Preparation and characterization of new window material CdS thin films at low substrate temperature (<300 K) with vacuum deposition

Low-temperature vacuum deposition instead of the commonly used vacuum deposition at high substrate temperatures has been applied to prepare new window material CdS thin films. The structural, optical and electrical properties of vacuum-evaporated CdS thin films were investigated as a function of substrate temperature (100–300 K) and the post-deposition annealing temperature (at 473, 573 and 673 K). It was determined that films deposited at all substrate temperatures were polycrystalline in nature with hexagonal structure and a strong (0 0 2) texture. The AFM and SEM studies showed that the microstructures of the as-deposited films agreed with the expectations from structure zone model. X-ray diffraction studies showed that the crystallinity of the CdS films was improved on annealing. Optical spectroscopy results of the films indicated that the optical band gap value increased from 2.40 to 2.42 eV with decreased substrate temperature. Increasing the annealing temperature sharpened the band edge. The dark resistivity increased from 4.5×10³ to 7.3×10³ Ω cm and the carrier concentration decreased from 4.7×10¹⁷ to 3.5×10¹⁵ cm⁻³ as the substrate temperature decreased from 300 to 100 K.     

n-CdTe Schottky势垒薄膜太阳能电池中嵌入p型层对其势垒高度影响的计算机模拟

通过求解Ｐｏｉｓｓｏｎ方程，对热平衡态金属：ｐ－ｎ－ＣｄＴｅＳｃｈｏｔｋｙ势垒薄膜太阳能电池进行计算机数值模拟。嵌入的ｐ型层增大传统金属：ｎ－ＣｄＴｅ结的有效Ｓｃｈｏｔｋｙ势垒高度与ｐ型层厚度、掺杂浓度以及ｎ－ＣｄＴｅ本底电阻率有依赖关系。最后讨论嵌入ｐ型层增强ＣｄＴｅＳｃｈｏｔｋｙ势垒太阳能电池对光生载流子的收集作用。     

808nm激光器端面镀膜技术

通过对AlGaAs／GaAs808nm半导体激光器谐振腔的前后端面分别蒸镀Ta2O5／SiO2膜系高反膜和Al2O3单层增透膜，使得前后端面的反射率分别达到11％和98．42％。器件在同一驱动电流下镀膜后的输出功率比镀膜前增加了一倍多，同时镀膜还有效地保护了端面，延长了器件工作寿命。     

基于SSCVD方法的a-b轴取向ZnO薄膜制备

以Zn₄(OH)₂(O₂CCH₃)₆·2H₂O为单一固相有机源,采用单源化学气相沉积法(Single sour cechem icalvapor deposition,SSCVD)在Si(100)衬底上制备ZnO薄膜,用X射线衍射(XRD)、原子力显微镜(AFM)分析ZnO薄膜样品的晶体结构和微观形貌,并用X射线光电子能谱(XPS)对薄膜的锌氧化学计量比进行了分析。研究结果表明:在非平衡条件下所得到的ZnO薄膜沿a-b轴取向生长,基片温度对ZnO薄膜生长过程影响较大,随着基片温度的升高,薄膜呈现c轴生长趋势;晶粒成柱状、尺寸均匀、膜层结构致密;薄膜样品中n_Zn:n_O=0.985。     

大气压等离子体辅助多晶硅薄膜化学气相沉积参数诊断

本文采用发射光谱法诊断了大气压下Ar气、SiCl₄及H₂气混合气体（Ar/SiCl₄/H₂）射频放电等离子体射流特性.利用Si原子谱线强度计算了电子激发温度并以此估算了Si原子数密度,研究了射频功率及气体流量对电子激发温度和Si原子数密度以及SiCl₄解离率的作用.     

退火与极化温度对尼龙11薄膜驻极体内陷阱能级分布的影响

用热释电技术研究了尼龙11薄膜驻极体制备过程中热处理与极化温度对驻极体陷阱能级分布的影响.结果显示，淬火驻极体的热释电流谱上存在四个空间电荷退陷阱电流峰，而在退火处理后则显示两个退陷阱电流峰.采用多点法对热释电流谱进行理论拟合可以将各个退陷阱电流峰分离并得到它们的陷阱深度参数.这些参数进一步表明，淬火尼龙11薄膜驻极体内存在四个空间电荷的陷阱能级，极化温度升高对它们的分布情况影响不大；退火处理后，陷阱能级减少为两个，且随着极化温度的升高，较浅的陷阱能级有明显向较深陷阱能级接近的趋势. 关键词： 尼龙11 薄膜驻极体 热释电 热处理     

