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21.
We present the lithography technique to fabricate a curved linear grating by using a Cartesian coordinates laser direct writer (LDW) system. The grating with the period of 15 μm is made on the convex lens surface. This is a new application of the LDW system. After the chromium coating and the photoresist removing procedures, a convex reflecting grating is obtained. 相似文献
22.
卞志昕 《电子工业专用设备》2006,35(6):3-5,11
对2005年公布的《国际半导体就十时微蓝图》中光刻部分进行了介绍与分析,并与之前的版本进行比较,列出了光刻技术面临的挑战和潜在技术方案。最后指出,浸入式光刻、纳米压印、极紫外光刻和ML2将是未来几年重点研究对象。 相似文献
23.
针对曲面栅网器件的光刻工艺,提出了一种可动态调焦的激光直写式光刻系统,该系统将紫外激光器的光束经过整形扩束、动态z向调焦、x/y振镜、聚焦等单元使器件上相应位置涂覆的光刻胶直接感光,再经过显影、刻蚀等工艺直接制作出相应器件. 它可以应用到一些精度要求不太高的平面或非平面器件的光刻加工工艺, 取代传统的使用掩模版的光刻工艺或其它的加工工艺. 相似文献
24.
本文主要介绍了变频器在国产单双色单张纸平版印刷机改造中的应用，以及对变频器的一些功能的要求。 相似文献
25.
Shuang GONG;Baoxi YANG;Huijie HUANG 《光子学报》2022,51(3):290-299
Lithographic apparatus is widely recognized as an efficient tool in manufacturing Integrated Circuits （ICs） and other micro–nano structures. During the manufacturing process of ICs, the exposure field is scanned by a narrower illumination field. Illumination uniformity is a key factor in determining resolution and Critical Dimension Uniformity （CDU）, which are important performance parameters in advanced lithography systems. To obtain higher photolithography resolution and better CDU, the exposure dose must be kept as uniform as possible in the cross-scanning direction. Improving the consistency of the numerical aperture of each field of relay lens is the premise of ensuring the illumination uniformity. In the optimization conventional imaging optical design, wavefront error, dispersed spot, or optical transfer functions are generally employed as evaluation functions. Therefore, it is impossible to fully and completely satisfying the performance evaluation requirements of the relay lens group using the traditional aberration evaluation method. The general illuminance calculation of the optical system is based on the Monte Carlo method. The computational accuracy degree of the result is related to the number of traces light. In the mainstream optical design software, it is used in a calculation method of four-square cosine of the field angle, in a large number of engineering practice, the difference between the expected illumination distribution of the algorithm and the actual distribution are large. Especially for the telecentric optical system, the result of this calculation method is very worth to be suspected. The relay lens group is used to image the illumination field on the scanning slit plane on the mask plane. The relay lens group has a feature of double telecentric and adjustable pupil, so the above algorithm is still not suitable for the relative illuminance calculation of the image plane of the relay lens group. In this paper, a fast algorithm for calculating the uniformity of illumination is proposed, in which the numerical aperture of the system is calculated by approximate algorithm, and the illumination is characterized by the numerical aperture of exit pupil. The non-uniformity of light field is calculated by this algorithm, which is used as the evaluation function in the process of automatic optimization to optimize the design of relay lens of lithography illumination system. Then the designed relay lens is simulated by the software Light tools. The simulation results show that the non-uniformity of the illumination on the mask surface is less than 0.5% under different coherence factors. Simulation shows that the algorithm results have high correlation with the actual performance, reflecting the actual illumination uniformity, and can improve the uniformity of the system by controlling the value of the evaluation function. The result of the algorithm is proved to have a conservative characteristic, that is, the actual illumination uniformity will exceed the design value, which ensures that the obtained results meet the performance requirements. And this evaluation algorithm has a huge advantage in the speed, which can meet the needs of optimized design. Finally, the integral uniformity of the designed relay lens is tested through experiment, and the results shown that the non-uniformity of illumination is less than 1.21%, which can meet the requirement of the illumination non-uniformity on the mask surface （< 1.5%）. It is proved that the fast evaluation algorithm is effective in the optimal design of relay lens. 相似文献
26.
童志义 《电子工业专用设备》2007,36(8):6-10,20
光刻是圆片级封装的一种最重要的工艺,无论是焊盘分布、焊凸形成、密封或其它新出现的需求,晶圆上精确的成像区域对每一种工序来讲是最重要的。评述了一些圆片级封装的光刻系统及为什么某些专门的设备能很好地适于应用,会是接近式光刻机、步进投影光刻机还是一些替代设备在未来的几年内来满足这种需求?我们将探索这种可能性。 相似文献
27.
用于光刻机模拟运动的精密工件台宏动定位系统研制 总被引：1，自引：1，他引：0
为给步进扫描光刻机的设计研究提供理论指导,解决光刻机工件台宏动定位平台的设计和控制问题,根据工业应用中步进扫描光刻机的运动特点和工作要求,设计了一种H型精密工件台宏动定位系统和同步控制方案。试验结果表明,其各项性能指标均满足设计要求,对指导实际工业应用具有一定的参考价值。 相似文献
28.
