The Studies of the Heterogeneous Properties of Solid Surfaces by Means of the Derivatograph Q-1500 D

A simple method has been adopted to obtain an important information on the heterogeneous properties of materials studied, adsorbed liquid films and liquid-solid interactions. The method utilizes Q-TG mass loss and the first derivative Q-DTG mass loss curves with respect to temperature and time obtained during programmed liquid thermodesorption in quasi-isothermal conditions. The values of the adsorption capacity, total porosity of material, the value of active centers, desorption energy distribution and mesopore-size distribution functions obtained by this method are in good agreement with those estimated on the basis of independent methods. The theoretical and experimental results provided novel and unique data on the heterogeneity of solid surfaces, properties of liquid adsorbed films and thermal stability of the liquid/solid interfaces. This paper presents the more important results obtained so far in the studies the liquid/solid systems by means of the Paulik's classical and quasi-isothermal techniques. This revised version was published online in July 2006 with corrections to the Cover Date.     

Modeling growth rate of HfO2 thin films grown by metal-organic molecular beam epitaxy

HfO₂ dielectric layers were grown on the p-type Si (100) substrate by metal-organic molecular beam epitaxy (MOMBE). Hafnium-tetra-butoxide, Hf(O·t-C₄H₉)₄ was used as a Hf precursor and Argon gas was used as a carrier gas. The thickness of the HfO₂ film and intermediate SiO₂ layer were measured by scanning electron microscopy (SEM) and high-resolution transmission electron microscopy (HRTEM). The properties of the HfO₂ layers were evaluated by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), high frequency (HF) capacitance-voltage (C-V) measurement, and current-voltage (I-V) measurement. C-V and I-V measurements have shown that HfO₂ layer grown by MOMBE has a high dielectric constant (k) of 20-22 and a low-level of leakage current density. The growth rate is affected by various process variables such as substrate temperature, bubbler temperature, Ar and O₂ gas flows and growth time. Since the ratio of O₂ and Ar gas flows are closely correlated, the effect of variations in O₂/Ar flow ratio on growth rate is also investigated using statistical modeling methodology.     

透视/遮阳/控温/红外隐身多功能集成序构薄膜研究

为了解决光学材料多功能耦合与集成的光谱诉求及其材料设计冲突难题,本文提出一种基于［TiAlN/Ag］²/TiAlN序构复合薄膜开展可见光透射诱导与红外辐射抑制的协同设计方法,诠释序构薄膜材料多功能耦合的新原理与新机制,并对其光学兼容性能测试表征。研究表明,构筑的［TiAlN（厚度30 nm）/Ag（厚度15 nm）］²/TiAlN（厚度30 nm）序构复合薄膜具备带通状选择性透射与中远红外低辐射的光学特性,可较好实现透视、遮阳、低辐射控温与红外隐身多功能兼容效果,在军用车辆、绿色建筑等特种玻璃的辐射控温与红外隐身领域有应用潜力。     

一种双靶磁控溅射制备的Mg掺杂的NiO薄膜

采用磁控溅射“共溅射”方法,将Ar气作为溅射气体,高纯NiO和MgO双陶瓷靶作为溅射靶材。当控制NiO和MgO靶的溅射功率分别为190 W和580 W,溅射真空度为2 Pa,衬底温度为300℃时,得到了Mg掺杂的NiO(Ni_0.61Mg_0.39O)薄膜。该薄膜是一种具有(200)择优取向的晶态薄膜。薄膜表面比较平整,晶粒分布致密,晶粒尺寸约46.9 nm。(200)衍射峰位置相对未掺杂的NiO薄膜向小角度偏移约0.2°。合金薄膜在可见光波段具有较大的透过率,而在300 nm附近透过率陡然下降,其光学带隙向高能方向移动到了3.95 eV。该研究为采用磁控溅射制备高质量的Mg掺杂的NiO薄膜提供了技术支撑。     

