基于整体退火遗传算法的低功耗极性转换

针对n变量逻辑函数在不同极性下所对应REED-MULLER(RM)电路功耗和面积不问的特点,对信号几率传递算法、多输入XOR/AND(异或/与)门的低功耗分解算法和多成份极性转换算法进行了深入研究,成功地将整体退火遗传算法(whole annealing genetic algorithm,WAGA)应用于RM电路最佳极件的搜索.通过对8个MCNC Benchmark测试表明,算法搜索到的最佳极性,其所对应RM电路的SYNOPSYS综合结果,与极性0时相比,功耗、面积和最大延时的平均节省分别达到了77.2%,62.4%和9.2%.     

Effect of annealing temperature on Ti/Al/Ni/Au ohmic contacts on undoped AlN films

The Ti/Al/Ni/Au metals were deposited on undoped AlN films by electron beam evaporation. The influence of annealing temperature on the properties of contacts was investigated. When the annealing temperatures were between 800 and 950℃, the AlN-Ti/Al/Ni/Au contacts became ohmic contacts and the resistance decreased with the increase of annealing temperature. A lowest specific contacts resistance of 0.379 Ω·cm² was obtained for the sample annealed at 950℃. In this work, we confirmed that the formation mechanism of ohmic contacts on AlN was due to the formation of Al-Au, Au-Ti and Al-Ni alloys, and reduction of the specific contacts resistance could originate from the formation of Au₂Ti and AlAu₂ alloys. This result provided a possibility for the preparation of AlN-based high-frequency, high-power devices and deep ultraviolet devices.     

低压高温退火对Ag掺杂ZnO薄膜性质的影响

采用电子束蒸发在n-Si(100)衬底上沉积Ag掺ZnO(ZnO:Ag)薄膜,随后在200 Pa的O<,2>气氛下分别在500、600、700和800℃退火4 h.用X射线衍射(XRD)仪、荧光光谱仪以及Van der Pauw方法测量ZnO:Ag薄膜的结构和光电学性质.结果表明,ZnO:Ag薄膜为多晶结构,且随着退火...     

用磁控溅射和退火方法制备AlSb多晶薄膜

采用磁控溅射法在玻璃衬底上制备Al/Sb预制多层薄膜,然后将Al/Sb预制多层薄膜在退火炉中退火得到AlSb多晶薄膜.用X射线衍射(XRD)法测薄膜结构;用扫描电镜(SEM)测薄膜Al/Sb成分比,结果表明AlSb多晶薄膜具有单一的晶相、均匀的结构,以及粒径大约20nm的晶粒.根据电导率(lnσ)与温度(T)的关系得到电导激活能为0.21和0.321eV,为制备出适用于太阳电池的AlSb多晶薄膜奠定了一定的技术基础.     

热退火γ-Al2O3/Si异质结构薄膜质量改进

采用高真空MOCVD外延技术,利用TMA(Al(CH3)3)和O2作为反应源,在Si(100)衬底上外延生长γ-Al2O3绝缘膜形成γ-Al2O3/Si异质结构材料.同时,引入外延后退火工艺以便改善γ-Al2O3薄膜的晶体质量及电学性能.测试结果表明,通过在O2常压下的退火工艺可以有效地消除γ-Al2O3外延层的残余热应力及孪晶缺陷,改善外延层的晶体质量,同时可以提高MOS电容的抗击穿能力,降低漏电电流.     

Synthesis and radical polymerization of methacrylate endowed with bicyclobis(γ‐butyrolactone) moiety through methylene linker

A series of methacrylates bearing bicyclobis(γ‐butyrolactone) (BBL) moiety were synthesized and radically polymerized to afford the corresponding poly(methacrylate)s bearing BBL moiety in the side chain, with expecting that the high polarity and rigidity of BBL would be inherited by the polymers. The resulting polymers were soluble in polar aprotic solvents such as dimethyl sulfoxide and N,N‐dimethylformamide because of the high polarity of the BBL moiety. The glass transition temperatures (T_g) of the polymers depended on the length of methylene linker that tethered the methacrylate and BBL moieties, making the use of shorter linkers lead to higher T_gs. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015 , 53, 2462–2468     

Flexible sheet with radiophotoluminescence glass beads for remotely monitoring high beta-surface-contamination

A flexible sheet was made with radiophotoluminescence (RPL) glass beads on an experimental basis for visualization of high beta-surface-contamination. A simple RPL observation system for remote contamination monitoring was constructed with a homemade UV floodlight and a commercially available digital camera with supplementary optical lenses and filters. In preliminary experiments, RPL images were well observed with the digital camera of the present system. Their precise RPL intensity was determined after the correction of nonlinear response of the camera. It was expected from experiments that RPL images of beta-surface-contamination could be quantitatively evaluated through calibration, i.e., the conversion of camera images to dose data on the sheet-type glass dosimeter.     

N型TOPCon晶硅太阳能电池光注入退火增效的研究

N型隧穿氧化层钝化接触(Tunnel Oxide Passivating Contacts,TOPCon)太阳能电池完成印刷烧结后,再经过光注入,效率有明显提升,主要表现在Voc(开路电压)及FF(填充因子)的提升.其机理在于通过温度和光照强度调节费米能级变化,控制H总量及价态来提高钝化性能.钝化膜层的质量、硅基体掺杂...     

晶体生长过程建模及解耦控制

晶体生长过程中其直径的控制是通过调节生长速度和热场温度而实现的.控制系统是一个双入双出系统,输入输出之间存在耦合关系.本文采用前馈补偿解耦的方法,实现了单晶炉生长控制中的解耦控制,并通过仿真及实验证明了方法的有效性.     

退火对PECVD制备的掺磷硅薄膜及其电阻温度系数影响的研究

本文对采用PECVD技术制备的不同掺杂比掺磷硅薄膜在不同退火时间和温度下的结构和电阻温度系数进行了研究。拉曼散射光谱结果表明:未退火样品主要为非晶/微晶混合相;当退火温度从500℃上升到700℃,薄膜结构呈现出先向非晶相转变,后完全晶化的趋势,与此同时,电阻率和电阻温度系数随掺杂浓度及退火温度的增加而单调减小。文中我们采用Lu的模型对上述实验结果进行了解释,认为由Si-P键构成的晶界势垒高度的变化是上述实验结果的根本原因。