In this work, an aqueous acidic thin‐layer‐based strategy for fabricating nanostructures on silicon by using atomic force microscopy (AFM) nanolithography is presented. The approach involves the formation of microscale droplets via dilute hydrofluoride (DHF) etching, the conversion of the droplets to acidic thin layers by AFM‐probe scanning, and subsequent lithographic operations using a biased probe in the aqueous layers. By varying the concentration of the acidic DHF layers, the thin layers can facilitate the creation of both positive and negative patterns, such as oxide dots and Si pores, through anodic oxidation and dissolution. In particular, the anodic oxidation in the acidic media is associated with the field‐enhanced nonequilibrium dissociation of the weak electrolyte. The Si pore structure formation is related to the field‐assisted dissolution of anodic oxides and the Si substrate. The acidic‐layer‐based technique allows switching between different lithographic modes by changing the acidity of the DHF layers, and is complementary to bulk solution‐based and local meniscus‐based approaches in AFM nanolithography. In principle, this method can also be extended to other materials that have similar reactions with DHF. 相似文献
29.
Hierarchically ordered structures facilitate the incorporation of diverse functions simultaneously. The present report introduces a simple and novel strategy for producing hierarchically ordered polymeric films. Hierarchical ordering of aqueous droplets on a polymer solution is realized by the imposition of physical confinement via various shaped gratings. After drying of the solution, well‐ordered hierarchical structures were fabricated in the remaining polymer film. The size of the grating structure and the lattice size of spontaneous hexagonally packed aqueous pores comprise two different length scales, thereby offering multiscale ordering. Interfacial wetting of the polymer solution to the grating surface was crucial in terms of obtaining a highly ordered structure that can be tuned by dissolving a small amount of surfactant in the polymer solution. The present novel approach provides a new opportunity for lithography‐free fabrication of complex hierarchical structures. 相似文献
30.
Chandra Sekhar A. Durisety Rajagopal Vijayraghavan Lakshmipriya Seshan Syed K. Islam Benjamin J. Blalock 《Analog Integrated Circuits and Signal Processing》2006,48(2):143-150
This paper demonstrates a technique for controlling the electron emission of an array of field emitting vertically aligned carbon nanofibers (VACNFs). An array of carbon nanofibers (CNF) is to be used as the source of electron beams for lithography purposes. This tool is intended to replace the mask in the conventional photolithography process by controlling their charge emission using the “Dose Control Circuitry” (DCC). The large variation in the charge emitted between CNFs grown in identical conditions forced the controller design to be based on fixed dose rather than on fixed time. Compact digital control logic has been designed for controlling the operation of DCC. This system has been implemented in a 0.5 μm CMOS process. Chandra Sekhar A. Durisety received his B.E. (Hons.) Instrumentation from Birla Institute of Technology and Sciences, Pilani, India in 1997 and his M.S in Electrical Engineering from University of Tennessee, Knoxville in 2002. Since 2003, he has been working towards his Ph.D degree also in Electrical Engineering at Integrated Circuits and Systems Lab (ICASL), University of Tennessee, Knoxville. He joined Wipro Infotech Ltd, Global R & D, Bangalore, India in 1997, where he designed FPGA based IPs for network routers. Since 1999, he was involved in the PCI bridge implementation at CMOS chips Inc, Santa Clara, CA, and the test bench development for Sony’s MP3 player, while at Toshiba America Electronic Components Inc., San Jose, CA. His research interests include multi-stage amplifiers, data converters, circuits in SOI and Floating Gate Devices. Rajagopal Vijayaraghavan received the B.E degree in electronics and communication engineering from Madras University in 1998 and the M.S degree in electrical engineering from the University of Texas, Dallas in 2001.He is currently working towards the Ph.D degree in electrical engineering at the University of Tennessee. His research interest is in the area of CMOS Analog and RF IC design. His current research focuses on LNAs and VCOs using SOI based MESFET devices. Lakshmipriya Seshan was born in Trivandrum, India on April 30, 1979. She received her B.tech in Electronincs & Communication Engg from Kerala University, India in June 2000 and M.S in Electrical Engg from University of Tennessee in 2004. In 2004, she joined Intel Corporation as an Analog Engineer, where she is engaged in the design of low power, high speed analog circuits for various I/O interface topologies. Syed K. Islam received his B.Sc. in Electrical and Electronic Engineering from Bangladesh University of Engineering and Technology (BUET) and M.S. and Ph.D. in Electrical and Systems Engineering from the University of Connecticut. He is presently an Associate Professor in the Department of Electrical and Computer Engineering at the University of Tennessee, Knoxville. Dr. Islam is leading the research efforts of the Analog VLSI and Devices Laboratory at the University of Tennessee. His research interests are design, modeling and fabrication of microelectronic/optoelectronic devices, molecular scale electronics and nanotechnology, biomicroelectronics and monolithic sensors. Dr. Islam has numerous publications in technical journals and conference proceedings in the areas of semiconductors devices and circuits. Benjamin J. Blalock received his B.S. degree in electrical engineering from The University of Tennessee, Knoxville, in 1991 and the M.S. and Ph.D. degrees, also in electrical engineering, from the Georgia Institute of Technology, Atlanta, in 1993 and 1996 respectively. He is currently an Assistant Professor in the Department of Electrical and Computer Engineering at The University of Tennessee where he directs the Integrated Circuits and Systems Laboratory (ICASL). His research focus there includes analog IC design for extreme environments (both wide temperature and radiation immune), multi-gate transistors and circuits on SOI, body-driven circuit techniques for ultra low-voltage analog, mixed-signal/mixed-voltage circuit design for systems-on-a-chip, and bio-microelectronics. Dr. Blalock has co-authored over 60 published refereed papers. He has also worked as an analog IC design consultant for Cypress Semiconductor Corp. and Concorde Microsystems Inc. 相似文献