聚(二甲基硅氧烷-co-甲氧基十二烷基硅氧烷)在棉纤维及其他模型表面的膜形貌及定向排列方式

用场发射扫描电镜(FESEM)、原子力显微镜(AFM)、光电子能谱(XPS)等仪器研究了棉纤维以及再生纤维素表面聚(二甲基硅氧烷-co-甲氧基十二烷基硅氧烷)(DDPS)的膜形貌及其定向排列方式.结果发现,在天然棉纤维以及再生纤维素模型表面,DDPS均能形成宏观上平滑、而微观形态学实则非均一的疏水性硅膜,表明DDPS的定向排列成膜方式为疏水性硅甲基、硅十二烷基朝外伸向空气,硅氧偶极键指向基质界面.     

Photonic gap vanishing in one-dimensional photonic crystals with single-negative metamaterials

The properties of photonic band gap in one-dimensional photonic crystals composed of single-negative metamaterials are studied theoretically. Our study shows that the photonic gap will vanish at a certain incident angle when both the phase-match and impedance-match conditions are satisfied simultaneously, suggesting that the bandwidth and location of the photonic gap are strongly dependent on the incident angle and polarization. However, the photonic gap will not vanish and may become insensitive to the incident angle when the two match conditions cannot be met. Our study also shows that losses in metamaterials have little effect on the properties of the photonic gap.     

A two-phase, two-component model for vertical upward gas-liquid annular flow

In this paper, a new two-fluid two-component computational fluid dynamics (CFD) model is developed to simulate vertical upward two-phase annular flow. The two-phase VOF scheme is utilized to model the roll wave flow, and the gas core is described by a two-component phase consisting of liquid droplets and gas phase. The entrainment and deposition processes are taken into account by source terms of the governing equations. Unlike the previous models, the newly developed model includes the effect of liquid roll waves directly determined from the CFD code, which is able to provide more detailed and, the most important, more self-standing information for both the gas core flow and the film flow as well as their interactions. Predicted results are compared with experimental data, and a good agreement is achieved.     

用于LDD和SST的SiO2边墙干法腐蚀工艺研究

本文从干法腐蚀角度出发,首先从数学上分析了多晶硅角度,SiO_2边墙的宽度和高度,衬底损失与各工艺参数间的关系,指出边墙的宽度和高度分别取决于多晶硅的角度和过腐蚀量。在Tegal1512e设备上,采用Cl_2、SF_6、N_2混合气体,开发了多晶硅干法腐蚀工艺,讨论了LDD的正胶掩膜及SST的SiO_2掩膜对工艺的不同影响。SEM分析发现了SF_6气体腐蚀的各向同性。在Tegal903e设备上,采用CHF_3、SF_6、He混合气体,开发了SiO_2边墙干法腐蚀工艺,研究了腐蚀的各向异性,辐射损伤,选择比,均匀性及重复性的控制方法。取得的工艺结果为,腐蚀速率(?)_(sio_2)≈400nm/min,均匀性U≤±5％,选择比S_(f8)>10,工序能力指数C_p>1。     

单纯形法计算薄膜常数

本文首次报道了用单纯形加速法计算正常兔ＩｇＧ抗原与羊－抗兔抗体反应的抗体层厚度和光学常数，该方法假定抗体层厚度、光学常数均为时间的函数，避免了以往只假定厚度为时间函数所造成的误差。结果表明该方法计算抗体层薄膜常数是可行的。     

Microscopic phenomena found within enclosed surface laser ablation of 20 nm thick aluminium films

This paper investigates the microscopic features which occur when a four-layered film is ablated using Q-switched Nd:YAG laser. The four-layered films consist of a vacuum-deposited aluminium layer (0.02 μm) upon an oriented polypropylene (OPP) film (30 μm) which has been laminated using an inert adhesive and a second OPP film. Laser radiation is absorbed principally by the aluminium layer, melting and/or vaporising it. Upon cooling, the aluminium layer is rearranged into discrete microscopic particles, which give laser-treated areas of the film a transparent appearance. Within the films are found microscopic features, which can be divided into three distinct types: aluminium demetallisation features, polymer distortion features and particle features. Features from each of these categories can exist within a single laser track depending upon the laser parameters used for transparentisation.     

