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971.
Kwang-Seop Kim Ji-Hoon KangDae-Geun Choi Kyung-Woong Kim 《Microelectronic Engineering》2011,88(6):855-860
A novel pull-off test that mimics the actual thermal NIL process was conducted to investigate the adhesion properties between a flat fused silica and thermoplastic polymer film used in thermal NIL process. The pull-off force was measured under various NIL conditions—such as use of various polymer materials, imprint pressures, and separation velocities—and the surfaces of the mold and polymer film were observed after the test. The anti-sticking layer (ASL) derived from (1H,1H,2H,2H-perfluorooctyl)trichlorosilane (F13-OTS) was coated on the fused silica and its effects on the adhesion characteristics was also examined. In cases of the mold without ASL, the pull-off force varied significantly according to the process conditions and damage on the polymer film was observed in most of the tests. In cases of the mold coated with the ASL, on the other hands, the pull-off force was maintained at a lower level in the range of the imprint pressure from 2 to 10 MPa or separation velocity from 1 to 25 μm/s, and there was no damage to the polymer film due to adhesion. 相似文献
972.
W.C. Lee P. ChangT.D. Lin L.K. ChuH.C. Chiu J. Kwo M. Hong 《Microelectronic Engineering》2011,88(4):336-341
InGaAs and Ge MOSFETs with high κ’s are now the leading candidates for technology beyond the 15 nm node CMOS. The UHV-Al2O3/Ga2O3(Gd2O3) [GGO]/InGaAs has low electrical leakage current densities, C-V characteristics with low interfacial densities of states (Dit’s) and small frequency dispersion in both n- and p-MOSCAPs, thermal stability at temperatures higher than >850 °C, a CET of 2.1 nm (a CET of 0.6 nm in GGO), and a well tuning of threshold voltage Vth with metal work function. Device performances in drain currents of >1 mA/μm, transconductances of >710 μS/μm, and peak mobility of 1600 cm2/V s at 1 μm gate-length were demonstrated in the self-aligned, inversion-channel high In-content InGaAs n-MOSFETs using UHV-Al2O3/GGO gate dielectrics and ALD-Al2O3. Direct deposition of GGO on Ge without an interfacial passivation layer has given excellent electrical performances and thermodynamic stability. Self-aligned Ge p-MOSFETs have shown a high drain current of 800 μA/μm and peak transconductance of 420 μS/μm at 1 μm gate-length. 相似文献
973.
Zinc oxide (ZnO) thin films were deposited onto a polycrystalline (poly) 3C-SiC buffer layer for surface acoustic wave (SAW) applications using a magnetron sputtering system. Atomic force microscopy (AFM) and X-ray diffraction (XRD) showed that the ZnO grown on 3C-SiC/Si had a smooth surface, a dominant c-axis orientation and a lower residual stress in ZnO thin film compared to that grown directly onto Si substrate. In order to evaluate the SAW characteristics of ZnO films on a 3C-SiC buffer layer, the two-port SAW resonators, based on inter-digital transducer (IDT)/ZnO/3C-SiC/Si and IDT/ZnO/Si structures, were fabricated and measured within a temperature range of 25-135 °C. The resulting 3C-SiC buffer layer improved the insertion loss by approximately 7.3 dB within the SAW resonator and enhanced the temperature stability with TCF = −22 ppm/°C up to 135 °C in comparison to that of TCF = −45 ppm/°C within a temperature range of 25-115 °C of the ZnO/Si structure. 相似文献
974.
M.-H. Juang Y.-S. PengD.-C. Shye J.-L. WangC.-C. Hwang S.-L. Jang 《Microelectronic Engineering》2011,88(1):32-35
Submicron-meter poly-Si tunneling-effect thin-film transistor (TFT) devices with a thinned channel layer have been investigated. With reducing the gate length to be shorter than 1 μm, the poly-Si TFT device with conventional MOSFET structure is considerably degraded. The tunneling field-effect transistor (TFET) structure can be employed to alleviate the short channel effect, thus largely suppressing the off-state leakage. However, for a poly-Si channel layer of 100 nm thickness, the TFET structure causes a small on-state current, which may not provide well sufficient driving current. By reducing the channel layer thickness to be 20 nm, the on-state current for the TFET structure can be largely increased, due to the enhanced bending of energy band for a thinned channel layer. As a result, for the TFET poly-Si TFTs at a gate bias of 5 V and a drain bias of 3 V, a 20-nm channel layer leads to an on-state current of about 1 order larger than that by a 100-nm channel layer, while still keeping an off-state leakage smaller than 0.1 pA/μm. Accordingly, the submicron-meter TFET poly-Si TFT devices with a thinned channel layer would show good feasibility for implementing high packing density of poly-Si TFT devices. 相似文献
975.
976.
977.
978.
Direct numerical simulations (DNSs) of a turbulent boundary layer (TBL) with Reθ = 570-2560 were performed to investigate the spatial development of its turbulence characteristics. The inflow simulation was conducted in the range Reθ = 570-1600 by using Lund’s method. To resolve the numerical periodicity induced by the recycling method, we adopted a sufficiently long streamwise domain of x/θin,i = 1000 (=125δ0,i), where θin,i is the inlet momentum thickness and δ0,i is the inlet boundary layer thickness in the inflow simulation. Furthermore, the main simulation with a length greater than 50δ0 was carried out independently by using the inflow data, where δ0 is the inlet boundary layer thickness of the main simulation. The integral quantities and the first-, second- and higher-order turbulence statistics were compared with those of previous data, and good agreement was found. The present study provides a useful database for the turbulence statistics of TBLs. In addition, instantaneous field and two-point correlation of the streamwise velocity fluctuations displayed the existence of the very large-scale motions (VLSMs) with the characteristic widths of 0.1-0.2δ and that the flow structure for a length of approximately ∼6δ fully occupies the streamwise domain statistically. 相似文献
979.
Ebrahim Asadi Ahmad R. Farrahi Shahriar J. Fariborz 《Theoretical and Applied Fracture Mechanics》2011,56(2):112-121
The solutions of axisymmetric Volterra type climb and glide edge dislocations are obtained in a layer by means of the Hankel transforms. Utilizing the same procedure, Green’s function solution is obtained for a layer under self-equilibration normal ring traction. The distributed dislocation technique is used to construct integral equations for a system of co-axial annular cracks where the layer is under axisymmetric normal loads. These equations are solved numerically to obtain dislocation density on the cracks surfaces. The results are employed to determine stress intensity factors for annular and penny-shaped cracks and the interaction between two co-axial penny-shaped cracks is studied. Moreover, the stress intensity factors of the interacting cracks are determined such that they can be further used in conjunction with strain energy density (SED) failure criterion to obtain the possible direction of crack initiation that may not be apparent under mixed mode conditions. 相似文献
980.
A conjugate gradient method (CGM) based on the inverse algorithm is used to estimate the unknown fouling-layer profile on the inner wall of a pipe system using simulated temperature measurements taken within the pipe wall. It is assumed that no prior information is available about the functional form of the unknown profile. Therefore, the procedure is classified as the function estimation in inverse calculation. The temperature data obtained from the direct problem are used to simulate the temperature measurements. The accuracy of the inverse analysis is examined using the simulated exact and inexact temperature measurements. The results show that the excellent estimation of the fouling-layer profile can be obtained for the test case considered in this study. The technique presented in this study can be used in a warning system to call for pipe maintenance when the thickness of fouling exceeds a predefined criterion. 相似文献