采用空心阴极放电等离子体化学气相沉积方法制备a-CH薄膜

 研究了不同衬底-阴极距离、直流电压和H₂流量对a-CH薄膜沉积速率的影响。结果表明：衬底-阴极距离必须大于0.5cm，随着该距离的增加，薄膜的沉积速率减少；直流电压达550V时沉积速率最大；随着H2含量的增加，CH₄含量相对减少，沉积速率随之降低。用AFM观察了以该方法制得的448.4nm CH薄膜的表面形貌，表面粗糙度约为10nm。最后测出了不同条件下CH薄膜的UV-VIS谱，由此可以计算得到薄膜的禁带宽度及折射率。     

ns脉冲激光对K9玻璃的破坏实验

 采用高速PIN光电探测器和高带宽的数字存储示波器，实时检测透射光脉冲和散射光脉冲的变化特征，并将之用作材料破坏的光学判据，测量得到K9玻璃在1.06μm纳秒脉冲激光作用下的能量损伤阈值约18mJ，相应的能量密度阈值为1.0kJ/cm²。通过分析透射光脉冲和散射光脉冲的特征，给出了材料的破坏时刻，并推断出K9玻璃所能承受的极限光强为10¹⁵W/m²。研究了能量透过率与泵浦能量的关系，并初步探讨了透明材料的破坏机理。结果表明：在多纵模激光的作用下，透明光学材料破坏是电离击穿与自聚焦效应综合作用的结果。     

含氮类金刚石薄膜的紫外辐照研究

 用射频等离子体方法在玻璃基底上制备的类金刚石（DLC）薄膜，采用离子注入法掺氮，并对掺氮DLC薄膜紫外（UV）辐照前后的性能变化进行了研究。研究结果表明：随氮离子注入剂量及UV辐照时间的增加，位于2 930cm^-1附近的SP ³C-H吸收峰明显变小，而位于1 580cm^-1附近的SP2C-H吸收峰则明显增强，薄膜的电阻率明显呈下降趋势；随UV辐照时间的增加，位于1 078cm^-1附近的Si-O-Si键数量及位于786cm^-1附近的Si-C键数量明显增加。即氮离子注入和UV辐照明显改变了DLC薄膜的结构与特性。     

Multiple Scattering Effects of Ag Particles in Random Ag-SiN Film

A layer of 40nm-thick Ag-SiN film with Ag nano-particles embedded and distributed randomly in the SiN thin film were deposited by the method of radiant-frequency magnetron sputtering. Specimens orderly comprising a random Ag-SiN film and an optical phase change recording layer were exposed to a focused laser beam with wavelength of 69Ohm. It is shown that, with a random Ag-SiN layer deposited above the recording layer. Calculation by the finite difference time domain method of a 4Ohm-thick SiN film under a Gaussian beam irradiation has been carried out to simulate the near-field distribution in the film, which showed a huge local near-field intensity enhancement of about 200 times if small Ag particles with diameter of 6 nm were modelled inthe SiN film in the central region of the in cident laser spot.     

Nanoporous Structure in Low-Dielectric Films with Positronium Annihilation Lifetime Spectroscopy

We investigate nano-porous structures in thin low-dielectric films, i.e. the pore sizes, distributions, and interconnectivity, by using depth profiled positronium annihilation lifetime spectroscopy (PALS). It is found that PALS has good sensitivity to probe both interconnected and closed pores in the range from 0.3nm to 3Onto, even in the film buried beneath a diffusion barrier. A series of low dielectric constant films of organosilicon-silsequioxane with different weight percentages of porogen have been comparatively investigated. The PALS technique can be used to distinguish the open porosity from the closed one, to determine the pore size, and to detect the percolation threshold with the increasing porosity that represents the transition from closed pores to interconnected pores.Furthermore, the pore percolation length can be derived.     

Structure and Photoluminescence of Nano-ZnO Films Grown on a Si （100） Substrate by Oxygen- and Argon-Plasma-Assisted Thermal Evaporation of Metallic Zn

Nano-ZnO thin films were prepared by oxygen- and argon-plasma-assisted thermal evaporation of metallic Zn at low temperature, followed by low-temperature annealing at 300℃ to 500℃ in oxygen ambient. X-ray diffraction patterns indicate that the nano-ZnO films have a polycrystalline hexagonal wurtzite structure. Raman scattering spectra demonstrate the existence of interface layers between Zn and ZnO. Upon annealing at 400℃ for i h, the interface mode disappears, and photoluminescence spectra show a very strong ultraviolet emission peak around 381 nm. The temperature-dependent PL spectra indicate that the UV band is due to free-exciton emission.     

YBa2Cu3O7—δ高温超导薄膜微桥结在微波辐照下的响应特性

采用偏轴直流磁控溅射原位生长ＹＢａ２Ｃｕ３Ｏ７－δ高温超导薄膜，以Ｈ３ＰＯ４为腐蚀液，采用化学湿刻工艺制作ＹＢａ２Ｃｕ３Ｏ７－δ高温超导薄膜微桥，微桥长１０μｍ，宽５μｍ，在８ｍｍ微波源的辐照下，除观察到整数常压台阶外，还观察到ｎ＝１／２，１／５，６／５，９／５等分数常压台阶，分数台阶的高度随微波功率的变化较整数台阶更敏感。     

Mo／SiO2软X射线多层膜的结构研究

本文用磁控射方法制备了几种Ｍｏ／ＳｉＯ２多层膜。在北京同步辐射装置（ＢＳＲＦ）的衍射站上测量了其氏角Ｘ射线衍射（ＸＲＤ）谱，并利用基于光学动力学理论的递推公式对低角Ｘ射线衍射谱进行了拟合，定量分析了膜层的周期结构和界面度以及界面度与层数、层厚的关系。同时用高分辩电子显微镜（ＨＲＥＭ）对一样品的截面进行了观察。     

LB膜混合聚集体中极性基团相互作用对光学非线性的影响

通过紫外－可见吸收光谱、压力－面积等温线、二次谐波的测量，研究了不同活性分子混合聚集体的形成对ＬＢ膜光学性质的影响。分子极性基团间的相互作用，使激发态能量及平均偶极矩发生变化，导致ＬＢ膜的光学非线性明显地增强或减弱。