ZnO薄膜的椭偏和DLTS特性

用射频磁控溅射在硅衬底上淀积氧化锌薄膜,并对样品分别作氮气、空气、氧气等不同条件下退火处理。为研究退火气氛对ZnO/Si薄膜中缺陷以及折射率的影响,由深能级瞬态谱(DLTS)以及椭偏测量方法进行了检测。椭偏测量结果表明相对原始生长的样品,在氮气和空气退火使ZnO薄膜折射率下降,但氧气中退火使折射率升高。我们对折射率的这种变化机理进行了解释。DLTS测量得到一个与Zni**相关的深能级中心E1存在,氧气气氛退火可以消除E1能级。在氮气退火情况下Zn*i*的存在对抑制VO引起的薄膜折射率下降有利。     

基于压电材料的振动能量获取技术的研究

根据压电原理、力学理论及其电学等效模型,设计了能量收集电路,它由四倍压整流电路,3F超级电容器和微型电源管理芯片MAX1811组成。实验表明,电源管理芯片输出电压为4.17V时,PZT压电材料振动产生的电能,可通过该电路将电能储存于锂电池中。     

涡轮叶栅前缘槽缝气膜冷却的数值模拟

应用FINE/TURBO软件包,求解三维雷诺平均N-S方程,对叶片前缘有两列冷却槽缝的气膜冷却流场进行了数值模拟,获得了不同吹风比下叶片表面静压分布与极限流线.在计算结果与实验数据良好符合的基础上,详细分析了槽缝冷却三维定常流场结构与槽缝附近的流动细节.研究结果表明,槽缝冷却对前缘压力分布影响较大,且在压力面引起较大的分离流动,不利于冷却.     

热丝和射频等离子体化学气相沉积法制备定向碳纳米管薄膜

采用热丝和射频等离子体复合化学气相沉积设备(PE-HF-CVD),以CH4、H2和N2为反应气体.在较低衬底温度下(500℃),用简单的催化剂制备方法--旋涂法在硅片上涂覆Ni(NO3)2溶液,经热处理及H2还原后的Ni颗粒为催化剂,在硅衬底上制备出了垂直于硅片且定向生长的碳纳米管薄膜.扫描电子显微镜(SEM)和透射电子显微镜(TEM)结果显示,1 mol/l的硝酸镍溶液旋涂硅片所得催化剂制得的碳纳米管管径为30～50 nm,长度超过4μm,定向性好.并用拉曼光谱(Raman)对不同摩尔浓度Ni(NO3)2溶液条件下制备的碳纳米管薄膜样品进行了表征.     

格兰-汤普森棱镜胶合层的膜效应分析

将格兰-汤普森棱镜两半块之间的光学胶合层作为一层薄膜,利用薄膜光学理论,分析了胶合层对棱镜透射比的影响。通过研究胶合层的厚度以及光学胶折射率对入射光在胶合界面上反射率的影响,得出了s偏振光经过格兰-汤普森棱镜后的透射比。结果表明：胶合层的厚度以及光学胶折射率对棱镜的透射比均有影响,且厚度对棱镜透射比的影响呈现周期性变化;而光学胶折射率则对透射比的振荡幅度产生影响。以长度孔径比为3的格兰-汤普森棱镜为例,光学胶折射率为1．510时,棱镜的透射比在92．5％～90．8％之间振荡;光学胶的折射率在接近e光主折射率1．475～1．495之间取值时,棱镜透射比的振荡幅度较小。这一结果有利于对格兰-汤普森棱镜性能的优化。     

一种声表面波器件的新型晶圆级封装技术

总结了声表面波(SAW)器件传统封装技术中存在的问题,提出了一种SAW器件新型晶圆级封装技术。采用一种有机物干膜,分别经两次压膜、曝光和显影完成了对SAW芯片在划片前的封装,并用实验进行了验证。实验结果表明,本技术具有在不改变叉指换能器(IDT)质量负载的情况下同时具备吸声的功能,改善器件的带外抑制能力,增强了产品的一致性和可靠性。本技术在SAW器件的封装方面有广阔的应用前景。