Using random forest to classify T-cell epitopes based on amino acid properties and molecular features

T-lymphocyte (T-cell) is a very important component in human immune system. T-cell epitopes can be used for the accurately monitoring the immune responses which activation by major histocompatibility complex (MHC), and rationally designing vaccines. Therefore, accurate prediction of T-cell epitopes is crucial for vaccine development and clinical immunology. In current study, two types peptide features, i.e., amino acid properties and chemical molecular features were used for the T-cell epitopes peptide representation. Based on these features, random forest (RF) algorithm, a powerful machine learning algorithm, was used to classify T-cell epitopes and non-T-cell epitopes. The classification accuracy, sensitivity, specificity, Matthews correlation coefficient (MCC), and area under the curve (AUC) values for proposed method are 97.54%, 97.22%, 97.60%, 0.9193, and 0.9868, respectively. These results indicate that current method based on the combined features and RF is effective for T-cell epitopes prediction.     

Influence of N2 introduction on structural and optical properties of V-doped ZnO thin films grown by low-temperature reactive RF magnetron sputtering

The influences of N₂ introduction to a sputtering gas on structural and optical properties of vanadium-doped ZnO (VZO) films, grown by using reactive RF magnetron sputtering on a quartz substrate at room temperature, were investigated. In the VZO films, V doping caused to form a large number of O vacancies (V_O) and degraded both the c-axis orientation and optical transmittance. While, on the contrary, the ZnO(002) diffraction intensity of 3.5-at.% VZO films increased adding N₂ with a partial pressure ratio (α_N2) >2% reaching a maximum at α_N2 =5%. The average optical transmittance (wavelengths: 450−800 nm) of the 3.5-at.% VZO films was also improved by the N₂ introduction and reached 74% at α_N2 =5%. As a result of the analyses of the chemical binding states of the incorporated N atoms via the Raman spectroscopy and XPS, it was confirmed that the O sites were substituted by the N atoms and the amount of incorporated N increased by the high V doping. From the above, the N₂ introduction was effective to suppress the V_O formation even in room-temperature-grown VZO films, so it enables to improve both the c-axis orientation and optical transmittance.     

Intermetallic Pt2Si：magnetron-sputtering preparation and electrocatalysis toward ethanol oxidation

Although most transition metals have been tested as the promoter to Pt for electrocatalysis toward fuel cell reactions,semi-conductor elements,such as Si,have hitherto not been examined.Here we report a simple synthesis of intermetallic Pt2Si electrode using magnetron sputtering and the electrocatalysis toward ethanol oxidation reaction（EOR）.In comparison to Pt,the intermetallic Pt2Si surface turns out to be much more active in catalyzing the EOR：the onset potential shifts negatively by 150 mV,and the current density at 0.6 V increases by a magnitude of one order.Such an enormous enhancement in EOR catalysis is ascribed to the promotion effects of Si,which can not only provide active surface oxygenated species to accelerate the removal of COads,but also strongly alter the electronic property of Pt,as clearly indicated by the core-level shift in XPS spectrum.     

脉冲反应磁控溅射氧化钒薄膜的电学性能研究

室温下,采用脉冲直流反应磁控溅射技术在玻璃衬底上制备了氧化钒薄膜.研究了脉冲调制功率占空比对薄膜物相、表面形貌、组分和热敏电学性能的影响.X射线衍射测试结果表明在室温及不同占空比下生长的氧化钒薄膜均为非晶结构;原子力显微镜表面形貌测试表明降低占空比可以得到更加光滑的薄膜表面;X射线光电子能谱测试表明降低占空比能够在反应溅射气氛不变的情况下促进钒的氧化;对薄膜的热敏电学特性测试发现,在293～368 K,小极化子跳跃是脉冲反应磁控溅射氧化钒薄膜中主要的导电机制.     

