Hexagonal nanorods of tungsten trioxide: Synthesis, structure, electrochemical properties and activity as supporting material in electrocatalysis

Tungsten trioxide, unhydrated with hexagonal structure (h-WO₃), has been prepared by hydrothermal method at a temperature of 180 °C in acidified sodium tungstate solution. Thus prepared h-WO₃ has been characterized by X-ray diffraction (XRD) method and using electrochemical techniques. The morphology has been examined by scanning and transmission electron microscopies (SEM and TEM) and it is consistent with existence of nanorods of 50-70 nm diameter and up to 5 μm length. Cyclic voltammetric characterization of thin films of h-WO₃ nanorods has revealed reversible redox behaviour with charge-discharge cycling corresponding to the reversible lithium intercalation/deintercalation into the crystal lattice of the h-WO₃ nanorods. In propylene carbonate containing LiClO₄, two successive redox processes of hexagonal WO₃ nanorods are observed at the scan rate of 50 mV/s. Such behaviour shall be attributed to the presence of at least two W atoms of different surroundings in the lattice structure of h-WO₃ nanorods. On the other hand, in aqueous LiClO₄ solution, only one redox process is observed at the scan rate of 10 mV/s. The above observations can be explained in terms of differences in the diffusion of ions inside two types of channel cavities existing in the structure of the h-WO₃ nanorods. Moreover, the material can be applied as active support for the catalytic bi-metallic Pt-Ru nanoparticles during electrooxidation of ethanol in acid medium (0.5 mol dm⁻³ H₂SO₄).     

一种钨合金含损伤本构的唯象模型

利用多压阻传感器拉氏实验分析方法对受冲击90w钨合金材料中形成的应力波场进行了测试，并利用拉格朗日分析方法获得的结果建立了合金的不含损伤的本构关系．然后以动态层裂试验获得的层裂参数曲线和数据为依据．提出了一种考虑材料内部损伤成核，成长及汇合效应的唯象本构模型，并通过对层裂实验曲线进行数值模拟，确定了该合金的含损伤本构的参数．     

Microstructural evolution of tungsten oxide thin films

Tungsten oxide thin films are of great interest due to their promising applications in various optoelectronic thin film devices. We have investigated the microstructural evolution of tungsten oxide thin films grown by DC magnetron sputtering on silicon substrate. The structural characterization and surface morphology were carried out using X-ray diffraction and Scanning Electron Microscopy (SEM). The as deposited films were amorphous, where as, the films annealed above 400 °C were crystalline. In order to explain the microstructural changes due to annealing, we have proposed a “instability wheel” model for the evolution of the microstructure. This model explains the transformation of mater into various geometries within them selves, followed by external perturbation.     

Micromagnetic and microcrystalline structure of ultrathin Co layers on W single crystal surfaces

The magnetic domain structure and the microcrystalline structure of ultrathin Co layers on W(1 1 0), W(1 0 0) and W(1 1 1) surfaces are studied with low energy electron microscopy with and without spin-polarization with the goal to shed some light on the importance of the various parameters which determine the micromagnetic structure.     

Electrical characterization of Schottky diodes based on boron doped homoepitaxial diamond films by conducting probe atomic force microscopy

A large planar tungsten carbide (WC) Schottky diode on p-type homoepitaxial diamond was mainly investigated on a microscopic level by atomic force microscopy (AFM) and conducting probe atomic force microscopy (CP-AFM), allowing simultaneous topographic and local electrical resistance imaging measurements. These techniques revealed the existence of a specific microstructure on the WC Schottky contact consisting of electrically insulating islands surrounded by conductive paths. The islands are found to be insulating in the whole range of explored bias [−5 V, +5 V], whereas the current flowing between the islands is 1000 times lower at a reverse bias of −5 V than at a forward bias of +5 V, in agreement with the rectifying ratio found from macroscopic current–voltage (I–V) measurements. CP-AFM provides a prospective imaging tool which is well suited for analyzing the local electrical properties and instabilities of Schottky junctions.     

钨在硅和氮化钛上的激光化学汽相沉积实验研究

本文介绍了用激光化学汽相沉积的方法在Si和TiN基板上沉积钨的实验研究。沉积过程由反射率探测法实时监测,实验结果表明:钨的沉积速率依赖于WF_6和H_2的比例、压力、激光功率和基板的物理性质。实验得到了3μm宽的钨膜。     

Growth and oxidation of Cr films on the W(1 0 0) surface

The growth and oxidation of Cr films on the W(1 0 0) surface have been studied with low energy electron microscopy (LEEM) and diffraction (LEED). Cr grows in a Stranski-Krastanov (SK) mode above about 550 K and in a kinetically limited layer-by-layer mode at lower temperature. Stress relief in the highly strained pseudomorphic (ps) Cr film appears to be achieved by the formation of (4 × 4) periodic inclusions during the growth of the third layer between 575 and 630 K and by growth morphological instabilities of the third layer at higher temperature. Kinetic or stress-induced roughening is observed at lower temperature. In the SK regime, three-dimensional (3D) Cr islands nucleate after the growth of three Cr layers. 3D island nucleation triggers dewetting of one layer from the surrounding Cr film. Thus, two ps Cr layers are thermodynamically stable. However, one and two layer ps Cr films are unstable during oxidation. 3D clusters, that produce complex diffraction features and are believed to be Cr₂O₃, are formed during oxidation of one Cr layer at elevated temperature, T ? 790 K. The single layer Cr film remains intact during oxidation at T ? 630 K. 3D bulk Cr clusters are formed predominantly during oxidation of two ps Cr layers.     

钨合金的冲击动力学性质及细微观结构的影响

简单介绍了钨合金(主要为W-Ni-Fe)的制备工艺和常用热处理方法,其后着重从动 态力学性能、剪切带的实验观察和研究、细微观结构对材料力学性能的影响等几方 面总结和评述了近年来针对钨合金取得的主要结果.并在文章的最后初步提出了有 前景的几个研究方向.