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Kazuhiro Matsuo 《Journal of statistical physics》1978,18(6):535-555
A projection operator method is presented, which provides the most efficient way for calculating the stationary behavior of nonlinear Brownian motion. A continued-fraction expansion of the Fourier-Laplace transform of the displacement correlation function or the spectral density is used. This method utilizes a successive optimization procedure on the nonlinear terms and includes the method of statistical linearization as the lowest order approximation. A systematic way to calculate the continued fraction numerically up to sufficient order for convergence is developed, which enables us to obtain the spectral density of a system previously uncomputable.Numerical computations of the spectral density of a nonlinear oscillator with a double-well potential are presented and compared with the results obtained by statistical linearization.This work was supported in part by the National Science Foundation under Grant CHE 75-20624. 相似文献
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The brightness of the X‐ray source in a W/Al‐film target used for X‐ray projection microscopy was studied by an approach using the Monte Carlo simulation. Since continuous X rays generated in a thin film have a specific angular distribution of emission, the brightness of the continuous X‐ray source cannot simply be estimated on the assumption that the angular distribution is homogeneous. The newly developed approach using the Monte Carlo simulation enables the evaluation of the effective source size, angular distribution, and brightness of a continuous X‐ray source with sufficient accuracy that it leads to the optimum design of a high‐brightness X‐ray source for uses such as X‐ray projection microscopy. The Monte Carlo calculations were performed for W(Δz)/Al (200 µm)‐film targets with different thicknesses of W film, Δz, under bombardment of 60 kV electrons. The results have suggested an optimum design consisting of a W (2 µm)/Al (200 µm)‐film target as most promising for providing an X‐ray source of higher brightness than the W (5 µm)/Al (200 µm)‐film target, which has already been in practice for X‐ray projection microscopy. Copyright © 2006 John Wiley & Sons, Ltd. 相似文献
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A solvent-free lift-off method has been introduced to fabricate the aluminum nano-hole array with diameter down to 80 nm as the base electrode for a vertical organic transistor. The imprinted vertical organic transistor exhibited base leakage current density as low as 5 × 10−5 mA/cm2 and high ON/OFF current ratio as high as 105. 相似文献
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Kazuhiro Nakabayashi Shigeki Sobu Yuji Kosuge Hideharu Mori 《Journal of polymer science. Part A, Polymer chemistry》2018,56(19):2175-2182
This work demonstrates the UV nanoimprinting lithography (UV-NIL) of high refractive index and highly transparent polythioethers based on thiol-ene click chemistry. Herein, 9,9-bis(3-mercaptopropylphenylether)fluorene (BMPF) is designed as a new thiol monomer with a high refractive index, high transparency, and good processability for UV-NIL. Colorless polythioethers are synthesized from BMPF and ene monomers under mild thiol-ene click reaction conditions. Excellent transmittance (96%) of 400 nm light is observed in all the polymer films and high refractive index values of 1.5972–1.6382 are attained. UV-NIL using thiol-ene photopolymerization affords polymer nanoimprinting patterns with various features on the order of 100–500 nm without any fractures. To the best of our knowledge, this is the first report on UV-NIL of high refractive index and highly transparent polymers. Through proper monomer and polymer design, novel polythioethers with suitable glass transition temperature (T g) values are developed with high refractive index, high transparency, and good UV-NIL processability. Furthermore, UV-NIL based on thiol-ene click chemistry is accomplished at the nanoscale. © 2018 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2018 , 56, 2175–2182 相似文献