射频磁控溅射法在柔性聚酰亚胺衬底上制备ZnS薄膜及其特性研究

为使Ⅱ-Ⅵ族化合物ZnS薄膜具有可弯曲性,选用柔性的聚酰亚胺作为衬底材料,用射频磁控溅射法沉积ZnS薄膜,对所制备薄膜的结晶结构、组分和光学特性进行分析.实验结果表明,所制备薄膜为结晶态的闪锌矿ZnS结构,择优取向为(111)晶面,晶粒尺寸为25.6 nm.薄膜组分接近化学计量比,并具有少量的S损失.薄膜在可见光区和近红外光区的平均透射率分别为82.0％和90.5％,透光特性良好.作为对比,在钠钙玻璃衬底上溅射的ZnS薄膜的结晶度高于聚酰亚胺衬底薄膜,但其透射率略低于柔性ZnS薄膜.实验结果表明了用磁控溅射法在柔性聚酰亚胺衬底上制备ZnS薄膜的可行性.     

一种提高射频电缆焊接质量的工艺方法

射频连接器与射频电缆被广泛应用于军民品的通信设备中,其关键工序射频电缆芯线与射频连接器插针的连接常采用手钳式阻焊工具。由于射频电缆较细,手钳式阻焊工具在阻焊操作时,要求电装工双手不能抖动,否则易产生废品。通过对手钳式阻焊工具进行技术改进,重新设计了一种预压紧方式的阻焊装置,并通过试验确定了电阻焊接头的结构形式和尺寸,提高了手工阻焊成品率和生产效率,降低了对电装工的技能要求。     

LTE 毫微微蜂窝基站射频收发器的设计与实现*

针对近年来LTE 毫微微蜂窝基站商用加快和规模扩大,减小LTE 毫微微蜂窝基站的尺寸和降低其成 本就变得越来越重要。在保证基站性能的基础上,如何设计无线电收发器以减少尺寸和成本成为很大的挑战。设 计了一种应用于LTE 毫微微蜂窝基站中的低成本MIMO 射频收发器。分析了发射机和接收机的各项需求指标,提 出了块级的射频参数。据此,射频收发器被系统地分为几个子模块,分别设计了这些不同的子模块,同时区分各个 子模块的特点。所得到的测定结果表明,充分集成的射频收发器的设计不仅具有小尺寸,也符合LTE 毫微微基站的 各项指标。     

Annealing of silver nanolayers sputtered on polytetrafluoroethylene

Silver nanolayers sputtered on polytetrafluoroethylene and their changes induced by post‐deposition annealing at 100–300 °C are studied. Changes in surface morphology and roughness are examined by atomic force microscopy and by measurement of electrical sheet resistance by two‐point technique. Chemical composition was determined by X‐ray photoelectron spectroscopy (XPS) and electrokinetic analysis in dependence on the gold layer thickness. The annealing at 300 °C leads to significant rearrangement of the silver layer, and the transition threshold increases to 35 nm. The presence of oxidized structures on silver‐coated samples is observed in XPS spectra and by electrokinetic analysis, too. Annealing of pristine and silver‐coated poly(tetrafluoroethylene) at 300 °C results in significant change of the sample surface morphology and chemistry. There is observed formation of isolated silver islands on the surface, which could be connected with silver melting. Later, the silver agglomeration takes place. Copyright © 2013 John Wiley & Sons, Ltd.     

Multifractal analysis for Cu/Ti bilayer thin films

Two bilayer thin films with different stacking sequences, Cu/Ti/Si and Ti/Cu/Si, were deposited by DC magnetron sputtering technique. X‐ray diffraction technique was used to measure the crystallization structures, and scanning electron microscopy and atomic force microscopy were used to measured surface morphology. The multifractal spectra f(α)‐α was used to characterize the surface morphology. The result of |q|_max ≤ 53 is obtained by multifractal analysis. The shape of the multifractal spectra f(α) ? α is hook‐like for Cu/Ti/Si and bell jar‐like for Ti/Cu/Si. The spectrum width Δα = α_max ? α_min and Δf(=f(α_min) ? f(α_max)) of the multifractal spectra is able to quantitatively analyze the growth and surface roughness of the Cu/Ti bilayer thin films. The surface of Ti/Cu/Si thin film is more uniform and smoother than the film of Cu/Ti/Si. Copyright © 2013 John Wiley & Sons, Ltd.