0 0)

The consequences of Ge deposition on Br-terminated Si(1 0 0) were studied with scanning tunneling microscopy at ambient temperature after annealing at 650 K. One monolayer of Br was sufficient to prevent the formation of Ge huts beyond the critical thickness of 3 ML. This is possible because Br acts as a surfactant whose presence lowered the diffusivity of Ge adatoms. Hindered mobility was manifest at low coverage through the formation of short Ge chains. Further deposition resulted in the extension and connection of the Ge chains and gave rise to the buildup of incomplete layers. The deposition of 7 ML of Ge resulted in a rough surface characterized by irregularly shaped clusters. A short 800 K anneal desorbed the Br and allowed Ge atoms to reorganize into the more energetically favorable “hut” structures produced by conventional Ge overlayer growth on Si(1 0 0).     

WDM传输系统中泵浦配置对光纤拉曼放大器增益特性的影响

通过理论分析和模拟运算,研究了光纤拉曼放大器泵浦优化的一般规律。     

数字散斑干涉技术及应用

介绍了数字散斑干涉技术在位移、应变、振动和医学诊断等领域中的应用和国内外发展状况。提出了一种新的应用领域—数字散斑干涉技术在语音识别中的应用,并对该方法作了介绍,讨论了它的特点。     

激光晶体Nd:YVO4的形貌及生长缺陷

本文报道了应用环境扫描电镜（ESEM）和同步辐射X射线白光形貌术对采用提拉法生长出的Nd:YVO4晶体进行的形貌及生长缺陷的分析,获得了该晶体的开裂表面的ESEM形貌像以及取自晶体肩部和中间部位的（001）面的同步辐射白光形貌像,观察到了位错、包裹物等缺陷,可为生长高质量的Nd:YVO4晶体提供重要的启示.     

基于体全息技术的WDM器件

利用体全息技术制作波分复用器件是一种新方法。本文介绍了此种方法的基本原理和器件的基本性能，并报道了国外对该项技术的研究进展。     

头盔显示器的关键技术及有关设计问题综述

头盔显示器可以提高驾驶员的态势感知能力，红外传感器提供的信息，使驾驶员的态势感知能力大大加强，头盔显示器提供的红外图像，使恶劣的天气和黑夜不再成为驾驶员作战的障碍，概述了头盔显示器的发展过程和关键技术，介绍了当前空军用头盔显示器的技术问题，解决方法，设计示例。     

一种支持QoS的拓扑自适应动态组播路由算法

YAM、QoSMIC、DSDMR等一类支持QoS的动态组播路由算法允许组播成员动态地加入和离开，同时为接收方提供多个可选择的组播接入路径，以满足不同应用的QoS需求。但这些算法普遍存在控制信令开销大和结点加入时延长，可扩展性不好等问题。本文在分析这些算法的基础上，提出改进的支持QoS的动态组播路由算法，即拓扑自适应动态组播路由（Topology Adaptive Dynamic Multicast Routing，TADMR）算法。该算法避免了以往算法中大部分盲目的路径搜索，并使结点加入时延不再受限于固定的等待时钟，而与网络拓扑相自适应。性能分析和仿真结果表明，该算法具有较低的控制信令开销和结点加入时延，适用于各种网络规模和群组规模，具有良好的可扩展性。     

一种改进的交错脉冲解速度模糊方法

研究了脉冲多普勒气象雷达中用于解速度模糊的交错脉冲方法，理论分析了时域脉冲对处理中速度估计公式的局限性，同时对该公式进行了修正。仿真结果表明，改进的交错脉冲方法具有更好的解速度模糊性能，而且易于实时处理。     

A nilpotent Roth theorem

Let T and S be invertible measure preserving transformations of a probability measure space (X, ℬ, μ). We prove that if the group generated by T and S is nilpotent, then exists in L ²-norm for any u, v∈L ^∞(X, ℬ, μ). We also show that for A∈ℬ with μ(A)>0 one has . By the way of contrast, we bring examples showing that if measure preserving transformations T, S generate a solvable group, then (i) the above limits do not have to exist; (ii) the double recurrence property fails, that is, for some A∈ℬ, μ(A)>0, one may have μ(A∩T _-n A∩S ^{- n} A)=0 for all n∈ℕ. Finally, we show that when T and S generate a nilpotent group of class ≤c, in L ²(X) for all u, v∈L ^∞(X) if and only if T×S is ergodic on X×X and the group generated by T ^-1 S, T ^-2 S ²,..., T ^-c S ^c acts ergodically on X. Oblatum 19-V-2000 & 5-VII-2001?Published online: 12 October 2001