Fabrication of patterned gold electrodes with spin-coated-and-fired Au(1 1 1) film by the soft lithography

We prepared high quality Au(1 1 1) film on Si wafer through the spin coating and thermal decomposition of a gold ink, spin-coated-and-fired (SCAF) Au film. The X-ray measurements, XRD and pole-figure analysis, showed that the SCAF Au film has a (1 1 1) out-of-plane orientation with a random in-plane orientation. In order to confirm the chemical activity of the SCAF Au film, we demonstrate the formation of patterned structures with the film by using soft lithography technique. The chemical activities of this physically stable SCAF Au film to the alkanethiols were at least equivalent those of physically deposited the Au films. The possibility of the mass production of micro patterned structure with the SCAF Au film was also demonstrated over the wide region on Si wafer by the microcontact lithography. These suggest that the Au film will help the easy fabrication of various nanosized devices on Si wafer and other substrates.     

Novel methods and universal software for HRXRD, XRR and GISAXS data interpretation

Several novel methods for evaluation and interpretation of X-ray data from modern nanostructures are presented along with their applications. The background of methods and their relations to fundamental problems of X-ray analysis is shortly described. The key features of LEPTOS software, which is designed for the analysis of X-ray data measured with various geometries and setups and implements all discussed techniques, are discussed.     

Contact angle hysteresis of liquid drops as means to measure adhesive energy of zein on solid substrates

Adhesion of zein to solid substrates has been studied using surface energy profiles as indices and by adhesion mapping using atomic force microscopy (AFM). Different plasticizers like glycerol and sorbitol have been used to form mixed films with zein and properties of these films are studied using surface energy profiles. Comparison of the results from the different mixed samples with those from the pure zein films showed that force mapping could identify areas rich in protein. The adhesion maps produced were deconvoluted from sample topography and contrasted with the data obtained from contact angle measurements. A comparison of the two methods shows that the extent of contact angle hysteresis is indicative of both hydrophobicity of the surface as well as the force of adhesion. Mechanical properties and microstructure of zein films prepared by casting from solutions and using Langmuir-Blodgett film technique have been investigated. Pure zein seemed brittle and exhibited an essentially linear relationship between stress and strain. Films with plasticizer were tougher than these films. In general, mixed films showed better mechanical properties than pure films and had higher ultimate tensile strength and increased per cent elongation. Further, the mixed films of zein showed a higher force of adhesion compared to the pure films.     

薄膜偏振分光镜的研究

概述薄膜偏振分光镜的研究现状及其主要特点，重点分析薄膜偏振分光镜的设计原理,并利用等效折射率的方法计算中心波长的反射率．     

Molecular Orbital Calculations on 2, 4, 6-Trinitrotoluene

Three ab initio calculations (HF/6-3IG, HF/6-3IG*, and HF/6-3IG**) on 2,4,6-trinitrotoluene were made, The results compare well with xray data, except dihedral angles of NO₂ relative to the plane of the benzene ring. The deviations are attributed to packing forces and steric effects in the crystal. The most stable structure was a torsional angle 10° of the methyl top with the benzene ring, unlike toluene. The rotational barriers of the methyl top and the 4-nitro group are small. Hydrogen bonding, dipole moments and total atomic charges arc calculated.     

斜孔气膜冷却数值模拟分析

本文通过数值模拟分析圆柱孔和扩散孔的单斜孔气膜冷却特性,考察复合角、孔型和吹风比对流场和气膜冷却效果的影响。结果表明,复合角的引入使气膜侧向分布更宽,但冷却效果沿主流方向衰减更快。适中吹风比得到的气膜能更有效的保护壁面。在相同吹风比和复合角条件下,扩散孔的气膜冷却效率比圆柱孔更好,且冷却更为均匀持久。     

激光标线的原理和实验

根据几何光学知识分析了激光标线原理.理论和实验表明:激光标线长度与激光光束形状、光学元件形状及材料折射率有关.并讨论了激光标线向两侧扩展的原因.     

X-ray metrology for advanced silicon processes

X-ray reflectivity (XRR), X-ray fluorescence (XRF) and small angle X-ray scattering (SAXS) techniques are used to the monitoring of Cu/porous low κ processes, which are developed for the next generation (≤65 nm) integrated circuits. Sensitivity of XRR and XRF is sufficient to detect drifts of the copper barrier layer, copper seed layer and Cu CMP (chemical-mechanical polishing) processes. Their metrology key parameters comply with production requirements. SAXS allows determining the pore structure of low κ films: average pore size and pore size distribution.     

光束偏转法自动测试激光等离子体冲击波系统的研制

根据光束偏转原理，研制了激光等离子体冲击波自动测试系统的硬件和软件。该系统使用计算机与可编程序控制器作为上下位机，采取上下位机通讯的方式控制步进电机及二维移动架的移动，以改变探测光的相对位置，并利用单模光纤和光电倍增管将探测到的光偏转信号传入数字示波器进行存储，最后计算机将示波器中采集到的光偏转信号进行分析处理。使用该系统对激光等离子冲击波的衰减过程进行了实际测试，得到了较为理想的实验结果。     

Surface free energy of CrNx films deposited using closed field unbalanced magnetron sputtering

CrN_x thin films have attracted much attention for semiconductor IC packaging molding dies and forming tools due to their excellent hardness, thermal stability and non-sticking properties (low surface free energy). However, few data has been published on the surface free energy (SFE) of CrN_x films at temperatures in the range 20-170 °C. In this study CrN_x thin films with CrN, Cr(N), Cr₂N (and mixture of these phases) were prepared using closed field unbalanced magnetron sputtering at a wide range of Cr⁺² emission intensity. The contact angles of water, di-iodomethane and ethylene glycol on the coated surfaces were measured at temperatures in the range 20-170 °C using a Dataphysics OCA-20 contact angle analyzer. The surface free energy of the CrN_x films and their components (e.g., dispersion, polar) were calculated using the Owens-Wendt geometric mean approach. The influences of CrN_x film surface roughness and microstructure on the surface free energy were investigated by atomic force microscopy (AFM) and X-ray diffraction (XRD), respectively. The experimental results showed that the lowest total SFE was obtained corresponding to CrN at temperature in 20 °C. This is lower than that of Cr(N), Cr₂N (and mixture of these phases). The total SFE, dispersive SFE and polar SFE of CrN_x films decreased with increasing surface temperature. The film roughness has an obvious effect on the SFE and there is tendency for the SFE to increase with increasing film surface roughness.