基于物联网的矿井温、湿度检测系统设计

为了实现对矿井温、湿度检测,提出了一种基于物联网的矿井温、湿度检测系统,并完成了系统的软硬件测试。硬件包括由分布在矿井中的测量节点组成的无线传感网络,由基站节点和监控终端设备相连接形成的监控装置,软件采用MSP430进行编程,并实现了温湿度信号检测。实际应用表明,该系统具有体积小,部署方便,成本低廉等优点。     

塑封半导体器件的可靠性保证措施

为了降低塑封半导体器应用于高可靠性产品领域中的质量风险,采用质量细化分析方法,针对塑封半导体器件本身在材料、结构等方面的特点,做了塑封半导体器件失效模式与机理的原理探讨。得出器件应用于产品前,应该进行温度适应性评估、二次筛选以及破坏性物理分析等先期工作。     

Temperature dependence of the linewidth of the first-order Raman spectra for MnF2 crystal

The first-order Raman spectra ofE _gandA _1g modes in MnF₂ crystal were measured at temperatures from 4.2 to 563 K, and the values of the linewidths obtained. The temperature dependence of the linewidths was analyzed by the phonon dispersion curves based on the rigid ion model, and the result showed that it was caused approximately by the cubic anharmonic term in crystal potential energy.     

温度、湿度试验箱校准指标定义的研究

有关温度、湿度试验箱的偏差、均匀度、波动度等技术指标在JJF1101-2003环境试验设备校准规范及JJF1270-2010温度湿度振动综合环境试验系统校准规范都做出了相应的规定,针对这两个校准规范对偏差、均匀度、波动度的定义,使用过程中发现容易混淆,我们对这些定义做了深入的研究。     

图像语义提取方法研究

为解决从图像的低层视觉特征到高层语义特征的＂语义鸿沟＂问题,对当前的语义提取方法进行研究,简单介绍了图像语义层次模型,并根据语义信息的来源不同,归纳总结了图像语义中基于处理范围的方法,基于机器学习的方法,基于人机交互的方法和基于外部信息源的提取方法,这些工作为图像语义提取和图像语义检索等研究提供有益参考。     

BaCO3基低温共烧陶瓷基板工艺及性能分析

对用于封装的BaCO3基低温共烧陶瓷基板LTCC材料进行了研究,包括组分配制以及陶瓷制备工艺研究。对烧结后陶瓷的部分热性能以及力学性能进行了测试。结果表明:BaCO3基低温共烧陶瓷较为致密的密度在3.8～4.2g/cm3,在900℃烧结的陶瓷机械形变较小。     

一种简易温控智能风扇控制系统的设计

为了实现温度对电风扇的智能控制,设计并制作了一种以AT89C51为控制核心的简易智能风扇控制系统,包括硬件和软件两部分,重点介绍DS18B20对温度检测的方法及利用温度如何实现风扇的智能控制.该系统通过仿真和实物测试,可实现温度的显示及根据温度智能控制风扇的开启和关闭,且具有电路结构简单、操作客易、硬件少、成本低等特点.     

一种厚膜混合集成结构的温度控制电路

为了实现小体积、高可靠性的温度控制,设计了一种厚膜混合集成的温度控制电路,它通过控制热电致冷器（TEC）电流的方向和大小,将激光器管芯的温度控制在一个恒定的值上,实现了稳定激光器波长、控制波长精度、提高光纤陀螺的精确度和稳定度的目的。电路采用厚膜工艺制造,全裸芯片和表面贴装元件组装,缩小了体积,提高了可靠性。经实际应用,该电路不仅安全可靠地实现了温度控制功能,而且能在恶劣的使用环境下安全工作,适合军、民两用;     

脉冲TEA CO_2激光器温度特性的理论分析

利用六温度模型速率方程计算了当激光工作气体温度从-30℃~ 60℃变化时TEACO2激光器输出脉冲能量的变化规律。结果表明,激光器输出脉冲能量随着工作温度的升高而近似线性下降;线性下降的快慢和激光工作气体组成、气压、输出耦合镜反射率、注入能量、工作气体组成等均有关系;工作气体气压越高、输出耦合镜反射率越大或注入能量越高,激光输出脉冲能量随温度升高而下降的速度越快。     

The effects of substrate bias,substrate temperature,and pulse frequency on the microstructures of chromium nitride coatings deposited by pulsed direct current reactive magnetron sputtering

Recently, great attention has been devoted to the pulsed direct current (DC) reactive magnetron sputtering technique, due to its ability to reduce arcing and target poisoning, and its capability of producing insulating thin films. In this study, chromium nitride (CrN) coatings were deposited by the bipolar symmetric pulsed DC magnetron reactive sputtering process at different pulse frequency, substrate bias voltage, and the substrate temperature. It was observed that the texture of CrN changed from (111) to (200) as substrate temperature increased to 300°C as deposited at 2 kHz without substrate bias. With increasing pulsing bias and pulse frequency of target, predominated (200) orientation of CrN film was shown due to the ion bombardment/channeling effect to preferentially sputter those unaligned planes. For the CrN coatings deposited with pulsed biasing, the grain size decreased with increasing pulse frequency and substrate bias, whereas the surface roughness showed a reverse trend. The deposition rate of the CrN films decreased with increasing pulse frequency. It was concluded that the pulse frequency, substrate bias, and substrate temperature played important role in the texture, microstructure, and surface roughness of the CrN coatings deposited by the pulsed DC magnetron sputtering process.