首页 | 本学科首页   官方微博 | 高级检索  
文章检索
  按 检索   检索词:      
出版年份:   被引次数:   他引次数: 提示:输入*表示无穷大
  收费全文   4602篇
  免费   339篇
  国内免费   112篇
化学   1047篇
晶体学   39篇
力学   35篇
综合类   9篇
数学   24篇
物理学   1696篇
无线电   2203篇
  2025年   8篇
  2024年   104篇
  2023年   141篇
  2022年   64篇
  2021年   249篇
  2020年   277篇
  2019年   259篇
  2018年   176篇
  2017年   174篇
  2016年   214篇
  2015年   216篇
  2014年   292篇
  2013年   262篇
  2012年   273篇
  2011年   264篇
  2010年   183篇
  2009年   215篇
  2008年   260篇
  2007年   215篇
  2006年   188篇
  2005年   154篇
  2004年   114篇
  2003年   121篇
  2002年   96篇
  2001年   67篇
  2000年   79篇
  1999年   52篇
  1998年   60篇
  1997年   31篇
  1996年   47篇
  1995年   36篇
  1994年   31篇
  1993年   17篇
  1992年   18篇
  1991年   13篇
  1990年   14篇
  1989年   22篇
  1988年   5篇
  1987年   5篇
  1986年   7篇
  1985年   7篇
  1984年   3篇
  1983年   10篇
  1982年   3篇
  1981年   1篇
  1979年   2篇
  1977年   1篇
  1976年   1篇
  1975年   2篇
排序方式: 共有5053条查询结果,搜索用时 15 毫秒
41.
Antimonide-based superlattices dedicated to the elaboration of opto-electronic devices have been studied by X-ray scattering techniques. In particular, specular and non-specular X-ray reflectometry experiments have been performed on two MBE-samples elaborated with different shutter sequences at the interfaces. The results have shown a limitation of the incorporation of Sb species in the subsequent InAs layer for one of the samples, as expected.Then, a study on a InGaAs-cap layer/(InGaAs/AlAsSb)N superlattice grown on a InGaAs/InP buffer layer by both specular X-ray reflectometry and High resolution X-ray diffraction is reported. In particular, the results have revealed the presence of a highly disturbed thin-layer on top of the MOVPE-made GaInAs, whose presence has been explained by In-concentration modification during the desoxidation procedure at the surface of the MOVPE-made GaInAs.Beside the results on the Sb-based heterostructures, the use of X-ray scattering metrology as a routinely working non-destructive testing method has been emphasized.  相似文献   
42.
In this paper we study theoretically and experimentally a wavelength-tuneable Sagnac birefringence filter. The device is a Sagnac interferometer including a symmetric fibre coupler and a length of high-birefringence fibre in the loop. A wave retarder is inserted at each end of the birefringent fibre for absolute wavelength tuning. We show theoretically that wavelength tuning through wave plate orientation ensuring constant amplitude of the filtering function is possible only if a minimum of two wave retarders are included in the setup. The position of the transmission peaks then varies linearly with the angle of one of the retarders and can be adjusted over one entire channel spacing. This happens only when a quarter-wave retarder and a half-wave retarder are used, if the former is oriented at 45° with respect to the fibre birefringence axes, while the orientation of the latter serves as the adjustment parameter. The theoretical predictions are confirmed by the experimental results.  相似文献   
43.
相移阴影莫尔条纹正交化解调技术   总被引:1,自引:0,他引:1  
提出一种基于克莱姆正则化分析法的三帧自标定相移阴影莫尔三维轮廓技术.该技术首先采用移动光栅的方法获得相移条纹图,然后通过不同帧相移条纹图相减去除条纹图背景,进而结合克莱姆正交化法和最小二乘法,发展了一种相位解调方法,提取了测量相位.以五步Harlharan算法为参考,用不同算法对同一物体表面进行测量.结果表明,相对于典型的三步相移法和主量分析方法,提出的方法测量得到的相位误差最小(0.5rad),且简化了测量过程.  相似文献   
44.