基于硒化锌薄膜法的食源性致病菌原位红外光谱检测

食源性致病菌是引发和威胁公众健康的主要因素之一。由于食源性致病菌种类繁多,常规检测方法复杂耗时要求高,因此迫切需要一种更加快速精确的致病菌检测技术。在传统红外光谱检测致病菌的流程中,如经典的溴化钾压片法,除了压片本身的操作之外通常还需对样品进行冷冻干燥（约需2 d）等耗时前处理过程,因而不利于高通量快速检测。本研究利用硒化锌薄膜法,在硒化锌窗片上直接滴加菌液、低温（48 ℃）烘干后进行原位检测,无需漫长的冻干处理,整个检测过程在50 min之内。同时,检测所需样品量少（10 μL）无需研磨等物理破坏性的制样过程,避免了常规溴化钾压片法中研磨颗粒粗细、制片厚薄误差及易碎片、吸潮等的不利影响。四种常见食源性致病菌（大肠杆菌DH5α;沙门氏菌CMCC 50041;霍乱弧菌SH04;金黄色葡萄球菌SH10）的硒化锌薄膜法与溴化钾压片法红外谱图对比分析表明：在相同的峰值检测阈值下（透过率大于0.05%）,本研究所采用的方法获得的二阶导数图谱在900～1 500 cm-1范围内可被识别的特征峰个数比溴化钾压片法明显增多（硒化锌薄膜法共计81个,溴化钾压片法共计58个）,特征峰在多个位置强度显著增加(1 119,1 085和915 cm-1等),且可将溴化钾压片法中较宽的单峰或不明显的双峰显示为较明显的双峰（大肠杆菌DH5α：1 441,1 391和1 219 cm-1等; 沙门氏菌CMCC 50041：1 490,1 219和1 025 cm-1;霍乱弧菌SH04：1 441和1 219 cm-1;金黄色葡萄球菌SH10：1 491,1 397和1 219 cm-1）,说明硒化锌薄膜法可以提高图谱分辨率及信噪比。基于硒化锌薄膜法的原位红外光谱法对常见食源性致病菌整体快速高通量检测将具有巨大的应用前景。     

温度对AZO薄膜红外辐射性能的影响

随着全球资源的减少和环境的恶化,节能减排已成为人们关注的焦点,具有保温隔热功能的低辐射玻璃成为研究的热点。提高玻璃保温隔热性能最有效的方法就是在其表面涂覆低辐射率层。原材料丰富、导电性能好、可见光透过率高等优势使得Al掺杂ZnO (AZO)薄膜成为最具潜力的低辐射率层。系统研究了温度对AZO薄膜红外辐射性能的影响,分析了变化机理。首先研究了在一定的温度下持续一段时间后,AZO薄膜的红外比辐射率的变化情况。然后研究了在变温环境中红外比辐射率的变化情况。采用直流磁控溅射法在室温下玻璃基片上沉积500 nm厚的AZO薄膜,将薄膜放到马弗炉中进行热处理,在100～400 ℃空气气氛下保温1 h,随炉冷却。采用X射线衍射仪对AZO薄膜进行物相分析,采用扫描电子显微镜观察薄膜表面形貌变化。利用四探针测试法测量AZO薄膜的电阻率,采用红外比辐射率测试仪测试薄膜红外比辐射率, 可见分光光度计测量可见光谱。测试的结果表明,薄膜热处理前后均为六角纤锌矿结构,(002)择优取向。300 ℃及以下热处理1 h后,(002)衍射峰增强,半高宽变窄,晶粒尺寸长大。随着热处理温度的升高,薄膜的电阻率先减小后增大,200 ℃热处理后的薄膜具有最小的电阻率(0.9×10-3 Ω·cm)。热处理温度升高,晶粒长大使得薄膜电阻率降低。热处理温度过高,薄膜会从空气中吸收氧,电阻率下降。薄膜的红外比辐射率变化趋势和电阻率的一致,在200 ℃热处理后获得最小值(0.48)。自由电子对红外光子有较强的反射作用,当电阻率低,自由电子浓度高的时候,更多的红外光子被反射,红外辐射作用弱,红外比辐射率小。薄膜的可见光透过率随着热处理温度的升高先减小后增大,200 ℃热处理后的薄膜的可见光透过率最小,但仍高达82%。这种变化是由于自由电子浓度变化引起的,自由电子对可见光有很强的反射作用。选取未热处理和200 ℃热处理后的样品进行变温红外比辐射率的测量,将样品放在可加热的样品台上,位置固定,在室温到350 ℃的升温和降温过程中每隔25 ℃测量一次红外比辐射率,结果表明,在室温到350 ℃的温度范围内,AZO薄膜的红外比辐射率在升温过程中随着温度的上升而增大,在降温过程中减小,经过整个升、降温过程后,薄膜的红外比辐射率增大。     

纳米晶聚合物复合薄膜PbTiO3-PEK-c的电光特性及其弛豫过程的研究

制备了掺杂型纳米晶聚合物钛酸铅聚醚醚酮 (PbTiO3 PEK c)复合薄膜 ,采用简单透射技术测量了该复合薄膜的线性电光系数 ,并研究了该复合薄膜的电光特性的弛豫过程     

Ellipsometric analysis and optical absorption characterization of gallium phosphide nanoparticulate thin film

Gallium phosphide (GaP) nanoparticulate thin films were easily fabricated by colloidal suspension deposition via GaP nanoparticles dispersed in N,N-dimethylformamide. The microstructure of the film was performed by x-ray diffraction, high resolution transmission electron microscopy and field emission scanning electron microscopy. The film was further investigated by spectroscopic ellipsometry. After the model GaP+void|SiO₂ was built and an effective medium approximation was adopted, the values of the refractive index n and the extinction coefficient k were calculated for the energy range of 0.75 eV-4.0 eV using the dispersion formula in DeltaPsi2 software. The absorption coefficient of the film was calculated from its k and its energy gaps were further estimated according to the Tauc equation, which were further verified by its fluorescence spectrum measurement. The structure and optical absorption properties of the nanoparticulate films are promising for their potential applications in hybrid solar cells.