Analytical solution to a mode of mixed elastohydrodynamic lubrication with mixed contact regimes: Part I. Without consideration of contact adhering layer in the inlet zone

In 2005, Zhang presented a Grubin-like inlet zone analysis to the isothermal line contact elastohydrodynamic lubrication under relatively heavy loads when the hydrodynamic film thickness in the Hertzian zone approaches zero and the EHL fluid is Newtonian [Zhang, Y.B. A justification of the load-carrying capacity of elastohydrodynamic lubrication film based on the Newtonian fluid model. Industrial Lubrication and Tribology, 2005, Vol. 57, pp. 224–232]. His results showed that in this EHL, when the rolling speed is lower than the characteristic rolling speed (U_ch =) 0.0372W^1.50/G, the Hertzian zone is in physical adsorbed layer boundary lubrication while the inlet zone is in conventional hydrodynamic lubrication. This mode of EHL represents a mode of mixed EHL with mixed contact regimes, where hydrodynamic films with different rheological behaviors occur in different areas of the contact. The present paper presents an analysis to this mode of mixed EHL by using the Grubin type method when the contact adhering layer in the inlet zone is neglected. Pressures, film thicknesses and load partition in the contact are obtained from this analysis. It is also found that the formula for the characteristic rolling speed U_ch = 0.0372W^1.50/G obtained by Zhang [Zhang, Y.B. A justification of the load-carrying capacity of elastohydrodynamic lubrication film based on the Newtonian fluid model. Industrial Lubrication and Tribology, 2005, Vol. 57, pp. 224–232] may be valid for the dimensionless load W > 1.0E−7, while it may be invalid for the dimensionless load W < 1.0E−8. In part II [Zhang, Y.B. Analytical solution to a mode of mixed elastohydrodynamic lubrication with mixed contact regimes: Part II. Considering the contact adhering layer effect in the inlet zone. Journal of Molecular Liquids, 2006, Vol. 117. (doi:10.1016/j.molliq.2006.04.007)] will be presented an analysis to other two modes of mixed EHL with mixed contact regimes for relatively heavy loads, low rolling speeds and Newtonian fluids, where the conventional hydrodynamic lubrication, physical adsorbed layer boundary lubrication and oxidized chemical layer boundary lubrication can simultaneously occur in the inlet zone while the oxidized chemical layer boundary lubrication or the fresh metal-oxidized chemical boundary layer dry contact occur in the Hertzian zone, considering the contact adhering layer effect in the inlet zone.     

Effect of film thickness on interface and electric properties of BiFeO3 thin films

Bismuth ferrite (BFO) thin films were fabricated by RF-magnetron sputtering deposition method on Pt/Ti/SiO₂/Si(1 0 0) substrate. The effect of the thickness of BFO films varying from 85 to 280 nm on electrical properties was investigated. Saturated coercive fields were found to increase with the BFO film thickness. The dielectric constant of BFO thin films measured at 1 kHz decreased with decreasing thickness from 98 to 86, while tangent losses increased from 0.013 to 0.021. The presence of bismuth oxide at the interface between BFO films and Pt bottom electrodes was responsible for the high leakage currents in thin BFO thin films as was demonstrated by X-ray diffraction, grazing-incident X-ray diffraction, and secondary ion mass spectroscopy analysis.     

Organic contaminants removal by oxygen ECR plasma

Recently electron cyclotron resonance (ECR) plasma have been explored for wafer cleaning applications, since it is known to do less damage to silicon surface than conventional plasma. Organic contaminants removal efficiency and plasma radiation damage of the ECR plasma cleaning have been investigated. In oxygen ECR plasma cleaning, the plasma exposure time needed to remove the organic contaminants on the silicon surface down to the detection limit is 40 s, but the one to reach the lowest surface roughness is 10 s. The leakage current level of the MOS capacitor made using the Si substrate exposed to oxygen ECR plasma for 40 s is 8 × 10⁻⁹ A. The optimum exposure time determined by considering the contaminants removal efficiency and the plasma radiation damage (or the leakage current level) is 40 s. Organic contaminants seem to be removed through both sputter-off mechanism by oxygen ion bombardment and evaporation mechanism by chemical reactions with excited oxygen atoms.     

Growth of Pt thin films on WSe2

The morphology and structure of Pt deposited on a WSe₂(0 0 0 1) van der Waals surface have been investigated by reflection high energy electron diffraction and scanning tunneling microscopy. At room temperature, the initial growth is characterized by the formation of three-dimensional fcc Pt islands with (1 1 1) orientation. In contrast, at higher temperatures of about 450 °C the formation of a novel chemically ordered Pt-Se alloy is observed. Based on the diffraction patterns, a tetragonal DO₂₂-type structure of a Pt₃Se compound is suggested. With increasing Pt thickness, this chemically ordered alloy disappears and an additional superstructure occurs, which is accompanied by the coalescence of the islands. The observed superstructure is attributed to a strong Se diffusion towards the growth surface, forming most likely a PtSe₂ alloy with the CdI₂-type layered structure on the top surface. Due to the lateral lattice mismatch between the Pt(1 1 1) layers and the PtSe₂(1 1 1) top layer, a Moiré pattern with a period of 1.1 nm is created, which might be used as a long-range atomic pattern for further nanostructure growth.