We have studied the effects of different deposition and annealing ambients on silicon dioxide films produced via the pyrolytic decomposition of tetraethoxysilane at 700° C. The oxide and interface charge characteristics of capacitors incorporating these oxides were measured. The results of these studies were as follows. (1) Films deposited in nitrogen exhibited very poor electrical properties. This was due to the poor quality of both the LPCVD oxide bulk (manifest as a hysteretic instability exceeding one Volt in 20 nm films) and the LPCVD oxide-silicon interface (interface trap charge and fixed charge exceeding 1012 cm−2). These characteristics were not improved by post-deposition annealing in nitrogen at 700° C. (2) As much as an order-of-magnitude reduction in interface traps and/or bias-induced drifts was obtained by exposure of the silicon substrate to 700°C oxygen ambients before, during, or after pyrolysis. The maximum improvement also required both post-deposition and post-metallization annealing treatments in nitrogen.  相似文献   
45.
垂直结构多色量子点LED(QD-LED)最新进展   总被引:1,自引:0,他引:1  
张文君  许键  翟保才 《光学技术》2012,38(5):539-544
量子点LED以胶体量子点为发光层,通过调节作为发光层量子点的尺寸可以制作出覆盖可见(380-780nm)以及近红外光谱的量子点LED (QD-LED),而且量子点LED器件发出的光谱范围很窄,其光谱半高宽可达30nm.简述了当今国内外关于QD-LED器件结构的研究成果以及器件的制作工艺,介绍了目前课题组最新的一些相关成果.重点阐述了目前已经得到验证的几种量子点器件结构,分析了其存在的优缺点,这些结论对进一步改进QD-LED的结构以及使其可以更有利于商业化提供了参考.  相似文献   
46.
    
HfO2 has been recently highlighted as the most promising high-k dielectrics for the next-generation CMOS device applications due to its relatively high dielectric constant and superior thermodynamic stability from calculated Gibbs free reaction with Si. However, the high permeability to oxygen, the low crystallization temperature and the formation of the low-k interfacial layer during high temperature processing causes equivalent oxide thickness scaling and reliability concerns. Therefore, novel Hf-based high-k gate dielectrics should be studied to meet the requirements of the future advanced CMOS devices. This article provides a comprehensive view of the state-of-the-art research activities in advanced Hf-based high-k gate dielectrics, including their preparation, characterization, and potential applications in CMOS device. We begin with a survey of the requirements of high-k oxides, and then various methods developed for generating Hf-based high-k gate dielectrics. After that, more attention has been paid to the detailed discussion of on the latest development of novel Hf-based high-k gate dielectrics which have the potential for integration into a full CMOS process. Finally, we conclude this review with the perspectives and outlook on the future developments in this area. This review explores the possible influences of research breakthroughs of Hf-based gate dielectrics on the current and future applications for nano-MOSFET devices.  相似文献   
47.
以陶瓷厚膜为绝缘层的红色ZnS:Sm,Cl电致发光器件   总被引:4,自引:1,他引:3  
报道采用高介电常数的陶瓷厚膜作绝缘层、ZnS:Sm,Cl作为发光层的红色薄膜电致发光器件。测量了器件的电致发光光谱和亮度电压曲线,研究了发光机理和效率电压等特性。制备的器件在电驱动下16V启亮,最大亮度为18.4cd/m^2,最大效率为0.061m/W。  相似文献   
48.
Hexagonal YMnO3 has a ferroelectric property with an optimal remanent polarization along the c-axis. The c-axis oriented YMnO3 thin films with a small leakage current were prepared by the sol-gel dipping method. The c-axis orientation of the films was promoted by the addition of diethanolamine to the Mn precursor solution. A heat treatment with multiple steps led to a dense film structure with fine grains. The dense structure resulted in the decrease of the leakage current. Furthermore, when the films were heat-treated in a vacuum, the leakage current became considerably small and the ferroelectricity of the YMnO3 thin films was observed even at room temperature.  相似文献   
49.
Electrochemical lithium intercalation in thin films of CeO2-TiO2 and WO3, prepared by the sol-gel technique was investigated with cyclic voltammetry and spectroelectrochemical techniques in propylene carbonate solutions. A solid state system having the configuration WO3/Ormolyte/CeO2-TiO2 has been assembled. The solid electrolyte, an organically modified electrolyte (ormolyte), was prepared with different [O]/[Li] ratios. The transmittance variation of this system during a potentiostatic step from –0.7 V to 0.8 V was about 35% at 550 nm.  相似文献   
50.
本文通过对二阶非线性光学高分子-极化聚合物的研究进展与实用化器件要求之差距的分析指出,稳定性问题已经基本解决其实用化的关键是如何在同一 实现性能的全面综合优化。  相似文献   
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号