激光熔覆镍基金属陶瓷涂层的组织性能研究

运用 5kWCO2 连续激光器在 16Mn钢表面激光熔覆镍基B4 C金属陶瓷层 (NB4 C)和镍基SiC金属陶瓷层(NSiC) ,研究了两种激光熔覆层的组织、结构、显微硬度及滑动磨损特性 ,并用激光熔覆镍基合金层 (Ni6 0 )进行了滑动磨损对比试验。结果表明 ,熔覆合金层显微组织由枝晶固溶体及其间细密的共晶组织组成 ,NB4 C熔覆层主要组成相为γ Ni,γ (Ni,Fe) ,(Cr,Fe) 7C3,CrB ,Ni3B ,Fe2 B ,Fe2 3(C ,B) 6 和B4 C等 ,NSiC熔覆层主要组成相为γ Ni,γ (Fe,Ni) ,(Cr,Fe) 7C3,Cr2 3C6 和 (Cr ,Si) 3Ni3Si等。三种激光熔覆层的显微硬度及耐滑动磨损性能由高到低的顺序为 :NB4 C→NSiC→Ni6 0。     

带有多层介质衬底FSS的损耗和带宽特性分析

本文简要介绍应用模匹配方法分析带有多层介质衬底的FSS频率响应技术,在此基础上研究带有多层介质衬底的平面Y形缝隙周期阵列对平面波的频率传输特性。重点讨论介质层厚度变化对FSS传输损耗及带宽的影响。     

Pt/6H-SiC肖特基势垒二极管特性分析

采用直流磁控溅射法、Pt作肖特基接触的工艺，制作了N型6H—SiC肖特基势垒二极管，对肖特基势垒二极管的电学特性及温度特性进行了研究。实验结果表明，该器件具有很好的整流特性，反向电流小、击穿电压高，且在高温下器件波动很小，能够稳定地工作，适合于在高温(600℃)等恶劣环境下长期可靠地工作。     

微带线碳化硅E类功率放大器设计

SiC MESFET由于其高击穿电压和低输出电容,适合用于设计E类功率放大器.设计了一种结构简单的微带线拓扑E类负载网络,可以匹配至标准电阻,且抑制高至5阶的谐波.用ADS软件进行电路仿真,在2.14 GHz频率点下,峰值功率附加效率(PAE)为70.5%,漏极效率可达80%,功率增益约为10 dB.     

B~+注入隔离在宽禁带半导体中的应用

利用B~+离子注入实现宽禁带半导体的有源层隔离。通过Monte Carlo软件TRIM模拟,优化离子注入能量和剂量。在SiC MESFET中测量两组不同条件的样品及在GaN HEMT测量了三组同种条件的样品都得到了纳安级电流,表现了很好的隔离效果;通过测试表明离子注入隔离的器件相比台面隔离器件的击穿电压有一定程度提高。     

真空反应烧结大尺寸碳化硅反射镜

利用高温真空烧结炉对凝胶注模(Gel-casting)成型的SiC素坯进行反应烧结(RB-SiC),可制备得到光学级别的碳化硅反射镜镜体.测试结果表明,镜体内部结构均匀致密,机械性能优异,烧结线收缩率＜0.23%,直接抛光后的表面粗糙度RMS值优于3 nm,适用于空间大尺寸碳化硅反射镜的制备.     

SiC MESFET反向截止漏电流的研究

给出了一种减小SiC MESFET栅漏反向截止漏电流的工艺方法,通过采用LPCVD淀积厚SiO2和高温氧化工艺,使器件的性能得到一定的提升.从实验数据看出,器件在S波段工作时,器件的反向截止漏电流大幅度下降,且分散性得到改善,其功率附加效率和功率增益也分别提高了10%和1.5 dB.该方法充分发挥了SiC材料能形成自身氧化层的优势,结合Si工艺的特点,减小了氧化层的缺陷,并在一定程度上减小了器件的寄生电容.     

Fabrication of quasi-one dimension silicon carbide nanorods prepared by RF sputtering

Anodic aluminum oxide (AAO) template was prepared by a two-step anodization method at low temperature (1 °C) and silicon carbide was deposited on the templates by non-reactive radio frequency sputtering method. Well-aligned quasi-one dimension silicon carbide nanorods with the average diameter about 80-90 nm and a mean length of 400 nm were obtained perpendicular to the substrate and observed by AFM and SEM after the aluminum substrates were striped off. Then some samples were annealing at flowing N₂ at 400, 500 and 600 °C and FTIR was performed on these samples to obtain the information of structure.     

4H-SiC钒离子注入层的特性

研究了钒注入4H-SiC形成半绝缘层的方法和特性，注入层的离子浓度分布由蒙特卡罗分析软件TRIM模拟提取. 采用一种台面结构进行I-V测试. 钒注入层的电阻率与4H-SiC层的初始导电类型关系很大，常温下钒注入p型和n型SiC的电阻率分别为1.2E9～1.6E10Ω·cm和2.0E6～7.6E6Ω·cm.     

Advances in pulsed-laser-deposited AIN thin films for high-temperature capping, device passivation, and piezoelectric-based RF MEMS/NEMS resonator applications

In this paper we report recent advances in pulsed-laser-deposited AIN thin films for high-temperature capping of SiC, passivation of SiC-based devices, and fabrication of a piezoelectric MEMS/NEMS resonator on Pt-metallized SiO₂/Si. The AlN films grown using the reactive laser ablation technique were found to be highly stoichiometric, dense with an optical band gap of 6.2 eV, and with a surface smoothness of less than 1 nm. A low-temperature buffer-layer approach was used to reduce the lattice and thermal mismatch strains. The dependence of the quality of AlN thin films and its characteristics as a function of processing parameters are discussed. Due to high crystallinity, near-perfect stoichiometry, and high packing density, pulsed-laser-deposited AlN thin films show a tendency to withstand high temperatures up to 1600°C, and which enables it to be used as an anneal capping layer for SiC wafers for removing ion-implantation damage and dopant activation. The laser-deposited AlN thin films show conformal coverage on SiC-based devices and exhibit an electrical break-down strength of 1.66 MV/cm up to 350°C when used as an insulator in Ni/AlN/SiC metal-insulator-semiconductor (MIS) devices. Pulsed laser deposition (PLD) AlN films grown on Pt/SiO₂/Si (100) substrates for radio-frequency microelectrical and mechanical systems and nanoelectrical and mechanical systems (MEMS and NEMS) demonstrated resonators having high Q values ranging from 8,000 to 17,000 in the frequency range of 2.5–0.45 MHz. AlN thin films were characterized by x-ray diffraction, Rutherford backscattering spectrometry (in normal and oxygen resonance mode), atomic force microscopy, ultraviolet (UV)-visible spectroscopy, and scanning electron microscopy. Applications exploiting characteristics of high bandgap, high bond strength, excellent piezoelectric characteristics, extremely high chemical inertness, high electrical resistivity, high breakdown strength, and high thermal stability of the pulsed-laser-deposited thin films have been discussed in the context of emerging developments of SiC power devices, for high-temperature electronics, and for radio frequency (RF) MEMS.