航空机载软件全数字仿真测试系统的设计与实现

针对航空机载软件测试环境与开发环境冲突、测试环境可控性和通用性差、非干预性测试困难的问题,分析了全物理实装测试环境、半实物仿真测试环境的优缺点,研究了全数字仿真测试技术,设计并实现了一种航空机载软件全数字仿真测试系统。该系统由仿真核心平台、仿真工具组件、协同仿真组件和人机交互组件构成,提供了航空机载处理器、内存、外设等多种可重用库。提出了基于底层虚拟机的动态二进制翻译技术、协同仿真时间同步和数据通信机制等关键技术,实现了航空机载软件全数字高速闭环仿真运行。工程实践证明,该系统能达到降低硬件设备的依耐性、简化测试环境搭建的复杂度、提高测试效率约42%的目的。     

Chapter 11 Simulation studies of efficiency,returns to scale and misspecification with nonlinear functions in DEA

Using statistically designed experiments, 12,500 observations are generated from a 4-pieced Cobb-Douglas function exhibiting increasing and decreasing returns to scale in its different pieces. Performances of DEA and frontier regressions represented by COLS (Corrected Ordinary Least Squares) are compared at sample sizes ofn=50, 100, 150 and 200. Statistical consistency is exhibited, with performances improving as sample sizes increase. Both DEA and COLS generally give good results at all sample sizes. In evaluating efficiency, DEA generally shows superior performance, with BCC models being best (except at corner points), followed by the CCR model and then by COLS, with log-linear regressions performing better than their translog counterparts at almost all sample sizes. Because of the need to consider locally varying behavior, only the CCR and translog models are used for returns to scale, with CCR being the better performer. An additional set of 7,500 observations were generated under conditions that made it possible to compare efficiency evaluations in the presence of collinearity and with model misspecification in the form of added and omitted variables. Results were similar to the larger experiment: the BCC model is the best performer. However, COLS exhibited surprisingly good performances — which suggests that COLS may have previously unidentified robustness properties — while the CCR model is the poorest performer when one of the variables used to generate the observations is omitted.     

Chapter 15 DEA/AR analysis of the 1988–1989 performance of the Nanjing textiles corporation

This article employs new data envelopment analysis/assurance region (DEA/AR) methods to evaluate the efficiency of the 35 textile factories of the Nanjing Textiles Corporation (NTC), Nanjing, China. The returns to scale (RTS) of these factories were studied without assuming that the optimal DEA solutions were unique. All DMUs are identified with pointsE (Extreme Efficient),E (Efficient but not an extreme point) andF (Frontier but not efficient). We then further identify the nonfrontier DMUs with pointsNE, NE andNF according to whether they are projected onto a point inE, E, orF en route to evaluating their performances. All of the inefficient factories were in classNF and had unique optimal primal-dual solution pairs. Consequently, the solution pairs satisfy the strong complementary slackness condition (SCSC). Application of cone-ratio (CR) ARs reduced significantly the number of factories in classE, and showed that some AR-efficient factories were more flexible in adopting the mixture of central planning and market economies that China currently is trying to use. Also, linked-cone (LC) ARs were applied to measure maximum and minimum profit ratios. The SCSC multiplier space approach was utilized to analyze the sensitivity of the efficiency results to potential errors in the data with and without ARs. The results in this article suggest that collective units had a better performance than state-owned units in the two consecutive years analyzed.This paper was written while the author was at the School of Economics and Management, Southeast University, Nanjing 210018, P.R. China.     

The effectiveness of solvents as hydrogen bond donors

Taft and Kamlet's -scale of solvent hydrogen bond donation ability is reexamined with regard to its correlations with three widely used polarity scales: Dimroth and Reichardt's E _T (30), Kosower's Z and Mayer's A _N , as well as with the _m values of the solvents when present as monomeric solutes. The correlation with E _T serves to extend the solvent -scale according to the expression:

高氯酸二水邻菲咯啉合铜配合物的合成和晶体结构

Crystal structure of the title compound， Cu(phen)(H₂O)₂·ClO₄(phen=1，10-phenanthroline)， was deter-mined by X-ray crystallography. It crystallizes in the monoclinic system， space group C2/c with lattice parameters a=1.49071(4)nm， b=1.38594(4)nm， c=0.70292(1)nm， β=108.509(1)° and Z=4; The Cu(Ⅰ) ion is chelated by a phen ligand and two aqua ligands in cis arrangement and assumes a C2 symmetric square-planar geometry with the CuN₂O₂ core. Eight Cu(phen)(H₂O)₂·ClO₄ molecules are interconnected by strong hydrogen bonds between coordinated water molecules and uncoordinated perchlorate anions to form a molecular scale cavities along c axis. The bond distances of Cu-N and Cu-O are 0.2003(4)nm and 0.1973(3)nm， respectively. CCDC： 197600.     

Solution of periodic Poisson's equation and the Hartree–Fock approach for solids with extended electron states: Application to linear augmented plane wave method

We formulate a Hartree–Fock‐LAPW method for electronic band structure calculations. The method is based on the Hartree–Fock–Roothaan approach for solids with extended electron states and closed core shells where the basis functions of itinerant electrons are linear augmented plane waves. All interactions within the restricted Hartree–Fock approach are analyzed and in principle can be taken into account. In particular, we obtained the matrix elements for the exchange interactions of extended states and the crystal electric field effects. To calculate the matrix elements of exchange for extended states, we first introduce an auxiliary potential and then integrate it with an effective charge density corresponding to the electron exchange transition under consideration. The problem of finding the auxiliary potential is solved by using the strategy of the full potential LAPW approach, which is based on the general solution of periodic Poisson's equation. Here, we use an original technique for the general solution of periodic Poisson's equation and multipole expansions of electron densities. We apply the technique to obtain periodic potentials of the face‐centered cubic lattice and discuss its accuracy and convergence in comparison with other methods. © 2002 Wiley Periodicals, Inc. Int J Quantum Chem, 2002     

MEASUREMENTS OF CHAIN INTERPENETRATION OF POLYMER GLASSES

The concept of entanglement provides the basis of our current understanding of the flow behavior of polymer melts, Current techniques developed to investigate the degree of interpenetration of polymer chains only provide indirectly the information of the degree of entanglement in a relatively large scale （several to tens of nanometer）. In this article, we report ^1H-NMR spectroscopy with dipolar filters under fast magic angle spinning for probing chain interpenetration of polymer glasses at the molecular level.     

Development of B‐doped Si multiple delta‐layer reference materials for SIMS profiling

B‐doped Si multiple delta‐layers (MDL) were developed as certified reference materials (CRM) for secondary ion mass spectrometry (SIMS) depth profiling analysis. Two CRMs with different delta‐layer spacing were grown by ion beam sputter deposition (IBSD). The nominal spacing of the MDL for shallow junction analysis is 10 nm and that for high energy SIMS is 50 nm. The total thickness of the film was certified by high resolution transmission electron microscopy (HR‐TEM). The B‐doped Si MDLs can be used to evaluate SIMS depth resolution and to calibrate the depth scale. A consistency check of the calibration of stylus profilometers for measurement of sputter depth is another possible application. The crater depths measured by a stylus profilometer showed a good linear relationship with the thickness measured from SIMS profiling using the calibrated film thickness for depth scale calibration. The sputtering rate of the amorphous Si thin film grown by sputter deposition was found to be the same as that of the crystalline Si substrate, which means that the sputtering rate measured with these CRMs can be applied to a real analysis of crystalline Si. Copyright © 2005 John Wiley & Sons, Ltd.