首页 | 本学科首页   官方微博 | 高级检索  
文章检索
  按 检索   检索词:      
出版年份:   被引次数:   他引次数: 提示:输入*表示无穷大
  收费全文   952篇
  免费   86篇
  国内免费   60篇
化学   193篇
晶体学   4篇
力学   44篇
综合类   1篇
数学   29篇
物理学   276篇
无线电   551篇
  2024年   5篇
  2023年   91篇
  2022年   114篇
  2021年   133篇
  2020年   85篇
  2019年   41篇
  2018年   24篇
  2017年   43篇
  2016年   36篇
  2015年   29篇
  2014年   38篇
  2013年   32篇
  2012年   32篇
  2011年   40篇
  2010年   25篇
  2009年   24篇
  2008年   24篇
  2007年   25篇
  2006年   24篇
  2005年   20篇
  2004年   19篇
  2003年   23篇
  2002年   13篇
  2001年   13篇
  2000年   23篇
  1999年   15篇
  1998年   9篇
  1997年   14篇
  1996年   10篇
  1995年   9篇
  1994年   12篇
  1993年   9篇
  1992年   4篇
  1991年   8篇
  1990年   6篇
  1989年   9篇
  1988年   7篇
  1987年   1篇
  1986年   1篇
  1984年   1篇
  1983年   1篇
  1982年   1篇
  1980年   1篇
  1978年   1篇
  1976年   2篇
  1974年   1篇
排序方式: 共有1098条查询结果,搜索用时 328 毫秒
151.
Owing to their extremely high energy density, Li‐O2 batteries have attained increasing attention in recent studies. However, deposition of the discharge product, insulating Li2O2, is known to seriously limit the electrochemical performance of Li‐O2 batteries. While extensive studies have focused on relieving electrode deactivation by controlling Li2O2 growth, no permanent or effective mechanism is delivered. Here, a unique design comprising a catalytic cathode constructed by cracked carbon submicron tube (CST) arrays decorated with Au nanoparticles on inner walls is proposed. The introduction of Au nanoparticles not only improves electrode conductivity but also provides catalytic sites, guiding conformal growth of thin‐layered Li2O2 inside the cracked CST. Density functional theory calculations support that Au decoration on CST favors the conformal growth of Li2O2 on inner tubular walls. This growth behavior of Li2O2 renders easy decomposition of Li2O2, prevents carbon tube electrode from full, rapid deactivation, and preserves the free space for reactants transport. Li‐O2 cells with Au@CST exhibit good rate capability (1208 mAh g–1 at a high current density of 1000 mA g–1) and long cycle life (112 cycles at a current density of 400 mA g–1 with a limited capacity of 500 mAh g–1).  相似文献   
152.
153.
154.
A flow injection micro-analyser with an integrated injection device and photometric detection is described. Channels measuring 205-295 μm depth by 265-290 μm maximum width were manufactured by deep UV lithography on two layers of urethane-acrylate oligomers-based photoresist. Hypodermic syringe needles (450 μm diameter) were connected to the channels for introduction of solutions into the system. Plastic optical fibres were connected to the ends of a 5.0 mm long channel, in order to conduct the light from and to a homemade photometer. The device has a total volume of 7.0 μL and three different sample volumes (0.09, 0.22 and 0.30 μL) can be inserted into the system by choosing the appropriate loop of the hydrodynamic injection approach. The micro-analyser, designed as a single line manifold, was evaluated by determining chloride in waters (mercuric thiocyanate method), and chromium (VI) in wastewater and total chromium in metallic alloys (diphenylcarbazide method). For chloride determination two micro-pumps were employed to impel the solutions, while for chromium determination this task was performed by a conventional peristaltic pump. The results obtained in all determinations did not differ significantly from the reference methods at a confidence level of 95%. In the chloride determination, a flow rate of 50 μL min−1 was used, providing a sample frequency of 45 injection h−1, generating ca. 0.7 mg of Hg(II) after an 8-h working day (ca. 20 mL of solution). This result suggests the potential of the micro-analyser towards the reduction of waste, following the philosophy of Green Chemistry.  相似文献   
155.
DES是世界上使用最广泛的商用密码,在历经20多年的风雨历程之后终告被破译,商用密码再次面临新的抉择。  相似文献   
156.
We have discussed the resolution of submicron photoluminescence (PL) imaging using a solid immersion lens (SIL), which collects an evanescent light field. We apply the SIL microscope to measure PL image of a strip-line-patterned GaAs quantum well structure at low temperature. An improved resolution beyond diffraction limit and high collection efficiency of PL are realized.This paper was originally presented at the 5th International Conference on NEAR FIELD OPTICS and RELATED TECHNOLOGIES (NFO-5), which was held on December 6–10, 1998 at Coganoi Bay Hotel, Shirahama, Japan, in cooperation with the Japan Society of Applied Physics and Mombusho Grant-in Aid for Scientific Research on Priority Areas “Nearfield Nano-optics” Project, sponsored by Japan Society for the Promotion of Science.  相似文献   
157.
激光直写中光刻胶对激光能量的吸收模型   总被引:1,自引:0,他引:1  
光刻胶对激光能量的吸收模型是激光直写中的重要模型,它是进行邻近效应计算机模拟进而实现邻近校正不可缺少的重要依据。分析了影响光刻胶吸收激光束能量的主要因素,提出了一种光刻胶对激光能量的吸收模型。实验表明,该模型能更精确地表示光刻胶吸收激光能量密度分布的实际情况,能为激光直写邻近校正及微光学元件等光刻过程的计算机模拟提供可靠的依据。  相似文献   
158.
The thermionic hole emissions from a p-type Si0.67Ge0.33 quantum well with a width of 7 nm and a point defect were investigated using deep level transient spectroscopy. An activation energy of 0.22 eV from the quantum well is consistent with the heavy hole level from the bottom of the well. The defect-related band with an energy of 0.30 eV originated from the space charge related to the point defect in the vicinity of the quantum well heterostructure. The origin of the point-defect-related band was confirmed by photoluminescence and the deep level was further clarified by using capacitance-voltage measurements and simulation by introducing a simple model of an interfacial hole trap center. The deep hole trap center apparently disappeared by an annealing effect, indicating that point defects are subject to thermal annealing. The microscopic measurement provides evidence on point defects in the quantum well structure and the thermal annealing also enhances the thermionic hole emission from the quantum well structure. Received: 22 August 1998 /Accepted: 15 February 1999  相似文献   
159.
激光直写邻近效应的校正   总被引:12,自引:1,他引:11  
邻近效应是限制光刻系统分辨力的一个重要因素,它也限制了激光直写在亚微米和亚半微米光刻中的应用。分析了激光直写邻近效应产生的原因,指出它和电子束直写及投影光刻的区别,提出了一种简便有效的邻近校正方法。实验表明,通过光学邻近校正(OPC),利用微米级激光直写系统,制作出了0.6μm的实用光刻线条  相似文献   
160.
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号