高斯电子束曝光系统

电子束光刻技术是纳米级加工技术的主要手段,在纳米器件加工、掩模制造、新器件新结构加工中扮演举足轻重的角色。虽然现在最先进的电子束聚焦技术可以得到几个纳米的电子束斑,但是由于邻近效应问题,依然很难使用电子束光刻技术得到接近其理论极限的纳米尺度图形,对电子束曝光系统的基本原理及其邻近效应校正技术进行了研究,并得到一些比较理想的曝光结果。     

Fabrication of mesoporous Pt inside micrometer channels via “solvent-evaporation-mediated direct physical casting”

We have proposed a novel convenient pathway via solvent-evaporation-mediated direct physical casting (SEDPC) for the fabrication of mesoporous metals in a micrometer scale. We have presented the successful deposition of highly ordered mesoporous Pt into micrometer channels prepared by lithography. The direct observation by a high-resolution scanning microscope (HR-SEM) showed the formation of highly ordered 2D-hexagonal (p6mm) mesoporous metals onto such substrates. The cyclic voltammogram of the mesoporous Pt in sulfuric acid revealed a typical feature which can identify the clean Pt surface. Moreover, mesoporous Pt exhibits an effective reduction of dissolved dioxygen molecules. It is proved that mesoporous Pt deposited in a very confined area via the SEDPC method possesses electrocatalytic performance owing to Pt.     

Investigation on the Low Luminous Efficiency in a Polymer Light‐Emitting Diode with a High Work‐function Cathode by Soft Contact Lamination**

This article reports the main origin of the low luminescent efficiency in hole‐dominant polymer light‐emitting diodes by controlling the hole injection and by chemically modifying the cathode by molecular monolayers. Since molecular modification of the top electrode is impossible when one deposits the electrode using a vacuum deposition method, this study was performed using a soft contact lamination technique to form electrical contacts on top of the emissive layer. The top electrode was chemically modified with an alkane thiol self‐assembled monolayer (SAM) to act as an interfacial spacer layer between the emitting layer and the cathode. Herein, it is reported that, contrary to common belief, a high device quantum efficiency can be achieved from the dominantly hole‐transporting device with a high work‐function cathode (like Au) by facilitating more hole injection from the anode in the device with low population of exciton quenching channels near the cathode.     

193 nm光刻散射条技术研究

介绍了193nm光刻中的散射条技术，并利用标量衍射和傅里叶光学理论，对掩模和光瞳平面上衍射图形的空间频率进行了深入的分析，从理论上解释了散射条的工作原理。通过商用光刻模拟软件PROLITH，对散射条的参数进行了优化，并总结出193nm光刻中孤立线散射条的优化方法。     

光刻机宏动试验运动平台设计及其减振系统仿真研究

根据光刻机的步进运动、同步扫描运动和自然振动的特点,设计了两种形式的宏动运动平台结构图和整个系统精密减振方法,并选用STACIS2000减振器作为系统的主动减振器。对ADAMS的求解原理进行了简单介绍并运用ADAMS仿真软件分别建立了两种结构对应的虚拟仿真模型,对减振系统分别无主动控制和有主动控制进行了仿真研究。结果表明,没有主动控制的结果不能满足光刻机的工作要求,采用主动控制比没有主动控制的效果要好并能满足工作要求。通过两种方案的结果对比分析,选择第二种结构方案作为本课题的设计方案。     

New fluoropolymer materials

We report the synthesis of two classes of fluoropolymers that could impact several key lithographic techniques; one has potential applications in next generation photolithography (193 nm, 157 nm, and immersion lithography) and the other in lithographic techniques which are emerging as viable alternatives to photolithography for future applications (i.e., soft lithography).     

Ordered Mesoporous Silicate Structures as Potential Templates for Nanowire Growth

Mesoporous thin films are prepared using a simple sol–gel technique. Using lithographically patterned (100)‐orientated substrates and a dip‐coating method reproducible alignment of the pores across the substrate surface can be obtained. The pores preferentially align parallel to the long side of the channels etched into the surface. The channels within the aligned films are subsequently filled with cobalt (to form nanowire‐type structures) using a supercritical fluid inclusion technique, to allow high‐resolution imaging of the pore by using secondary electron microscopy. The channel structure imposes a strain on the mesoporous arrangement resulting in some variation in d‐spacings compared to simple films. The results indicate that the topographic structure can be used to engineer the placement and directionality of the pore structure and the potential of the aligned mesostructures are discussed.     

微光信号探测对准技术

通过对光栅对准原理、结构的分析,以及在光刻设备中的实际应用,探讨微弱光电信号探测对准技术。     

低压化学汽相淀积含氢氮化硼薄膜

本实验采用二硼烷(B_1H_6)和氨气(NH_(?)),在388～700℃下进行低压化学汽相淀积生成含有硼、氮、氢的膜(B_(1～3)NH),用于X光曝光掩模的基底.已测得膜的各种特性如淀积速率、电阻率、元素成份比、晶型、折射率、红外吸收光谱、应力变化、对光的透射率、化学不活泼性及等离子腐蚀速率等.     

Cover Picture: Three‐Dimensional SiCN Ceramic Microstructures via Nano‐Stereolithography of Inorganic Polymer Photoresists (Adv. Funct. Mater. 9/2006)

An inorganic polymer photoresist was successfully synthesized for the first time with high photosensitivity and a high ceramic yield. Furthermore, it is shown by Kim, Yang, and co‐workers on p. 1235 that a nano‐stereolithography process linked with careful pyrolysis of this resin paves the way for the fabrication of 2D and 3D ceramic microstructures (examples of which are shown on the cover) with high spatial resolution. We report a newly synthesized inorganic polymer photoresist with a high ceramic yield by the functionalization of polyvinylsilazane (KiON VL20) with 2‐isocyanatoethyl methacrylate via linkage or insertion reaction routes. The chemistry of the synthesis and the pyrolytic conversion as well as the mechanical evaluation were investigated by using various analytical instruments. We show for the first time that this photosensitive resin is a novel precursor for the fabrication of complex 3D SiCN ceramic microstructures with a 210 nm resolution via a two‐photon absorbed crosslinking process and subsequent pyrolysis at 600 °C under a nitrogen atmosphere. Moreover, the dimensional deformation during pyrolysis was significantly reduced by adding silica nanoparticles as a filler. In particular, the ceramic microstructures containing 40 wt % silica nanoparticles exhibited a relatively isotropic shrinkage owing to its sliding free from the substrate during pyrolysis.