Embedding optimisation algorithms with Mosel

Algebraic modelling languages allow models to be implemented in such a way that they can easily be understood and modified. They are therefore a working environment commonly used by practitioners in Operations Research. Having once developed models, they need to be integrated inside the company information system. This step often involves embedding a model into a programming language environment: many existing algebraic modelling languages make possible to run parameterised models and subsequently retrieve their results, but without any facility for interacting with the model during the model generation or solution process.In this paper we show how to use the Mosel environment to implement complex algorithms directly in the modelling language.The Office cleaning problem is solved by a branch-and-cut algorithm, implemented entirely in the modelling language (including the definition of the callback function for the solver). Secondly, a cutting stock problem is solved by column generation, also implemented in the modelling language.AMS classification: 90Cxx, 65K05, 68N15     

激光切割排样系统在硅钢板材加工中的应用

激光切割技术是当前世界上最先进的切割工艺之一，加之排样软件的应用，使板材的利用率得到了很大提高。为了填补扇片零件研究的不足，借鉴传统多边形顶点射线算法的基本原理，提出扇片零件顶点射线算法，解决了任意包角以及任意半径的扇片零件在硅钢板材上的优化排样问题。同时，以该算法为基础，利用VC++6.0开发了一套激光切割排样系统，进行了大量实际排样优化计算。实验结果表明，该算法既满足了实际生产中激光切割的工艺要求，又能够有效地提高硅钢板材的利用率。     

共边排样件激光切割路径的规划

排样软件的应用使材料利用率得到了很大提高，然而后续切割软件若不能保证有效地切割零件、保证零件质量及提高生产率，则排样软件在材料利用率上获得的收益将丧失。基于图论学理论，建立了规则与非规则零件共边排样时激光切割路径规划的数学模型，给出了在充分考虑加工质量、加工效率、制造成本情况下的激光切割路径优化目标：打孔点最少以及切割中割嘴空行程最短。提出了满足激光切割工艺要求的三个切割路径优化算法：用于求解理想情况下共边切割路径优化问题的一个新的欧拉回路算法；基于奇度顶点完全图最小权最大匹配算法来求解一般情况下共边切割路径优化问题的算法；利用废料区域进一步减少打孔点的处理策略与求解算法。给出了各种算法的运行实例，验证了所提出的算法的有效性。     

光纤传输脉冲固体激光切割机系统

介绍了光纤传输脉冲固体激光切割机系统的设计原理及工作特点,主要是优化设计光纤传输系统,使光纤输出后的激光束聚焦光斑直径尽量小;满足激光切割所需功率密度要求。系统使用双灯单棒的聚光腔,光纤输出后的功率达到400W,最小光斑直径小于0.25mm,可满足1~4mm内的碳钢、不锈钢等金属材料的切割要求。该系统可配合数控工作台、...     

三合板半圆筒激光切割机动态特性分析

针对三合板半圆筒激光切割机,对其θ轴系的机电传动装置进行了详细的分析,将其机械传动系统中各轴及相应齿轮的转动惯量、阻尼系数、扭转刚度折算到电机主轴上,在机电耦合基础上,建立了θ轴系动态特性的数学模型。采用MATLAB软件的SIMULINK仿真模块进．行θ轴系动态特性的仿真,分析了θ轴系传动比、电感系数、扭转刚度等参数对...     

基于MODBUS协议的激光雕刻切割系统HMI人机交互设备

近年来,国内激光雕刻切割控制器技术发展迅速,基于PC的传统控制器已相当成熟.为了显著提高工业生产效率,适应工业生产规模扩张的需要以及工业对系统稳定性要求的提高,目前国内几家专业运动控制器厂家已经实现了激光雕刻切割控制器的完全脱机运行.本文针对脱机控制器的需要设计一款人机交互设备,该设备采用AT89C55WD单片机为主控制器,采用标准的MODBUS协议实现HMI与脱机控制器的可靠通讯.     

从专利文献分析金刚石涂层工具技术进展

本文采集1975年到2008年金刚石涂层工具技术1100多件世界专利文献,建立专利数据库,从技术和竞争两个方面对其发展脉络和竞争格局进行定量、定性和引证分析.分析表明:(1)在生长工艺、设备及膜/基结合力等技术方面都已比较成熟,金刚石涂层工具已处于产业化阶段,国内外已有批量产品销售;(2)美日等国不仅重视该技术的基础研究和应用基础研究,而且更重视原创技术开发和知识产权的保护;而我国明显表现出严重的重论文轻专利现象;(3)美日等国绝大多数专利为公司开发,原创性专利多,申请量大,实施率较高;而我国大学申请多,企业申请少,专利的实施率较低.我国研发机构应规划适当专利战略,加强研发机构整合,提高专利的授权量,多申请外国专利.     

Tm3+/Yb3 :LiYF4单晶的高效近红外量子剪裁及其在光伏电池中的应用

采用改进的坩埚下降法成功地生长了Tm/Yb共掺氟化钇锂单晶. 该单晶体具有每吸收一个蓝色光子并能发射出2个1000 nm近红外光子的下转换发光效应. 测定了样品的激发光谱、发射光谱和荧光衰减曲线. 在465 nm蓝光激发下观察到由Yb³⁺：²F_5/2→²F_7/2能级跃迁所致的960～1050 nm 波段的发射带,此发光带源于Tm³ 对Yb³ 离子的能量下转换过程. 应用Inokuti-Hirayama模型,研究了晶体的能量转换过程,结果表明Tm³ 向Yb³ 的能量传递是一个电偶极子相互作用机制过程. 当Tm³ 与Yb³ 离子的掺杂浓度为0.49mol%与5.99mol%时,单晶的量子剪裁效率达到最大值167.5%.     

遗传算法优化设计在切削加工中的应用

优化设计是现代设计方法的重要组成部分,遗传算法是优化设计方法之一.根据薄壁铝合金件的加工变形量的经验公式,通过有限元分析软件Ansys 10.0对其变形量进行仿真,得出零件在不同加工参数下的变形量;再由优化设计中的遗传算法,用MATLAB7.0工具箱中的程序编程,得出在最小变形量时所需的加工参数和夹紧力,其对产品的生产加工有着现实的指导意义.     

Evaluation of bias voltage effect on diamond‐like carbon coating properties deposited on tungsten carbide cobalt

Diamond‐like carbon (DLC) coatings are getting new trends for cutting tool applications. In this research work, the DLC coatings were deposited on 15 × 15 × 5‐mm tungsten carbide cobalt substrates with variation of bias voltage from 0 to 500 V. The DLC films of 400 nm were deposited using filter cathode vacuum arc system, and 100‐nm chromium interlayer was deposited by sputtering. The optimized conditions for plasma pretreatment at different argon flow rates and deposition rates with bias variation were found. The effect of bias voltage on microstructure, tribology, adhesion, and mechanical properties were evaluated. The characterization techniques employed were field emission electron microscopy, Raman spectroscopy, wear test, SEM, scratch test, and nano‐indentation. The effect of substrate pretreatment on film adhesion was also evaluated. It was observed that etching rate increased with the increase in Ar flow rate while DLC deposition and sputtering rates decreased with increase in the bias voltage. The characterization suggests the DLC coatings deposited at 0 V bias as optimum condition because of showing the best results among all other conditions. Copyright © 2014 John Wiley & Sons, Ltd.