Dynamics of aggregation－annihilation process with cluster removals

We have studied the kinetic behaviours of irreversible aggregation－annihilation models with cluster removals. In the models, an irreversible aggregation reaction occurs between any two clusters of the same species and an irreversible annihilation reaction occurs simultaneously between two different species; meanwhile, the clusters of large size are gradually removed from the system. In a mean-field limit, we obtain the general solutions of the cluster-mass distributions for the cases with an arbitrary removal probability. We found that the cluster-mass distribution of either species satisfies a generalized or modified scaling form. The results also indicate that the evolution behaviours of the systems depend strongly on the details of the reaction events.     

Second harmonic generation of propagating collective excitations in Bose－Einstein condensates

We consider a possible second harmonic generation (SHG) of propagating collective excitations in a two-component Bose－Einstein condensate (BEC) with repulsive atom－atom interactions. We show that the phase-matching condition for the SHG can be fulfilled if the wave vectors and frequencies of the excitations are chosen adequately from different dispersion branches. We solve the nonlinear amplitude equations for the SHG derived using a method of multiple-scales and provide SHG solutions similar to those obtained for a SHG in nonlinear optical media. A possible experimental realization of the SHG for the propagating collective modes in a cigar-shaped two-component BEC is also discussed.     

Nonlinear current－voltage characteristics of sintered tungsten－vanadium oxide

We have studied the densification behaviour, microstructure and electrical properties of WO_3 ceramics with V_2O_5 as the additive ranging from 0.5 to 15mol%. Scanning electron microscopic photos indicated that the grain size of WO_3－V_2O_5 specimens is smaller than that of pure WO_3. The addition of V_2O_5 to WO_3 showed a tendency to enhance the densification rate and to restrict the grain growth. Electrical properties of all specimens were measured for different electrodes at different temperatures. The formation of the grain boundary barrier layer was confirmed by the non-ohmic I－V behaviour. The nonlinear coefficient was obtained at the current density J=0.01, 0.1 and 1mA/cm^2 for a series of WO_3－V_2O_5 samples. The V0.5mol% specimen showed an abnormal phenomenon that the nonlinear characteristics appeared at 350℃ and disappeared at lower and higher temperatures. This implies that it could be applied as a high-temperature varistor. The double Schottky barrier model was adopted to explain the phenomena for the WO_3-V_2O_5 varistors.     

The charge storage of the nc—Si layer

Sandwiched structures (a-SiN_x/a-Si/a-SiN_x) have been fabricated by the plasma enhanced chemical vapour deposition technique. A Si nanocrystal (nc-Si) layer was formed by crystallization of an a-Si layer according to the constrained crystallization principle after quasi-static thermal annealing at 1100℃ for 30 min. Transmission electron microscopy (TEM) and Raman scattering spectroscopy clearly demonstrated that nc-Si grains were formed in the as-deposited a-Si layer after annealing. The density of nc-Si grains is about 10¹¹cm^-2 as shown by TEM photographs. Using capacitance－voltage (C－V) measurements we investigated the electrical characteristics of the sandwiched structures. The charge storage phenomenon of the nc-Si layer was observed from the shift of flat-band voltage (V_FB) in C－V curves at a high frequency (1 MHz). We estimated the density of nc-Si grains to be about 10¹¹cm^-2 from the shift value of V_FB, which is in agreement with the result of TEM photographs. At the same time, we found that the shift of V_FB increased with the increase of the applied constant dc voltage or the thickness of the nc-Si layer.     

Investigation of the growth process of Si nanowires using the vapour－liquid－solid mechanism

Silicon nanowires have been grown by the thermal decomposition of silane via the vapour－liquid－solid (VLS) mechanism. Three different stages of VLS growth (eutectic alloy formation, crystal nucleation and unidirectional growth) were studied separately using a scanning electron microscope and a high-resolution transmission electron microscope. Very short silicon nanowires prepared under particular conditions provide direct evidence of the VLS mechanism on a nanometre scale. Our results will be very helpful for the controllable synthesis of Si nanowires.     

The virial theorem in refined Thomas－Fermi－Dirac theory for the interior of atoms in a solid

The virial theorem in refined Thomas－Fermi－Dirac theory for the interior of atoms in a solid is given and proven.     

Thin titanium oxide films deposited by e-beam evaporation with additional rapid thermal oxidation and annealing for ISFET applications

Titanium oxide (TiO₂) has been extensively applied in the medical area due to its proved biocompatibility with human cells [1]. This work presents the characterization of titanium oxide thin films as a potential dielectric to be applied in ion sensitive field-effect transistors. The films were obtained by rapid thermal oxidation and annealing (at 300, 600, 960 and 1200 °C) of thin titanium films of different thicknesses (5 nm, 10 nm and 20 nm) deposited by e-beam evaporation on silicon wafers. These films were analyzed as-deposited and after annealing in forming gas for 25 min by Ellipsometry, Fourier Transform Infrared Spectroscopy (FTIR), Raman Spectroscopy (RAMAN), Atomic Force Microscopy (AFM), Rutherford Backscattering Spectroscopy (RBS) and Ti-K edge X-ray Absorption Near Edge Structure (XANES). Thin film thickness, roughness, surface grain sizes, refractive indexes and oxygen concentration depend on the oxidation and annealing temperature. Structural characterization showed mainly presence of the crystalline rutile phase, however, other oxides such Ti₂O₃, an interfacial SiO₂ layer between the dielectric and the substrate and the anatase crystalline phase of TiO₂ films were also identified. Electrical characteristics were obtained by means of I-V and C-V measured curves of Al/Si/TiO_x/Al capacitors. These curves showed that the films had high dielectric constants between 12 and 33, interface charge density of about 10¹⁰/cm² and leakage current density between 1 and 10⁻⁴ A/cm². Field-effect transistors were fabricated in order to analyze I_D x V_DS and log I_D × Bias curves. Early voltage value of −1629 V, R_OUT value of 215 MΩ and slope of 100 mV/dec were determined for the 20 nm TiO_x film thermally treated at 960 °C.     

硫氰酸根离子敏半导体传感器的研制

本文报导的不是ＰＶＣ膜硫氰酸根离子半导体传感器。该传感器具有全固态化,易微型化、集成化和功能化等特点。并具有良好的能斯特响应。     

激光辐照对长滤HgCdTe光导探测器电学参数的影响

对长波HgCdTe光导探测器进行了低于其永久损伤阈值的变功率激光辐照，测量辐照前后器件的电阻－温度特征，用电阻－温度特征研究材料参数的方法对实验结果进行拟合，结果表明辐照后HgCdTe探测器件的组分变大，并由此计算得到探测器性能突变后，器件的电子迁移率与电子浓度均有一定程度减小。认为这可能是由于激光辐照的热效应使N型HgCdTe光导器件的表面及体内均产生的一定的变化所致。