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81.
Microwave synthesis,characterization and catalytic properties of titanium-incorporated ZSM-5 zeolite
Taihuan Jin Young Kyu Hwang Do-Young Hong Sung Hwa Jhung Jin-Soo Hwang San-Eon Park Young Ho Kim Jong-San Chang 《Research on Chemical Intermediates》2007,33(6):501-512
Titanium-incorporated ZSM-5 zeolites (Si/Al = 50–200 and Si/Ti = 70) were successfully synthesized in a one-step sol-gel process
under microwave irradiation. The characteristics of Ti-ZSM-5 zeolites were investigated using X-ray power diffraction, UV/Vis-DRS,
FT-IR spectroscopy and solid-state 27Al-NMR to monitor the physico-chemical properties. Simultaneously, the acidic properties were characterized by the NH3-TPD profile. The characterization results revealed that the Ti4+ and Al3+ ions were well incorporated into the framework of Ti-ZSM-5 zeolite. The prepared zeolite was moderately active but selective
in the dehydration of methanol to dimethyl ether. 相似文献
82.
H. Surya Prakash Rao S. Senthilkumar K. Gopu Shaik Rafi 《Chemistry of Heterocyclic Compounds》2007,43(3):292-297
The microwave-mediated reaction of 4-aryl-4-oxobutanoic acids with benzylamines furnished 1-arylmethyl-3-[(E)-1-arylmethylidene]-5-phenyl-2,3-dihydro-1H-pyrrolones.
This result is in contract to the earlier report on this reaction conducted under neat conditions. Structures for the products
were assigned on the basis of spectral data and confirmed by independent synthesis.
__________
Translated from Khimiya Geterotsiklicheskikh Soedinenii, No. 3, pp. 368–373, March, 2007. 相似文献
83.
The surface wave produced plasma belongs to a class of RF and microwave induced plasmas. It results from the propagation of an electromagnetic wave which uses the plasma column it sustains and the plasma tube as its sole propagating media. This type of plasma offers several advantages compared to the positive column plasma of dc discharges or to other RF and microwave produced plasmas. Surface wave plasmas require no internal electrodes, and they can be applied over an extremely broad range of wave frequencies (27 MHz to 10 GHz demonstrated) and gas pressures (about 10–4 Torr to a few times the atmospheric pressures). Using the surface wave plasma technique, a large variety of plasma column diameters have been created (0.5–150 mm demonstrated) and no limitation on plasma column length (column up to 6 m long demonstrated) has been found. The surface wave produced plasma is used in elemental analysis and to sustain emission in lasing media. This article is intended as a guide for potential users of surface wave plasmas in the field of plasma processing and plasma chemistry. 相似文献
84.
J. Al Andari A. M. Diamy J. C. Legrand R. I. Ben-Aim 《Plasma Chemistry and Plasma Processing》1993,13(1):103-116
Electron temperature and ion density are measured in an air microwave-induced plasma (2450 MHz) by means of a floating double probe. A 'cinetic scheme for ion formation and decay is set up, and a relationship between atomic oxygen and ion densities is obtained. From this relationship an order-of-magnitude of atomic oxygen concentration in the discharge is derived and compared with results obtained by optical actinometry in another work. 相似文献
85.
TU Shu-Jianga② WANG Qiana ZOU Xianga b SHI Fenga MIAO Chun-Baoa FANG Fanga XU Jia-Ninga a 《结构化学》2005,24(3):255-258
1 INTRODUCTION 1,4-Dihydropyridines (1,4-DHPs) are well-knowncompounds because of their pharmacological pro-perty as calcium channel modulators[1, . The che- 2]mical modifications, such as the introduction of dif-ferent substituents[3, or heteroatoms[5], of the DHP 4]ring have allowed the expansion of researches onthe structure-activity relationship to gain new in-sights into the molecular interactions at the receptorlevel. In fact, it is well established th… 相似文献
86.
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88.
U. K. Chakrabarti S. J. Pearton W. S. Hobson C. R. Abernathy 《Plasma Chemistry and Plasma Processing》1993,13(2):333-350
Vinyl iodide (C2H3I) microwave discharges with additions of H2 and Ar are found to provide faster etch rates than conventional CH4/H2/Ar discharges for InP, InGaAs, GaAs, and AlGaAs. This is a result of the relatively high volatilities of indium, gallium, and aluminum iodide species. The etched features are smooth and anisotropic over a wide range of do self-biases (–150 to –350 V), process pressures (1–20mTorr), and microwave powers (150–500 W). The polymer that forms on the mask during the plasma exposure can be readily removed in O2 discharges. Electron spectroscopy for chemical analysis (ESCA) showed that the etched surfaces are slightly deficient in the group V elements under most conditions, but changes to the optical properties of the semiconductors are minimal. No defects are visible by transmission electron microscopy (TEM) in GaAs or InP samples etched at dc biases –250 V. 相似文献
89.
FENG You-Jian JIA Run-Hong TU Shu-Jiang② ZHANG Xiao-Jin JIANG Bo ZHANG Yan ZHANG Jun-Yong 《结构化学》2005,24(12):1457-1461
1 INTRODUCTION aryl or methyl group to the nitrogen atom of these compounds leads to enhanced activities of fluo- A lot of natural and synthetic compounds con- rescence[7, . Since the pyridine scaffold is included 8] taining acridine skeletons display interesting biolo- in decahydroacridine-1,8-dione, a question is whether gical and physical activities[1]. Acridinedione, for the same modification on the nitrogen atom of de- example, has been identified as antimalarial and cahydroacridine-1… 相似文献
90.